OMECK
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| Brand | OMECK |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Domestic |
| Model | DS-1000 |
| Pricing | Upon Request |
| Application Field | General Particle Characterization |
| Instrument Type | Dynamic |
| Lens Count | Lensless Imaging System |
| Measurement Range | 1.4–1400 µm |
| Dispersion Method | Wet Dispersion |
| Image Resolution | 2 Megapixels |
| Primary Measured Parameter | Equivalent Projected Area Diameter (D<sub>EA</sub>) |
| Brand | OMECK |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Model | NS-90 Plus |
| Particle Size Range | 0.3 nm – 10 µm |
| Size Measurement Repeatability | ≤ 1% (NIST-traceable latex standards) |
| Temperature Control Range | 0 – 120 °C |
| Temperature Stability | ±0.1 °C |
| Detection Angle | 90° |
| Measurement Principle | Dynamic Light Scattering (DLS) and Static Light Scattering (SLS) |
| Minimum Sample Volume | 20 µL |
| Sample Concentration Range | ≤ 1 mg/mL (sample-dependent) |
| Measurement Time (per sub-run) | 1.68 s |
| Molecular Weight Range (DLS-derived) | 980 – 2×10⁷ Da |
| Molecular Weight Range (SLS Debye plot) | 342 – 2×10⁷ Da |
| Laser Source | He-Ne gas laser, 632.8 nm, 4 mW |
| Detector | Avalanche Photodiode (APD), QE ≥ 80% @ 632.8 nm |
| Correlator | >4000 channels, 10¹¹ linear dynamic range, minimum sampling interval: 25 ns |
| Compliance | CFDA GMP Annex on Computerized Systems (audit trail, role-based access control, electronic signature) |
| Brand | OMECK |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | OEM/ODM Manufacturer |
| Country of Origin | China |
| Model | NS-90Z Plus |
| Quotation | Upon Request |
| Zeta Potential Range | No Practical Limit |
| Operating Temperature Range | 0–120 °C |
| Repeatability | ≤1% (NIST-traceable latex standard) |