LK Technology
Filter
Showing all 2 results
| Brand | LK Technology |
|---|---|
| Origin | Germany |
| Model | Q-ONE |
| Product Type | Medium-Current Ion Implanter |
| Application Domain | IC Fabrication & Quantum Device Manufacturing |
| Implantation Energy | 50 keV |
| Wafer Size Compatibility | 8–12 inch |
| Implant Species | p⁺ (H⁺, B⁺, As⁺, P⁺, etc.) |
| Ion Source Options | Liquid Metal Ion Source (LMIS) & Plasma Ion Source |
| Beam Current Range | sub-fA to ~100 pA |
| Detection Efficiency | ≥98% |
| Positional Accuracy | <20 nm (3σ) |
| Stage Resolution | ≤1 nm (closed-loop) |
| Brand | LK Technology |
|---|---|
| Origin | Germany |
| Model | Q-ONE |
| Product Type | Medium-Current Ion Implanter |
| Implant Energy | 50 keV |
| Wafer Size | 8–12 inch |
| Implant Species | p⁺ (proton) |
| Ion Source Options | Liquid Metal Ion Source (LMIS), Plasma Ion Source |
| Beam Current | sub-femtoampere (fA) range |
| Positioning Accuracy | < 10 nm |
| Detection Efficiency | ≥ 98% |
| Compliance | ISO 14644-1 Class 4 cleanroom compatible, CE-marked, RoHS compliant |