Fastmicro
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| Brand | Fastmicro |
|---|---|
| Origin | Netherlands |
| Model | FM-PS-PFS-V01 |
| Minimum Detectable Particle Size | 0.5 µm |
| Measurement Speed | Real-time, second-level continuous monitoring |
| Output Formats | KLARF, Excel |
| Interface | USB, Ethernet |
| Sample Stage Diameter | 50 mm (base), compatible with 25 mm wafers |
| Environmental Operation | Ambient air and vacuum-compatible |
| Dimensions (L×W×H) | 405 mm × 183 mm × 209 mm |
| Detection Principle | Mie scattering-based surface particle imaging |
| Brand | Fastmicro |
|---|---|
| Origin | Netherlands |
| Model | FM-PS-PFS-V02 |
| Measurement Principle | Dark-field Mie scattering |
| Measurement Range | 0.5–150 µm |
| Repeatability | ≥90% |
| Measurement Interval | ≤10 s per scan |
| Field of View (FOV) | Ø25 mm (on 50 mm replaceable substrate) |
| Environmental Operation | Ambient pressure and vacuum-compatible |
| Compliance | ISO 14644-9, ISO 14644-17 |
| Output Formats | KLARF, Excel, PDF (ISO-compliant qualification reports) |
| Software | Integrated real-time analysis with annotated imaging and 3D signal profiling |
| Brand | Fastmicro |
|---|---|
| Country of Origin | Netherlands |
| Model | FM-PS-PRS-V01 |
| Detection Principle | Mie Scattering |
| Minimum Detectable Particle Size | 0.5 µm (PSL) |
| Measurement Speed | Full-surface imaging in seconds |
| Position Accuracy | 80 µm |
| Position Repeatability | 30 µm |
| Size Accuracy (PSL) | <20% error |
| Surface Roughness Requirement | Ra < 50 nm |
| Output Formats | KLARF, Excel |
| Interface | USB, Ethernet |
| Contactless Operation | Yes |
| Compliance | Designed for ISO 14644-1 cleanroom environments and SEMI S2/S8 safety standards |
