Optical Laboratory Equipment
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| Brand | MiXran |
|---|---|
| Origin | Beijing, China |
| Model | Meg1115 |
| Component Category | Optical Element |
| Design Wavelength | 550 nm |
| Optical Density (OD) | 0.1–3.0 (11 standard grades) |
| Transmission (T) | 79%–0.10% |
| Available Apertures | Φ12.5 mm, Φ25 mm, 50×50 mm |
| Brand | MiXran |
|---|---|
| Model | Meg1116 |
| Optical Component Type | Absorptive ND Filter |
| Substrate Material | Optical Glass |
| Available Diameters | Φ12.5 mm, Φ25 mm, Φ50 mm |
| Square Format | 50 × 50 mm |
| Optical Density (OD) Range | 0.1–4.0 |
| Thickness | 1.25–2.44 mm |
| Surface Quality | 60-40 scratch-dig |
| Transmission Tolerance | ±3% (typical) |
| Spectral Range | 350–1100 nm (VIS-NIR optimized) |
| Mounting Compatibility | Standard SM-threaded lens tubes, kinematic mounts, and optical breadboards |
| Brand | MiXran |
|---|---|
| Model | Meg1117 |
| Subcategory | Optical Component – Hot Mirror |
| Coating Type | All-Dielectric Multilayer |
| Transmission Range | 400–700 nm (Visible) |
| Reflection Band | 750–1200 nm (NIR) |
| Substrate Material | Fused Silica or BK7 (Customizable) |
| Surface Flatness | λ/4 @ 633 nm |
| Parallelism | < 30 arcsec |
| Damage Threshold | > 5 J/cm² @ 1064 nm, 10 ns, 10 Hz |
| AR-Coated Backside Option | Available |
| Dimension Tolerances | ±0.1 mm (diameter/side), ±0.05 mm (thickness) |
| Environmental Compliance | RoHS-compliant coating process |
| Brand | MiXran |
|---|---|
| Model | Meg1118 |
| Type | Dielectric Cold Mirror |
| Substrate Material | Fused Silica or BK7 (Standard) |
| Thickness | 2 mm ±0.1 mm |
| Surface Flatness | λ/10 @ 633 nm |
| Surface Quality | 20–10 Scratch-Dig |
| Clear Aperture | ≥90% of Diameter/Length |
| Damage Threshold | >5 J/cm² @ 1064 nm, 10 ns, 10 Hz (typ.) |
| Operating Temperature Range | –40 °C to +80 °C |
| Humidity Resistance | MIL-C-48497A compliant |
| Mounting Compatibility | Standard kinematic or lens-mount adapters (e.g., SM1, SM2, or custom flange) |
| Brand | MiXran |
|---|---|
| Model | Meg1119 |
| Component Type | Optical Element |
| Substrate Dimensions | Ø12.5 mm / 12.5 × 17.5 mm / Ø25 mm / 25 × 36 mm |
| Operating Angle | 45° incidence |
| Coating Technology | Hard-dielectric multilayer |
| Center Wavelength Options | 425–850 nm (in 25 nm increments) |
| Reflective Bandwidth | Typically 30–50 nm below CWL |
| Transmissive Bandwidth | CWL +15 nm to ≥1200 nm |
| Surface Quality | λ/4 @ 633 nm |
| Parallelism | <3 arcsec |
| Extinction Ratio (Reflected) | >OD4 @ specified blocking band |
| Extinction Ratio (Transmitted) | >OD4 @ specified reflection band |
| Damage Threshold | >500 mJ/cm² (10 ns, 10 Hz, 1064 nm) |
| Brand | MiXran |
|---|---|
| Model | Meg1120 |
| Component Type | Optical Element |
| Substrate Material | Fused Silica (Standard) |
| Surface Flatness | λ/4 @ 633 nm |
| Surface Quality | 20–10 Scratch-Dig |
| Coating Type | Hard Dielectric Multilayer |
| Incident Angle | 45° ± 1° |
| Transmission Bandwidth (FWHM) | 370–820 nm (varies by center wavelength) |
| Reflection Bandwidth (FWHM) | 470–1110 nm (complementary to transmission) |
| Available Apertures | Ø12.5 mm, Ø25 mm, 12.5 × 17.5 mm, 25 × 36 mm |
| Optical Density (OD) in Blocking Regions | ≥ OD4.0 (typ. @ 532 nm blocking for 500 nm CWL variant) |
| Laser Damage Threshold | > 500 mJ/cm² @ 10 ns, 10 Hz, 1064 nm (tested per ISO 21254-1) |
| Brand | MiXran |
|---|---|
| Model | Meg1121 |
| Optical Component Type | Zero-Order Waveplate |
| Mounting Diameter | 12.7 mm or 25.4 mm |
| Center Wavelength (CWL) | 355–1550 nm |
| Retardation | λ/4 or λ/2 |
| Substrate Material | Crystalline Quartz |
| Construction | Cemented Zero-Order Design |
| Surface Quality | 20–10 scratch-dig |
| Wavefront Distortion | < λ/8 @ 633 nm |
| Extinction Ratio | > 300:1 |
| Damage Threshold | > 500 MW/cm² (10 ns, 1064 nm, pulsed) |
| Operating Temperature Range | –40 °C to +80 °C |
| Brand | MiXran |
|---|---|
| Model | Meg1122 |
| Optical Component Type | Retardation Plate |
| Available Configurations | λ/4 and λ/2 waveplates |
| Center Wavelengths (CWL) | 355, 400, 488, 532, 632.8, 670, 780, 808, 850, 980, 1064, 1550 nm |
| Aperture Diameters | 12.7 mm and 25.4 mm |
| Material | UV-grade fused silica or crystalline quartz (depending on CWL) |
| Surface Quality | 20–10 scratch-dig |
| Wavefront Distortion | < λ/8 @ 633 nm |
| Parallelism | < 10 arcsec |
| AR Coating | Broadband or laser-line optimized (R < 0.25% per surface) |
| Brand | MiXran |
|---|---|
| Model | Meg1123 |
| Substrate | Corning 7978 Fused Silica |
| Diameter | 25.4 mm |
| Effective Focal Lengths | 33–1000 mm |
| Coating Options | AR@355 nm, AR@532 nm, AR@1064 nm, AR@532/1064 nm dual-band |
| Laser Damage Threshold | ≥20 J/cm² (10 ns, 10 Hz, 1064 nm) |
| Surface Quality | 10-5 scratch-dig |
| Center Thickness | 3.352–14.43 mm (varies by EFL) |
| Radius of Curvature | 15.128–459 mm (varies by EFL) |
| Back Focal Length | 26.21–997.8 mm (varies by EFL) |
| Brand | MiXran |
|---|---|
| Model | Meg1124 |
| Substrate Diameter | 25.4 mm |
| Substrate Thickness | 6.35 mm |
| Coating Type | High-Reflectivity (HR) Dielectric |
| Wavelength Options | 354.7 nm, 532 nm, 1064 nm, or Dual-Band (1064 & 532 nm) |
| Reflectivity | Rs > 99.5%, Rp > 99% (standard) |
| Angle of Incidence | 0° or 45° |
| Laser Damage Threshold | 3.2–40 J/cm² (depending on wavelength, pulse duration, and AOI) |
| Pulse Duration | 10–20 ns |
| Repetition Rate | 20 Hz |
| Component Category | Optical Element |
| Origin | Beijing, China |
| Brand | MiXran |
|---|---|
| Model | Meg1125 |
| Substrate | Schott Borofloat® 33 |
| Diameter | 12.7–50.8 mm |
| Thickness | 3.1–12.7 mm |
| Coating Type | HR (High-Reflectivity) Dielectric |
| Wavelength Ranges | 441.6 nm, 488–514.5 nm, 532 nm, 632.8 nm, 1030–1090 nm, 1520–1580 nm |
| Reflectivity (Rs & Rp) | >98.5% |
| Acceptance Angle | 0–45° AOI |
| Laser Damage Threshold | 2–10 J/cm² @ 10 ns pulse, 10 Hz, 1064 nm equivalent testing protocol |
| Surface Quality | λ/10 @ 633 nm (typical) |
| Parallelism | <3 arcsec |
| Clear Aperture | ≥90% of diameter |
| Brand | MiXran |
|---|---|
| Model | Meg1126 |
| Optical Component Type | Polarizing Beam Splitter Cube |
| Dimensions | 10.0 × 10.0 × 10.0 mm / 12.7 × 12.7 × 12.7 mm |
| Design Wavelengths | 532 nm, 633 nm, 780 nm, 1064 nm, 1550 nm |
| Clear Aperture | 8.0 × 8.0 mm / 10.0 × 10.0 mm |
| CW Damage Threshold | 100 W/cm² to 1.5 kW/cm² (wavelength- and spot-size dependent) |
| Pulsed Damage Threshold | 100 mJ/cm² to 2 J/cm² (10 ns pulse width, 10 Hz rep rate, specified beam diameter) |
| Material | UV-grade fused silica substrates with dielectric multilayer coatings |
| Extinction Ratio | >1000:1 (typical, s-polarized reflection / p-polarized transmission) |
| Surface Quality | 20–10 scratch-dig |
| Wavefront Distortion | λ/8 @ 633 nm |
| Coating Type | Hard-dielectric, ion-beam-sputtered (IBS) |
| Brand | MiXran |
|---|---|
| Model | Meg1127 |
| Component Type | Optical Element |
| Design Wavelengths | 257 nm, 266 nm, 343 nm, 355 nm, 400 nm, 532 nm, 632.8 nm, 780 nm, 800 nm, 850 nm, 1030 nm, 1064 nm, 1550 nm |
| Retardation | λ/2 |
| Clear Aperture | ≥8.0 mm (for Ø12.7 mm variants) or ≥15.0–18.0 mm (for Ø25.4 mm variants) |
| Thickness | 6.35 mm or 7.92 mm |
| Incident Angle | 0° (optimized for normal incidence) |
| Substrate Material | Fused Silica (standard) |
| Surface Quality | 20–10 scratch-dig |
| Wavefront Distortion | <λ/8 @ 633 nm |
| Damage Threshold | >5 J/cm² (10 ns, 10 Hz, 1064 nm) |
| Brand | MiXran |
|---|---|
| Model | Meg1128 |
| Origin | Beijing, China |
| Manufacturer Type | Authorized Distributor |
| Product Category | Domestic |
| Price | USD 0.14 (FOB, indicative only |
| Brand | MiXran |
|---|---|
| Model | Meg1129 |
| Optical Element Type | Positive Meniscus Lens |
| Diameter | 25.4 mm and 50.8 mm options |
| Focal Length (EFL) | 100–300 mm |
| Coating Options | Uncoated, VIS AR (400–700 nm), NIR AR (650–1050 nm), SWIR AR (1000–1650 nm) |
| Material | Optical Grade BK7 or Equivalent Crown Glass |
| Surface Quality | 40-20 Scratch-Dig |
| Center Thickness Tc | 2.52–9.71 mm |
| Edge Thickness Te | 1.1–7.29 mm |
| Radius of Curvature R1/R2 | Variable per focal length |
| Back Focal Length (BFL) | Specified per configuration |
| Conformance | ISO 10110-1, ISO 10110-2, MIL-PRF-13830B |
| Brand | MiXran |
|---|---|
| Model | Meg1130 |
| Material | UV-grade fused silica (SiO₂) |
| Lens Type | Positive meniscus |
| Coating Options | Uncoated or broadband AR coating (250–400 nm) |
| Diameter | 25.4 mm / 50.8 mm |
| Focal Length (EFL) | 100–1000 mm |
| Surface Radii (R₁, R₂) | Variable per focal length |
| Center Thickness (Tc) | 2.18–10.65 mm |
| Edge Thickness (Te) | 1.2–5.36 mm |
| Power | 1–10 m⁻¹ |
| Compliance | ISO 10110-1, MIL-O-13830 surface quality (scratch-dig 20–10 typical), RoHS-compliant manufacturing |