KRI (Kaufman)
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| Brand | KRI (Kaufman) |
|---|---|
| Origin | USA |
| Model | eH 200 |
| Configuration | Cylindrical & Linear Ion Gun Architecture |
| Neutralizer | Integrated Thermionic Cathode |
| Anode Module | Yes |
| Compatible Process Gases | Ar, O₂, N₂, Xe, CH₄, CF₄, and other inert, reactive, or organic gases |
| Power Supply | eH Plasma Power Pack (Compact, Rack-Mountable, Programmable DC/RF Hybrid Control) |
| Operating Pressure Range | 1×10⁻⁵ to 5×10⁻³ Torr |
| Beam Energy Range | 50–2000 eV (adjustable in 1 eV increments) |
| Beam Current Density | Up to 1.2 mA/cm² (at 1000 eV, Ar) |
| Extraction Aperture | 200 mm diameter |
| Beam Divergence | <±3° full angle |
| Cooling | Water-cooled anode and cathode assembly |
| Vacuum Interface | Conflat (CF) 200 or ISO-K 200 flange |
| Compliance | CE-marked, RoHS-compliant, compatible with ISO 9001-certified vacuum system integration |
| Brand | KRI (Kaufman) |
|---|---|
| Origin | USA |
| Model | RFICP 200 HO |
| Discharge Type | RF Inductive |
| Filamentless Operation | Yes |
| RF Power Input | >1 kW |
| Ion Optics | OptiBeam™ Grid Assembly |
| Grid Configuration | Application-Specific, Self-Aligning |
| Neutralizer | Integrated (Optional) |
| Cooling | Water-Cooled |
| Beam Options | Collimated, Convergent, Divergent |
| Compliance | Designed for UHV-compatible vacuum systems (≤1×10⁻⁷ Torr operating base pressure) |