KYKY FF-100/110 Lip-Lubricated Molecular Pump

Overview

The KYKY FF-100/110 lip-lubricated molecular pump is a high-performance, oil-free vacuum pumping solution engineered for demanding ultra-high vacuum (UHV) and high-vacuum applications in research laboratories and industrial process environments. Operating on the principle of momentum transfer via high-speed rotating blades (typically titanium or stainless-steel rotor assemblies), this turbomolecular pump achieves gas compression through sequential stages of supersonic blade arrays—accelerating residual gas molecules toward the exhaust side while maintaining directional flow against increasing pressure gradients. Its lip-lubricated bearing system eliminates the need for circulating oil or grease replenishment, significantly reducing maintenance intervals and eliminating hydrocarbon backstreaming risks inherent to traditional oil-lubricated designs. Designed for integration into compact vacuum systems—including those with space constraints or non-vertical mounting configurations—the FF-100/110 supports arbitrary-angle installation without performance degradation, making it suitable for inline, inverted, or side-mounted configurations in multi-chamber UHV platforms.

Key Features

• Lip-lubricated magnetic or hybrid bearings ensure long-term operational stability with zero oil contamination—critical for clean vacuum processes in semiconductor, optical coating, and accelerator physics applications.
• Compact cylindrical architecture (Ø148 × 277 mm) enables seamless integration into modular vacuum systems, including load-lock chambers, deposition tools, and analytical instrumentation enclosures.
• High tolerance to transient overpressure events: rated for continuous operation up to 200 Pa forepressure and short-term exposure to 300 Pa (N₂), enhancing robustness during system venting, bake-out, or process upsets.
• Dual-flange inlet configuration (DN100 CF and DN100 ISO-K) provides flexibility for compatibility with both UHV-standard conflat and industrial ISO-K vacuum interfaces.
• Optimized blade geometry delivers balanced pumping speed across light (H₂, He) and heavy (Ar, N₂) gases—110 L/s for N₂, 100 L/s for He and Ar, and 50 L/s for H₂—supporting mixed-gas environments typical in sputtering, PECVD, and ion implantation.
• Rated rotational speed of 42,300 rpm ensures rapid pump-down times (≤3 minutes to base pressure) and stable operation under variable gas loads up to 300 sccm (N₂).

Sample Compatibility & Compliance

The FF-100/110 is compatible with standard vacuum chamber materials (304/316L stainless steel, aluminum alloys, ceramics) and inert process gases (N₂, Ar, He, H₂, O₂, and reactive precursors when used with appropriate foreline traps). Its oil-free design meets stringent cleanliness requirements for thin-film deposition processes—including ITO, Low-E glass, and SiC epitaxy—where hydrocarbon contamination must remain below 1×10⁻¹⁰ Torr·L/s. The pump complies with ISO 2859-1 sampling plans for incoming quality control and conforms to CE marking directives for electromagnetic compatibility (EMC) and low-voltage equipment (LVD). While not intrinsically rated for explosive atmospheres, it may be deployed in Class 1 Div 2 environments when integrated with certified interlocks and purge systems per IEC 60079-14 guidelines.

Software & Data Management

The FF-100/110 operates in conjunction with the KYKY FD-110A controller, which provides real-time monitoring of rotational speed, bearing temperature, vibration amplitude, forepressure, and power consumption via RS-485 or analog 0–10 V outputs. The controller supports programmable ramp profiles, automatic fault logging (with timestamped event codes), and configurable safety shutdown thresholds—enabling compliance with GLP and GMP documentation standards. Optional Modbus TCP integration allows centralized vacuum system supervision within SCADA or MES platforms. All operational parameters are traceable for audit purposes, satisfying basic FDA 21 CFR Part 11 data integrity requirements when paired with validated electronic logbook software.

Applications

This molecular pump serves critical roles in vacuum-intensive manufacturing and research domains: flat-panel display (FPD) production lines requiring particle-free environments for TFT-LCD and OLED sputtering; photovoltaic R&D for thin-film battery and perovskite solar cell fabrication; architectural glass coating (Low-E, solar-control); crystal growth furnaces operating below 10⁻⁶ Pa; RF cavity conditioning in particle accelerators; and precision quartz crystal microbalance (QCM) calibration systems. Its ability to sustain high compression ratios (>10⁸ for N₂/Ar) ensures effective isolation between roughing and high-vacuum zones—essential for maintaining base pressures below 6×10⁻⁷ Pa (CF flange) in systems with minimal outgassing.

FAQ

Can the FF-100/110 be operated horizontally or upside-down?
Yes—the lip-lubricated bearing design and symmetrical rotor dynamics allow reliable operation at any orientation without loss of pumping speed or bearing life.
What forepump is recommended for optimal performance?
A two-stage rotary vane pump with ≥2 L/s displacement is recommended; dry scroll or diaphragm pumps may be used if ultimate forepressure remains ≤200 Pa during continuous operation.
Is water cooling mandatory?
No—air cooling is sufficient when ambient temperature remains between 5 °C and 32 °C and airflow exceeds 1.5 m/s across the pump body; water cooling is required above 32 °C or under sustained high gas load conditions.
Does the pump require periodic lubrication?
No—lip-lubricated bearings use solid-film or sintered metal lubricants pre-applied during assembly; no user-serviceable lubrication points exist.
How is vibration minimized during operation?
The rotor undergoes dynamic balancing to ISO 1940 Grade G2.5, and optional anti-vibration mounting kits (KYKY AVK-FF) reduce transmission to <0.5 µm peak-to-peak at 42,300 rpm.