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| Brand | ELLITOP |
|---|---|
| Origin | Beijing, China |
| Model | ET8100A |
| Measurement Principle | Spectroscopic Ellipsometry (SE) + Spectral Reflectometry (SR) |
| Wafer Diameter Options | 100 mm, 150 mm, 200 mm, 300 mm |
| Substrate Thickness Range (measurable) | up to 2000 µm |
| Film Thickness Range | 0.1 nm – 120 µm |
| Homogeneous Film Thickness Range (substrate = film material) | 0.3 µm – 30 µm |
| Compliance | ASTM F1530, ISO/IEC 17025 (when configured per lab accreditation requirements), supports GLP/GMP data integrity workflows |
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