Kaufman (KRI)
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| Brand | Kaufman (KRI) |
|---|---|
| Origin | USA |
| Model | RFICP 100 |
| Discharge Anode | RF |
| Ion Beam Current | >350 mA |
| Ion Energy Range | 100–1200 eV |
| Grid Diameter | 10 cm |
| Beam Optics | Focused, Parallel, or Divergent Configurations |
| Process Gases | Ar, Kr, Xe, O₂, N₂, H₂ |
| Operating Pressure | <0.5 mTorr |
| Length | 23.5 cm |
| Outer Diameter | 19.1 cm |
| Neutralizer | LFN-2000 |
| Flange | 10" CF |
| Brand | Kaufman (KRI) |
|---|---|
| Origin | USA |
| Model | RFICP-380 |
| Discharge Power | 2 kW @ 1.8 MHz |
| RF Auto-Matching | Yes |
| Max Anode Power | >1 kW |
| Max Ion Beam Current | >1000 mA |
| Ion Beam Energy | 100–1200 eV |
| Grid Diameter | 38 cm (Φ) |
| Grid Material | Molybdenum |
| Beam Optics | OptiBeam™ Self-Aligning Ion Optics |
| Beam Profiles | Collimated, Focused, or Divergent |
| Neutralizer | LFN-2000 |
| Operating Gases | Ar, O₂, N₂, and other process gases |
| Gas Flow Rate | 5–50 sccm |
| Chamber Pressure | < 0.5 mTorr |
| Mounting Flange | 12″ CF |
| Height | 38.1 cm |
| Diameter | 58.2 cm |
| Applications | Ion Beam Etching (IBE), Sputter Deposition, Surface Cleaning, Ion Assisted Deposition (IAD) |