MiXran Meg1049 UV-Fused Silica Right-Angle Prism with Standard Precision
| Brand | MiXran |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Authorized Distributor |
| Product Category | Optical Component |
| Model | Meg1049 |
| Component Type | Right-Angle Prism |
| Substrate Material | UV-Fused Silica |
| Coating Options | Uncoated |
| Dimension Tolerance | ±0.2 mm |
| Surface Quality | 40–20 Scratch-Dig |
| Surface Flatness | λ/4 @ 633 nm |
| Angle Accuracy | ±3 arcsec |
| Clear Aperture | ≥90% of Leg Dimension |
| Operating Wavelength Range | 185–2100 nm |
Overview
The MiXran Meg1049 is a precision-engineered right-angle prism fabricated from high-purity UV-grade fused silica (SiO₂), optimized for demanding optical applications requiring exceptional transmission in the deep ultraviolet (DUV) spectral region down to 185 nm. Unlike standard optical glass prisms, the Meg1049 leverages the intrinsic properties of synthetic fused silica—including low thermal expansion (≈0.55 × 10⁻⁶ /°C), high laser-induced damage threshold (LIDT > 5 J/cm² @ 266 nm, 10 ns), and negligible fluorescence under UV excitation—to ensure stable beam deviation, minimal wavefront distortion, and long-term dimensional stability in vacuum or controlled laboratory environments. Its 90° apex angle is manufactured to ±3 arcseconds angular tolerance using interferometric angle metrology, enabling reliable total internal reflection (TIR) or controlled beam folding in alignment-critical systems such as UV spectroscopy setups, excimer laser beam delivery, and synchrotron beamline instrumentation.
Key Features
- UV-optimized fused silica substrate with OH-content 85%) at 185 nm and minimal absorption up to 2100 nm
- Precision ground and polished surfaces meeting λ/4 surface flatness (measured at 633 nm He–Ne wavelength) and 40–20 scratch-dig specification per MIL-PRF-13830B
- Two standard coating configurations: (1) UV-enhanced aluminum (Al + MgF₂ overcoat) on the hypotenuse for high reflectivity (>88% @ 193 nm, >90% @ 248 nm); (2) UV-antireflection (UV-AR) coating on both legs (R < 0.5% average, 190–400 nm)
- Tight dimensional control: leg lengths available from 6.3 mm to 25 mm, all held to ±0.2 mm tolerance; clear aperture ≥90% of nominal leg dimension
- Compatible with cleanroom handling (Class 1000 certified packaging) and vacuum-compatible outgassing profile (water vapor desorption < 1.0 × 10⁻⁵ g/cm² after 24 h at 120°C per ASTM E595)
Sample Compatibility & Compliance
The Meg1049 prism is designed for integration into ISO/IEC 17025-accredited optical test benches and complies with key material and dimensional standards applicable to metrology-grade optical components. It meets the substrate purity requirements defined in ISO 10110-3 for homogeneity (Δn < 5 × 10⁻⁶) and striae classification (Class 1). Surface quality conforms to ANSI/OPI 10101-2017 for critical imaging and laser applications. While not a finished instrument subject to FDA or CE marking, its material certification (including COA with spectral transmittance data and refractive index traceability to NIST SRM 739) supports qualification under GLP and GMP frameworks where optical path integrity is documented in validation protocols (e.g., for UV photolysis reactors or pharmaceutical dissolution analyzers).
Software & Data Management
As a passive optical component, the Meg1049 does not incorporate embedded electronics or firmware. However, its geometric and material specifications are fully compatible with industry-standard optical design software environments—including Zemax OpticStudio (v23+), CODE V (v12.5+), and FRED—via provided .ZMX and .SEQ files containing measured surface irregularity maps and measured coating dispersion curves (n(λ), k(λ)). Each shipped unit includes a digital Certificate of Conformance (CoC) with unique serial traceability, spectral transmittance/reflectance plots (190–2100 nm), and interferometric surface flatness reports. All documentation adheres to ISO 10012 requirements for measurement management systems and supports audit-ready archiving in LIMS or ELN platforms compliant with 21 CFR Part 11.
Applications
- Beam folding and redirection in UV-VIS spectrophotometers (e.g., Shimadzu UV-3600+, Agilent Cary 7000) where thermal drift must be minimized
- Input/output coupling optics in excimer laser systems (ArF 193 nm, KrF 248 nm) requiring high LIDT and low birefringence
- Reference elements in interferometric alignment jigs used for calibrating optical tables and multi-axis motion stages
- UV-curable resin curing modules where broadband DUV transmission enables uniform photopolymer activation
- Space-qualified instrument prototypes requiring radiation-hardened silica optics with verified vacuum stability per ECSS-Q-ST-70-02C
FAQ
What is the maximum permissible incident angle for total internal reflection in air?
For UV fused silica (n ≈ 1.56 at 254 nm), the critical angle is ~39.7°; operation beyond this requires index-matching fluid or vacuum environment to sustain TIR.
Can the Meg1049 be custom-coated with dielectric HR stacks for specific UV lines?
Yes—MiXran offers OEM coating services including narrowband high-reflection (HR) coatings at 193 nm, 248 nm, or 308 nm with R > 99.8% and CW LIDT > 10 J/cm² (1064 nm equivalent scaling). Lead time: 4–6 weeks.
Is thermal annealing recommended before high-power UV use?
Annealing at 1000°C for 2 hours in dry O₂ is optional but recommended for applications exceeding 1 W/cm² average power density to relieve residual stress and suppress color center formation.
How is surface contamination validated prior to shipment?
Each prism undergoes automated particle counting per ISO 14644-1 Class 5 cleanroom protocol, followed by solvent rinse (HPLC-grade acetone/methanol) and nitrogen purge; certificate includes particle count report (<5 particles ≥0.5 µm per cm²).
Does the UV-AR coating withstand repeated ethanol wipes?
Yes—the MgF₂-based UV-AR multilayer is abrasion-resistant per MIL-C-48497A and maintains performance after ≥50 cycles of IPA-ethanol cleaning with Class 10 cleanroom swabs.
