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| Brand | Bruker |
|---|---|
| Origin | Germany |
| Instrument Type | Powder X-ray Diffractometer |
| Model | JV QC3 |
| Application Focus | Compound Semiconductor Epitaxial Layer & Substrate QC |
| Automation Level | Fully Automated Wafer Handling (Optional Robotic Arm) |
| Sample Capacity | Up to 4 × 100 mm wafers per batch |
| Compliance | Designed for ISO/IEC 17025-aligned semiconductor manufacturing environments |
| Software Platform | Bruker JV-RADS (Bede RADS) with automated peak fitting, strain/relaxation quantification, and multi-layer compositional analysis |
| X-ray Source Protection | XRG Protect™ tube longevity technology |
| Power Mode | Eco-standby with reduced idle power consumption |
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