Picosun
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| Brand | Picosun |
|---|---|
| Origin | Finland |
| Model | P-300B |
| Substrate Size | 8-inch (200 mm) |
| Process Temperature | Up to 500 °C |
| Precursor Channels | 8 |
| System Weight | 150 kg |
| Thickness Uniformity | ±1.5% (1σ, across 8″ wafer or batch load) |
| Brand | Picosun |
|---|---|
| Origin | Finland |
| Model | R-Series |
| Substrate Size | 200 mm (8-inch) |
| Process Temperature | Up to 500 °C |
| Precursor Channels | 6 |
| Weight | 350 kg |
| Dimensions (W × H × D) | 146 cm × 146 cm × 84 cm |
| Thickness Uniformity | ±1% |
| Reactor Materials | 316 Stainless Steel, Titanium, Nickel, Aluminum, Quartz |
| Precursor States | Gas, Liquid, Solid |
| Load Lock | Picoloader™ Manual Transfer System with Pre-Vacuum Chamber and Gate Valve |
| Vacuum Pump Capacity | 30–80 m³/h |
| Carrier Gas | ≥99.999% N₂ or Ar, min. 2 slm |
| Power Supply | 100–240 V, 50/60 Hz, 1- or 3-phase, 3.7 kW |
| Cooling | Air-cooled (no external water required) |
| Exhaust | Dedicated for pump and precursor cabinets |