Kaufman
Filter
Showing all 4 results
| Brand | Kaufman |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | RFICP |
| Pricing | Upon Request |
| Discharge Type | RF (Radio Frequency) |
| Anode Configuration | RF Electrode |
| Beam Current Range | 100–1500 mA |
| Ion Kinetic Energy | 100–1200 V |
| Grid Diameter | 4–30 cm |
| Beam Modes | Focused, Collimated, Divergent |
| Gas Compatibility | Ar, Kr, Xe, O₂, N₂, H₂, and other process gases |
| Operating Pressure | < 0.5 mTorr |
| Neutralizer | LFN-2000 |
| Length | 12.7–39 cm |
| Diameter | 13.5–59 cm |
| Flow Rate | 3–50 sccm |
| Brand | Kaufman |
|---|---|
| Origin | USA |
| Model | eH 1000 |
| Discharge Voltage | 50–300 V DC |
| Discharge Current | up to 10 A |
| Beam Divergence (HWHM) | >45° |
| Anode Diameter | ~5 cm |
| Physical Dimensions | Ø5.7" × H5.5" |
| Compatible Gases | Ar, Xe, Kr, O₂, N₂, organic precursors |
| Mounting Options | flange-mounted (CF, ISO-K, or custom), no water cooling required |
| Operating Pressure Range | 1×10⁻⁴ – 5×10⁻³ Torr |
| Typical Applications | ion-assisted deposition (IAD), in-situ pre-cleaning, low-energy sputter etching, surface activation |
| Brand | Kaufman |
|---|---|
| Origin | USA |
| Model | eH3000 |
| Discharge Voltage/Current | 50–300 V / up to 20 A |
| Beam Diameter | ~7 cm |
| Beam Divergence (HWHM) | >45° |
| Cooling | Water-cooled front plate |
| Compatible Gases | Ar, Xe, Kr, O₂, N₂, organic precursors |
| Mounting Flange | Quick-connect or movable base |
| Height | 4.0 in |
| Diameter | 5.7 in |
| Anode Type | Modular, standard or grooved |
| Cathode Options | Filament, Sidewinder filament, or hollow cathode |
| Gas Control | Up to 4 independent gas channels |
| Installation Distance | 16–45 in |
| Application Scope | Ion-assisted deposition (IAD), ion beam sputtering (IBS), ion beam assisted deposition (IBAD), surface activation, direct ion beam deposition (DD), optical coating, thin-film densification |
| Brand | Kaufman |
|---|---|
| Origin | USA |
| Model | RFICP 220 |
| Anode Power | 2 kW @ 2 MHz |
| Max Beam Current | >1000 mA |
| Ion Energy Range | 100–1200 eV |
| Beam Diameter | 22 cm |
| Gas Compatibility | Ar, O₂, N₂, others |
| Gas Flow | 5–50 sccm |
| Operating Pressure | <0.5 mTorr |
| Grid Material | Molybdenum |
| Ion Optics | OptiBeam™ self-aligning electrostatic lens system |
| Neutralizer | LFN 2000 or MHC 1000 |
| Flange | 10" CF |
| Dimensions (H × D) | 30 cm × 41 cm |
| Compliance | Designed for UHV integration and compatible with ISO-KF/CF vacuum standards |