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Dual-Disk Semi-Automatic Grinding and Polishing Machine WEIYEE MP-2S+MPT-1

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Brand WEIYEE
Origin Guangdong, China
Manufacturer Type Authorized Distributor
Country of Origin China
Model MP-2S+MPT-1
Grinding Disk Diameter 230 mm (9")
Number of Grinding/Polishing Disks 2
Speed Range 50–1000 rpm (infinitely variable) with preset speeds at 250 / 500 / 750 / 1000 rpm
Rotation Direction Bidirectional (forward/reverse selectable)
Sample Capacity Up to 4 specimens simultaneously
Pressure Control Adjustable mechanical load system
Power Supply 220 V AC, 50 Hz

Overview

The WEIYEE MP-2S+MPT-1 is a dual-disk semi-automatic grinding and polishing machine engineered for reproducible, high-precision sample preparation in metallurgical, geological, ceramic, and advanced materials laboratories. It operates on the principle of controlled abrasive contact between rotating disks and mounted specimens under adjustable mechanical pressure — a fundamental methodology aligned with ASTM E3, ISO 14488, and GB/T 13298 for metallographic specimen preparation. The system integrates two independently driven 230 mm (9″) grinding/polishing disks, enabling simultaneous processing of up to four specimens — two per disk — while maintaining strict inter-sample consistency. Its semi-automatic architecture balances operator control with process repeatability: users set rotational speed, direction, dwell time, and applied pressure manually, while the mechanical drive train ensures stable torque delivery across the full 50–1000 rpm range. Designed for routine QC labs and R&D facilities where throughput and cross-batch comparability are critical, the MP-2S+MPT-1 supports standardized workflows from coarse grinding through final polishing without requiring full automation infrastructure.

Key Features

  • Dual independent 230 mm grinding/polishing stations with synchronized or isolated operation
  • Infinitely variable speed control (50–1000 rpm) plus four factory-calibrated fixed-speed presets (250, 500, 750, 1000 rpm) for rapid method recall
  • Bidirectional rotation capability per disk — essential for preventing directional artifact formation during planarization
  • Mechanically adjustable specimen loading pressure via calibrated spring-loaded arms, ensuring consistent normal force across varying sample geometries
  • Robust cast-iron base and precision-machined aluminum housing for vibration damping and long-term dimensional stability
  • Integrated splash guard, drip tray, and quick-release disk clamping system compliant with ISO 13857 safety clearance requirements
  • Front-panel digital display with real-time rpm indication and directional status LED

Sample Compatibility & Compliance

The MP-2S+MPT-1 accommodates standard metallographic mounts (30 mm, 40 mm, and 50 mm diameter), as well as irregularly shaped specimens secured in custom holders. It supports all conventional abrasive media — silicon carbide papers (P80–P2500), diamond suspensions (1–6 µm), and colloidal silica (0.02–0.06 µm) — on both rigid and cloth-backed disks. The system meets CE machinery directive requirements (2006/42/EC) and conforms to electrical safety standards IEC 61000-6-2 (immunity) and IEC 61000-6-4 (emission). While not certified for GMP environments out-of-the-box, its mechanical repeatability, traceable speed calibration, and pressure adjustability enable validation per ASTM E1558 and internal SOPs supporting GLP-compliant documentation.

Software & Data Management

As a semi-automatic instrument, the MP-2S+MPT-1 does not include embedded software or network connectivity. However, its operational parameters — speed, direction, and estimated dwell time — are fully documentable within laboratory information management systems (LIMS) or electronic lab notebooks (ELN). Users may record settings manually or integrate external timers and pressure loggers compatible with USB or analog 0–10 V outputs (optional accessories). For regulated environments requiring audit trails, the device supports 21 CFR Part 11–compliant data capture when paired with validated third-party instrumentation control modules and procedural SOPs governing parameter logging and operator authentication.

Applications

  • Preparation of ferrous and non-ferrous metallographic sections for optical and electron microscopy (SEM/EBSD)
  • Planarization of geological thin sections and mineral aggregates prior to XRD or microprobe analysis
  • Surface conditioning of ceramic and composite substrates for adhesion testing or coating evaluation
  • Routine QC grinding of sintered powder metallurgy parts to assess pore distribution and grain structure
  • Standardized specimen finishing for hardness testing (Vickers, Rockwell, Knoop) per ASTM E384 and ISO 6507

FAQ

Is the MP-2S+MPT-1 suitable for automated unattended operation?
No — it is classified as semi-automatic and requires manual intervention for specimen loading, pressure adjustment, disk更换, and process termination.
Can the two disks operate at different speeds simultaneously?
Yes — each disk has an independent speed controller, allowing differential rotation rates for multi-stage sequential grinding/polishing protocols.
What maintenance intervals are recommended for the drive motor and bearings?
WEIYEE specifies lubrication of main shaft bearings every 500 operating hours and inspection of belt tension every 200 hours; full service intervals are documented in the English-language maintenance manual supplied with the unit.
Does the system support vacuum chuck mounting for fragile specimens?
No — it utilizes mechanical clamp-based specimen holders only; vacuum chucks require optional aftermarket adapters not covered under standard warranty.
Are replacement disks and consumables available through global distribution channels?
Yes — WEIYEE maintains authorized distributor networks across North America, Europe, and APAC; all consumables carry ISO 9001-certified manufacturing traceability.

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