Auger Electron Spectrometer
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| Brand | PHI |
|---|---|
| Origin | Japan |
| Model | PHI 700 |
| Type | Scanning Auger Electron Spectrometer |
| Detection Principle | Auger Electron Spectroscopy (AES) |
| Spatial Resolution | <10 nm (beam diameter) |
| Energy Resolution | ≤0.3% at E₀ = 1 keV |
| Ion Sputtering Energy Range | 0.1–5 keV |
| Maximum Magnification | >500,000× |
| Depth Profiling Capability | Sub-nanometer to several micrometers |
| Sample Stage | High-precision motorized XYZ + tilt/rotation |
| Vacuum System | Ultra-high vacuum (UHV), base pressure ≤2×10⁻¹⁰ Torr |
| Brand | PHI |
|---|---|
| Origin | Japan |
| Model | PHI 700 |
| Type | Scanning Auger Electron Spectrometer |
| Detection Principle | Auger Electron Spectroscopy (AES) |
| Spatial Resolution | <10 nm (typical) |
| Beam Energy Range | 1–20 keV (electron gun) |
| Depth Profiling Capability | Sub-nanometer to several micrometers |
| Energy Resolution | ≤0.3% (ΔE/E at E = 1 keV) |
| Imaging Magnification | Up to 500,000× |
| Vacuum System | Ultra-High Vacuum (UHV), ≤5×10⁻¹⁰ Torr base pressure |
| Sample Stage | High-precision motorized XYZ + tilt/rotation |
| Compliance | ASTM E1508, ISO 18115-2, USP <1057>, GLP/GMP-ready data audit trail |
| Brand | ULVAC-PHI |
|---|---|
| Origin | Japan |
| Model | PHI 710 |
| Type | Scanning Auger Electron Spectrometer (AES) |
| SEM Resolution | ≤3 nm |
| AES Spatial Resolution | ≤8 nm (@20 kV, 1 nA) |
| Analyzer Geometry | Coaxial Cylindrical Mirror Analyzer (CMA) |
| Energy Resolution | 0.1% (high-resolution mode) |
| Beam Diameter | 20 nm (adjustable) |
| Ion Gun Sputtering Energy | 0.5 kV (standard configuration) |
| Software Suite | PHI SmartSoft-AES & MultiPak |
| Brand | ULVAC-PHI |
|---|---|
| Origin | Japan |
| Model | PHI 710 |
| Category | Imported Instrument |
| Vendor Type | Authorized Distributor |
| Pricing | Upon Request |