Appo
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| Brand | Appo |
|---|---|
| Origin | Switzerland |
| Model | MTA03 |
| Load Range | ±200 mN |
| Load Resolution | 0.5 nN |
| Displacement Range | 0.1 nm to 29 mm |
| Displacement Resolution (short-range) | 0.1 nm |
| Displacement Resolution (long-range) | 1 nm |
| Microscope Working Distance | 95 mm |
| Camera | 3 MP CMOS USB |
| Optical Zoom | 7:1 motorized |
| Illumination Options | Coaxial lens, ring light, diffuse backlight |
| Probe Types | Multiple FT-S microforce sensing probes |
| Optional Modules | FT-G microtweezers for microassembly |
| Brand | Appo |
|---|---|
| Origin | Shanghai, China |
| Model | NIL-100 |
| Imprint Area | 4-inch (100 mm) wafers/substrates |
| Max. Pressure | 8 bar (integrated air compressor), 20 bar (external cleanroom supply) |
| Temperature Range | Ambient to 250 °C |
| UV Source | 400 W high-pressure Hg lamp, dominant wavelength 365 nm |
| Vacuum Level | ≤10 Pa |
| Heating Method | Electromagnetic single-side heating |
| Automation | Motorized auto-demolding |
| Compatible imprint modes | Thermal embossing & UV-curable step-and-flash imprint lithography (S-FIL) |
| Optional consumables | Full suite of nanoimprint resists (thermal, UV-curable, lift-off, deep-etch), anti-sticking agents, adhesion promoters, and custom mold fabrication support (Ni, SFP®, Hybrid Mold®) |
| Resolution capability | ≤20 nm (with appropriate mold and process optimization) |
| Compliance | Designed for R&D and pilot-line use under GLP-aligned lab practices |
| Brand | Appo |
|---|---|
| Origin | United Kingdom |
| Model | SWIFT |
| Max Load Capacity | 10 kN |
| Temperature Range | –120 °C to +1000 °C |
| Stroke Range | 16–26 mm |
| Compatibility | SEM, TEM, Optical Microscope, Confocal Microscope, EBSD, Raman, XRD, AFM, Metallographic Microscope |
| Control Interface | Windows 10–compatible PC-based controller with drag-and-drop test sequencing software |