Deepflow CYQUVLPA1 172 nm Vacuum Ultraviolet Lamp for Ultrapure Water Systems
| Brand | Deepflow |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Authorized Distributor |
| Regional Category | Domestic (China) |
| Model | CYQUVLPA1 |
| Pricing | Available Upon Request |
Overview
The Deepflow CYQUVLPA1 is a specialized vacuum ultraviolet (VUV) lamp engineered for advanced oxidation and organic contaminant reduction in ultrapure water (UPW) distribution systems. Operating at a precisely stabilized emission peak of 172 nm, this low-pressure excimer lamp generates high-energy photons capable of direct photolysis of trace organic molecules—including total organic carbon (TOC), endotoxins, and low-molecular-weight organics—without introducing chemical residuals or altering water conductivity. Unlike conventional 254 nm UV lamps, the 172 nm wavelength resides within the vacuum UV range, enabling efficient generation of hydroxyl radicals (•OH) and aqueous ozone (O₃) *in situ* via photolysis of dissolved molecular oxygen and water vapor. This dual-path oxidative mechanism delivers superior TOC abatement—typically achieving >90% reduction from sub-ppb baseline levels—making the CYQUVLPA1 an essential component in semiconductor fab UPW loops, pharmaceutical water-for-injection (WFI) polishing stages, and analytical laboratory feedwater conditioning.
Key Features
- Vacuum ultraviolet emission centered at 172 ± 2 nm with spectral half-width < 5 nm, optimized for maximum quantum yield of reactive oxygen species (ROS)
- Quartz-fused silica envelope with high VUV transmittance (>75% at 172 nm), resistant to solarization under continuous operation
- Integrated quartz sleeve design compatible with standard 1/2″–1″ sanitary tri-clamp or NPT threaded UPW line installations
- Low thermal load design: surface temperature maintained below 60 °C during steady-state operation to prevent localized heating of ultrapure water
- Electronically ballasted power supply with soft-start circuitry, stable output regulation (±3% intensity drift over 1,000 h), and real-time arc current monitoring
- CE-marked electrical safety compliance; RoHS 2011/65/EU and REACH SVHC-compliant materials
Sample Compatibility & Compliance
The CYQUVLPA1 is designed exclusively for integration into closed-loop, pressurized ultrapure water systems operating at resistivity ≥18.2 MΩ·cm (25 °C), total silica < 1 ppb, and particle count 10 NTU. The lamp meets ISO 3696:1987 Grade 1 water specifications when deployed as part of a validated UPW system architecture. Its operational parameters align with ASTM D1193-20 (Type I reagent water) and USP Purified Water and Water for Injection requirements for oxidative treatment validation. Full traceability documentation—including spectral irradiance certification, quartz transmission report, and electrical safety test records—is provided per unit.
Software & Data Management
While the CYQUVLPA1 operates as a standalone hardware module, it supports seamless integration into supervisory control and data acquisition (SCADA) environments via 4–20 mA analog output (lamp intensity feedback) and dry-contact status relay (lamp-on/failure). Optional digital interface kits enable Modbus RTU communication for centralized logging of operational hours, cumulative UV dose (J/m²), and fault codes. All system-level data generated during routine operation comply with FDA 21 CFR Part 11 requirements when hosted on validated LIMS or MES platforms, supporting audit-ready electronic records for GLP and GMP environments.
Applications
- Final-stage TOC polishing in semiconductor-grade UPW systems (SEMI F63 compliant)
- Oxidative pretreatment prior to ultrafiltration or electrodeionization (EDI) in WFI production lines
- Endotoxin degradation in biopharmaceutical process water circuits
- Background organic suppression in LC-MS and ICP-MS feedwater systems
- Calibration and verification of online TOC analyzers using known UV-dose response curves
FAQ
What is the expected service life of the CYQUVLPA1 lamp under continuous operation?
Rated lifetime is 5,000 hours at nominal output; actual longevity depends on duty cycle, cooling efficiency, and upstream water quality.
Can the lamp be used in deionized water systems without additional degassing?
Yes—dissolved O₂ concentration ≥ 6 mg/L is sufficient for optimal •OH generation; no external sparging is required.
Is quartz sleeve cleaning required during routine maintenance?
Periodic inspection is recommended; cleaning with 1% citric acid solution followed by ultrapure water rinse restores >95% transmittance if fouling occurs.
Does the lamp emit ozone into the ambient environment?
No—ozone generation is confined to the aqueous phase; all VUV radiation is fully absorbed within the quartz sleeve and water column.
How is lamp performance validated post-installation?
Validation requires measurement of in-line 172 nm irradiance (using NIST-traceable VUV radiometer) and correlation with TOC reduction across defined flow rates (0.5–2.0 L/min).
