PHI
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| Brand | PHI |
|---|---|
| Origin | Japan |
| Model | PHI 700 |
| Type | Scanning Auger Electron Spectrometer |
| Detection Principle | Auger Electron Spectroscopy (AES) |
| Spatial Resolution | <10 nm (beam diameter) |
| Energy Resolution | ≤0.3% at E₀ = 1 keV |
| Ion Sputtering Energy Range | 0.1–5 keV |
| Maximum Magnification | >500,000× |
| Depth Profiling Capability | Sub-nanometer to several micrometers |
| Sample Stage | High-precision motorized XYZ + tilt/rotation |
| Vacuum System | Ultra-high vacuum (UHV), base pressure ≤2×10⁻¹⁰ Torr |
| Brand | PHI |
|---|---|
| Origin | Japan |
| Model | PHI 700 |
| Type | Scanning Auger Electron Spectrometer |
| Detection Principle | Auger Electron Spectroscopy (AES) |
| Spatial Resolution | <10 nm (typical) |
| Beam Energy Range | 1–20 keV (electron gun) |
| Depth Profiling Capability | Sub-nanometer to several micrometers |
| Energy Resolution | ≤0.3% (ΔE/E at E = 1 keV) |
| Imaging Magnification | Up to 500,000× |
| Vacuum System | Ultra-High Vacuum (UHV), ≤5×10⁻¹⁰ Torr base pressure |
| Sample Stage | High-precision motorized XYZ + tilt/rotation |
| Compliance | ASTM E1508, ISO 18115-2, USP <1057>, GLP/GMP-ready data audit trail |
| Brand | PHI |
|---|---|
| Origin | Japan |
| Model | Genesis 500 |
| Type | Fully Automated Scanning Focused XPS System |
| Sample Stage | Motorized 3-Position Carousel (80 mm × 80 mm trays) |
| Microprobe Spot Size | ≤ 5 µm |
| Depth Profiling | Integrated High-Performance Ar⁺ Ion Gun + Dual-Beam Charge Neutralization |
| Optional Techniques | UPS, LEIPS, REELS, AES, HAXPES, GCIB Sputtering |
| Software Platform | PHI SmartSoft Suite with GLP/GMP-Compliant Audit Trail & 21 CFR Part 11 Support |
| Compliance | ASTM E1521, ISO 18118, ISO 21365, USP <1057>, IEC 62304 |
| Brand | PHI |
|---|---|
| Origin | Japan |
| Model | oTOF 3 |
| Instrument Type | Time-of-Flight (TOF) |
| Primary Beam Energy | 30 kV |
| Mass Range | 15,000 u |
| Mass Resolution | 13,500 |
| Configuration | Parallel Imaging MS/MS |
| Charge Neutralization | Dual-beam (low-energy electrons + low-energy inert gas ions), self-regulating, position-resolved |
| Optional Features | Dual-cluster ion source, sub-500 nm HR2 chemical imaging, DE-free acquisition mode, high beam current HR2 imaging, large angular acceptance & depth of field |