Secondary Ion Mass Spectrometer
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Showing all 18 results
| Brand | auniontech |
|---|---|
| Origin | Imported |
| Manufacturer Type | Authorized Distributor |
| Instrument Type | Magnetic Sector Mass Spectrometer |
| Mass Range | 50–1200 amu |
| Ionization Compatibility | EI, ESI, APCI, TD, DART, DESI |
| Detection Limit | Sub-ppt (trace-level) |
| Sample Inlets | Dual (low-pressure & atmospheric pressure) |
| Architecture | Compact linear ion trap |
| Weight & Form Factor | Lightweight, field-deployable design |
| Resolution | Not specified (nominal mass accuracy typical of linear ion trap systems) |
| Brand | Cameca |
|---|---|
| Origin | France |
| Model | AKONIS |
| Instrument Type | Magnetic Sector SIMS |
| Certification | SEMI S2/S8, E4, E5, E39, E84 Compliant |
| Automation Level | Full In-Line Integration |
| Minimum Measurement Spot Size | 20 µm |
| Positioning Accuracy | < 2 µm |
| Primary Ion Energy Range | < 150 eV (EXLIE Column) |
| Wafer Handling | Full-Size Patterned & Blank Wafer Compatible |
| Cost of Ownership | Optimized for High-Volume Semiconductor Fab Deployment |
| Regulatory Alignment | Designed for GLP/GMP-aligned process control environments |
| Brand | Cameca |
|---|---|
| Origin | France |
| Model | IMS 1300-HR3 |
| Primary Beam Energy | 2–15 keV |
| Mass Range | 1–600 amu |
| Mass Resolution | 40,000 |
| Mass Analyzer Type | Magnetic Sector |
| Detector System | 10¹² Ω Faraday Cup + Multi-Collector Array |
| Brand | Cameca |
|---|---|
| Origin | France |
| Model | IMS 7f-Auto |
| Instrument Type | Magnetic Sector Mass Spectrometer |
| Primary Ion Beam Energy Range | 1–15 keV |
| Mass Range | 1–360 Da |
| Mass Resolution (M/ΔM) | >20,000 |
| Ion Sources | O₂⁺ and Cs⁺ reactive primary ion sources |
| Depth Profiling Capability | High depth resolution & high dynamic range (>10⁶) |
| Automation | Fully motorized sample storage chamber with auto-load/unload, coaxial primary ion gun, remote operation support |
| Detection Limit | Sub-ppq (parts-per-quadrillion) for selected elements in matrix-matched standards |
| Reproducibility | RSD < 0.5% for repeated analyses under standardized conditions |
| Brand | Cameca |
|---|---|
| Origin | France |
| Model | IMS 7f-GEO |
| Instrument Type | Magnetic Sector Mass Spectrometer |
| Primary Beam Energy | 1–23 keV |
| Mass Range | 1–360 Da |
| Mass Resolution (M/ΔM) | <20,000 |
| Brand | Cameca |
|---|---|
| Origin | France |
| Model | IMS Wf / SC Ultra |
| Instrument Type | Magnetic Sector Mass Spectrometer |
| Primary Beam Energy Range | 150 eV – 13 keV |
| Mass Range | 1–360 Da |
| Mass Resolution (M/ΔM) | 20,000 |
| Sample Stage Capacity | Up to 300 mm wafer (IMS Wf) |
| Automation | Fully motorized sample transfer between load lock and analysis chamber |
| Compliance | Designed for GLP/GMP-aligned semiconductor process control environments |
| Brand | Cameca |
|---|---|
| Origin | France |
| Model | NanoSIMS 50L |
| Instrument Type | Magnetic Sector Mass Spectrometer |
| Primary Ion Beam Spot Size | ≥0.5 µm with ion current density ≥100 mA/cm² |
| Mass Range | >238 |
| Mass Resolution (M/ΔM) | >6000 |
| Brand | Cameca |
|---|---|
| Origin | France |
| Model | QUAD4550 |
| Instrument Type | Quadrupole SIMS |
| Primary Ion Beam Energy Range | 250 eV – 5 keV |
| Mass Range | 1–350 Da |
| Mass Resolution | Not Available |
| Base Pressure | ≤1×10⁻¹⁰ mbar (≤1×10⁻⁸ Pa) |
| Brand | Hiden |
|---|---|
| Origin | United Kingdom |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | EQS |
| Instrument Type | Quadrupole Mass Spectrometer |
| Mass Range | Up to 2500 u |
| Analyzer Type | 45° Electrostatic Sector |
| Energy Resolution | 0.05 eV step / 0.25 eV FWHM |
| Detection | High-Sensitivity Pulsed Ion Counting Detector (7-decade dynamic range) |
| Pumping | Three-Stage Differential Pumping System |
| Ion Optics | Grating-Controlled Depth Profiling Capability |
| Interface | UHV-Compatible “Bolt-On” Mounting for Existing Surface Science Chambers |
| Compatibility | Fully Integrated with Hiden SIMS Workstation and MASsoft Control Software |
| Safety | Penning Gauge Interlock for Overpressure Protection |
| Communication | RS232, RS485, or Ethernet LAN |
| Brand | Hiden |
|---|---|
| Origin | United Kingdom |
| Model | SIMS Workstation |
| Mass Analyzer Type | Quadrupole |
| Primary Beam Energy | 25 keV Ga⁺ |
| Mass Range | 1000 amu |
| Mass Resolution | 0.5 amu (5% valley between adjacent equal-height peaks) |
| Detection Mode | Pulsed Ion Counting (positive/negative ions) |
| Dynamic Range | 7 decades |
| Spatial Resolution | 50 nm (Ga⁺ beam), 100–150 µm (O₂⁺/Cs⁺ beams) |
| Vacuum System | UHV-compatible, three-stage differential pumping |
| Control Interface | Ethernet LAN, RS232, RS485 |
| Software | MASsoft v6.x (GLP-compliant audit trail, method templating, automated sequence execution) |
| Origin | USA |
|---|---|
| Manufacturer Type | Distributor |
| Origin Category | Imported |
| Model | MIBIscope |
| Price Range | USD 1.4M – 2.8M |
| Instrument Type | Time-of-Flight (TOF) |
| Primary Ion Beam Energy | 30 kV |
| Mass Range | >12,000 u |
| Mass Resolution | 11,000–16,000 (at m/z 150–200) |
| Brand | ULVAC-PHI |
|---|---|
| Origin | Japan |
| Model | PHI ADEPT-1010 |
| Instrument Type | Quadrupole |
| Primary Beam Energy Range | 0.25–11 keV |
| Mass Range | 1–340 amu |
| Distribution Status | Authorized Distributor (Imported) |
| Brand | PHI |
|---|---|
| Origin | Japan |
| Model | oTOF 3 |
| Instrument Type | Time-of-Flight (TOF) |
| Primary Beam Energy | 30 kV |
| Mass Range | 15,000 u |
| Mass Resolution | 13,500 |
| Configuration | Parallel Imaging MS/MS |
| Charge Neutralization | Dual-beam (low-energy electrons + low-energy inert gas ions), self-regulating, position-resolved |
| Optional Features | Dual-cluster ion source, sub-500 nm HR2 chemical imaging, DE-free acquisition mode, high beam current HR2 imaging, large angular acceptance & depth of field |
| Brand | SDL |
|---|---|
| Origin | United Kingdom |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Imported Instrument |
| Model | SurfaceSeer I |
| Mass Analysis Range | 1000–10000 amu |
| Mass Resolution | >3,000 m/δm (FWHM) |
| Analyzer Type | Time-of-Flight (TOF) |
| Brand | TESCAN |
|---|---|
| Origin | Czech Republic |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Origin Category | Imported Instrument |
| Model | FIB-SEM-TOF-SIMS |
| Price Range | USD 1.3M–2.6M (FOB Europe) |
| Mass Analyzer Type | Time-of-Flight (TOF) |
| Primary Ion Beam Energy | 30 kV |
| Mass Range | 1–2500 Da |
| Mass Resolution (M/ΔM) | >800 (at 10% valley definition) |
| Brand | TESCAN |
|---|---|
| Origin | Czech Republic |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Origin Category | Imported |
| Model | Nanospace SIMS |
| Instrument Type | Orthogonal Time-of-Flight (OTOF) SIMS |
| Mass Range | 1–1,500 Da |
| Mass Resolution | >9,500 (FWHM at m/z 100) |
| Brand | ULVAC-PHI |
|---|---|
| Origin | Japan |
| Model | ADEPT-1010 |
| Instrument Type | Quadrupole SIMS |
| Net Weight | 1,350 kg |
| Shipping Weight | ~2,400 kg |
| Minimum Door Width | >110 cm |
| Minimum Door Height | >200 cm |
| Power Supply | 200–230 V AC, 50/60 Hz, 50 A (single-phase) |
| Grounding | Required |
| Dry Nitrogen Supply | Max. 27 kPa |
| Compressed Air | 0.55–0.70 MPa |
| Oxygen Cylinder | 1,400 PSIG, 99.999% purity |
| Static Magnetic Field | <1 G |
| AC Magnetic Field | <3 mG |
| Operating Temperature | 20°C ± 3°C |
| Relative Humidity | <50% |
| Heat Dissipation (Operational) | 3,300 W |
| Heat Dissipation (Bake-out) | 5,800 W |
| Brand | ULVAC-PHI |
|---|---|
| Origin | Japan |
| Model | PHI oTOF3+ |
| Type | TOF-SIMS Instrument with TRIFT Analyzer |
| Ion Sources | Liquid Metal Ion Gun (Ga⁺), Optional Ar-GCIB, Cs⁺, O₂⁺ |
| Spatial Resolution | <50 nm (high-resolution mode), <500 nm (high-mass-resolving mode) |
| Automation | Fully Automated Sample Transfer & Unattended Multi-Sample Analysis |
| Charge Neutralization | Dual-Beam Electron/Ar⁺ Neutralization System |
| Optional Features | Parallel Imaging MS/MS, FIB Cross-Sectioning, Cryo-Stage, Detachable Glovebox Integration |
| Compliance | Designed for GLP/GMP environments |