Makeway
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| Brand | Makeway |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Authorized Distributor |
| Product Category | Domestic |
| Model | lgTIRF |
| Pricing | Upon Request |
| Measurement Principle | Light-guided TIRF (not SQUID) |
| Excitation Delivery | FC-PC fiber-coupled (2 m length) |
| Evanescent Field Depth | ~100 nm |
| Compatible Objectives | Dry, water-immersion, oil-immersion |
| Substrate Compatibility | Glass/silica coverslips, optically clear-bottom dishes |
| Excitation Wavelength Range | 190–1000 nm (UV-capable) |
| Configurable Modes | TIRF, SAFM (shallow-angle fluorescence), MSE (microspot excitation) |
| Calibration | Factory-calibrated, angle-stabilized geometry |
| Switching Speed | Instant mode switching between TIRF/SAFM/MSE/epifluorescence/transmission |
| Brand | Makeway |
|---|---|
| Origin | USA |
| Model | MKW-280 |
| Mask Size | 5 in |
| Wafer/Substrate Size | 5 in |
| Alignment Accuracy | 1 µm (Vacuum Contact), 1.5 µm (Hard Contact), 3 µm (Soft Contact), 5 µm (Proximity Mode) |
| UV Source | 350 W, 365 nm, uniformity ±3%, irradiance 30 mW/cm² |
| Exposure Time Range | 0.1–999 s |
| Chuck Motion | Manual X/Y/Z/θ with wedge compensation leveling |
| Microscopy | Dual CCD-based system, 80×–400× standard, up to 1000× with optional lenses, working distance 50–150 mm |
| Display | 20" LCD monitor |
| Contact Modes | Vacuum contact (adjustable force), hard contact, soft contact, proximity (gap adjustable) |
| Power Supply | 220 V, single-phase, 15 A |
| Optional | Deep UV source, IR alignment mode, custom substrate chucks |
| Brand | Makeway |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Authorized Distributor |
| Region of Origin | Domestic (China) |
| Model | MKW-320 |
| Price Range | USD 21,000 – 55,000 |
| Brand | Makeway |
|---|---|
| Model | MKW-3800 |
| Origin | Shanghai, China |
| Measurement Principle | Non-contact structured light reflectometry |
| Sample Diameter | 2–8 inch wafers |
| Sampling Interval | down to 0.1 mm (full-field uniform sampling) |
| Measurement Time | <30 s (for 6-inch wafer, full aperture) |
| Warpage Range | 0.5–5000 µm |
| Warpage Repeatability | ±0.2 µm or ±1% |
| Warpage Accuracy | ±0.5 µm or ±1.5% |
| Stress Range | 1–10,000 MPa |
| Curvature Radius Range | 0.5–10,000 m |
| Curvature Repeatability | <1% (1σ @ 25 m radius) |
| Stress Repeatability | ±1.5 MPa or ±1% |
| Compatible Substrates | Si, GaAs, LiTaO₃, glass, sapphire, InP, SiC, GaN, bonded wafers, patterned wafers, square optical substrates |
| Compatible Films | Si, SiO₂, SiNₓ, Al₂O₃, TiO₂, photoresist, metal films, adhesives, nano-polymeric films, hybrid organic/inorganic films |
| Software | Stress Mapper (real-time acquisition, Stoney equation-based stress calculation, polynomial fitting, spatial filtering, ROI analysis, time-resolved & temperature-dependent stress profiling) |
| Brand | Makeway |
|---|---|
| Model | MKW-4900 |
| Origin | Shanghai, China |
| Magnet Type | Electromagnet |
| Temperature Range | 300 °C |
| Measurement Principle | Thermally Stimulated Depolarization Current (TSDC) |
| Voltage Range | ±100 V to ±10 kV |
| Software Platform | aixPlorer / ResoCe Analyzer |
| Interface | GPIB, Ethernet, ODBC |
| Output Format | ASCII |
| Brand | Makeway |
|---|---|
| Model | MKW-4900 |
| Origin | Shanghai, China |
| Magnet Type | Electromagnet |
| Temperature Range | 300 °C (max) |
| Measurement Principle | Thermally Stimulated Depolarization Current (TSDC) |
| Voltage Range | ±100 V to ±10 kV |
| Software Platform | aixPlorer / Resoce Analyzer |
| Interface | GPIB, Ethernet, ODBC |
| Output Format | ASCII |
| Brand | Makeway |
|---|---|
| Origin | Shanghai, China |
| Model | MKW-5250 |
| Energy Resolution | 40 meV |
| X-ray Source | Al Kα (1486.6 eV) |
| Spatial Resolution | ≤ 5 µm (focused monochromated beam) |
| Analysis Area | Up to 300 µm × 300 µm |
| Detection Sensitivity | 11,800 kcps (for C 1s at pass energy 20 eV) |
| Sample Stage | Motorized XYZ + tilt/rotation |
| Compatible Techniques | XPS, UPS, LEIPS, REELS, AES, HAXPES (with optional Cr/Mg anode), GCIB depth profiling, angle-resolved XPS (AR-XPS) |
| Brand | Makeway |
|---|---|
| Model | MKW-KP002 |
| Origin | Shanghai, China |
| Application Environment | Ambient, Controlled Atmosphere, or Humidity-Regulated Conditions |
| Work Function Resolution | 1–3 meV (2 mm tip), 5–10 meV (50 µm tip) |
| Tip-to-Sample Distance Control | Down to ≤400 nm |
| Digital Control Architecture | Full FPGA-based digital signal processing with ON (Off-Null) detection, Height Regulation (HR), Parallel Plate (PP) oscillation mode, Signal Averaging (SA), Work Function Averaging (WA), Quick-Change Tip (QT), Faraday Cage (FC), TTL Output Channel (OC), Data Export to Excel/Origin (DE) |
| Brand | Makeway |
|---|---|
| Origin | Shanghai, China |
| Model | MKW-KP004 |
| Probe Count | 9 integrated Kelvin probes |
| Maximum Substrate Size | 300 mm (12-inch) wafers |
| Energy Resolution | < 1 meV |
| Probe Tip Diameter | 1.4 mm (metal) |
| Angular Position Sensing Resolution | 1° |
| X-Axis Motorized Travel | > 100 mm, Positioning Accuracy: ±50 µm |
| Rotational Axis | Motorized silicon wafer stage with integrated optical encoder |
| Dead-Zone Minimization | Optimized for small wafers and wafer fragments |
| Work Function Calibration Reference | Integrated HOPG or Au reference |
| Environmental Monitoring | Onboard USB-connected temperature & humidity sensor |
| Faraday Cage | Fully integrated gold-plated steel enclosure |
| Software Control | Scriptable measurement engine supporting user-defined protocols |
| Data Output | Full-wafer, half-wafer, quarter-wafer, line-scan, and point-mode surface potential maps |
| Compliance Framework | Designed for GLP-aligned lab environments |
| Brand | Makeway |
|---|---|
| Origin | Japan |
| Model | 1600 |
| Instrument Type | Temperature-Variable Hall Effect Tester (Microwave-Based, Non-Contact) |
| Operating Frequency | 10 GHz |
| Current Source Range | 20 mA (for auxiliary calibration & optional DC bias) |
| Sample Diameter Support | 4–8 inch wafers |
| Carrier Mobility Range | 100–3000 cm²/V·s |
| Measurement Modes | Single-Point & Area Mapping |
| Compliance | Designed for ISO/IEC 17025-aligned lab environments |
| Brand | Makeway |
|---|---|
| Model | MKW-2800 |
| Measurement Principle | 3ω Method |
| Temperature Control Range | Ambient to 200 °C (typical for thin-film thermal characterization) |
| Electrical Excitation Frequency | 1–10 Hz (optimized for 3ω harmonic detection) |
| Thermal Conductivity Range | 0.1–500 W/(m·K) |
| Resolution | <±2% (relative, under controlled lab conditions) |
| Compliance | ASTM E1461, ISO 22007-4, USP <1031> (thermal property validation) |
| Software Interface | Windows-based with real-time data acquisition, harmonic phase analysis, and temperature-swept conductivity mapping |
| Brand | Makeway |
|---|---|
| Model | MKW-3000 |
| Origin | Shanghai, China |
| Detector Type | Multi-probe EDS-compatible |
| Energy Resolution | 120 eV |
| Operating Environments | High Vacuum & Ambient Air |
| Maximum Beam Scan Area | 60 × 60 mm² |
| Sample Positioning | 4-axis Motorized Stage (Vacuum & Air) |
| Beam Control | Motorized Variable Aperture & Remote Focusing |
| Compliance | Designed for ISO/IEC 17025-aligned radiation effects testing workflows |