Truth Instruments Company Limited
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| Brand | Truth Instruments Company Limited |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | AtomEdge Pro |
| Pricing | Available Upon Request |
| Brand | Truth Instruments Company Limited |
|---|---|
| Origin | Shandong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | KMPL-PM |
| Pricing | Available Upon Request |
| Brand | Truth Instruments Company Limited |
|---|---|
| Origin | Anhui, China |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Domestic (PRC) |
| Model | MBE-400 |
| Quotation | Upon Request |
| Substrate Heating | 2-inch Wafer Compatibility |
| Base Pressure | ≤1×10⁻¹⁰ mbar |
| Substrate Temperature Control | Room Temperature to 800 °C |
| Effusion Cell Sources | 6–10 Knudsen Cells |
| Brand | Truth Instruments Company Limited |
|---|---|
| Origin | Shandong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | MCT 500 |
| Pricing | Available Upon Request |
| Brand | Truth Instruments Company Limited |
|---|---|
| Origin | Anhui, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | PLD-400 |
| Base Pressure | 5×10⁻⁹ mbar |
| Substrate Heating Range | Room Temperature to 1200 °C |
| Target Configuration | Six 1-inch or Three 2-inch targets (motorized rotation and revolution) |
| Substrate Size | Up to 2-inch wafers |
| Optional Add-ons | Liquid Nitrogen Cryo-Cooling Stage, Load-Lock Transfer Module, Reactive Gas Inlet System (O₂, N₂, Ar), In-situ Quartz Crystal Microbalance (QCM), Predefined Process Recipe Management, High-Pressure RHEED (up to 1×10⁻⁵ mbar), Electron Gun for LEED |
| Brand | Truth Instruments Company Limited |
|---|---|
| Origin | Shandong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | Wafer-MOKE |
| Pricing | Available Upon Request |
| Sample Size | Up to 300 mm (12-inch) wafers, downward compatible with fragments |
| Vertical Field Range | ±2.4 T |
| In-Plane Field Range | ±1.3 T |
| Field Resolution | 0.01 mT |
| Field Uniformity | Better than ±1% over Ø1 mm |
| Kerr Rotation Resolution | 0.3 mdeg (RMS) |
| Throughput | 12 WPH (9 sites, 200 mm wafer, ±1.3 T) |
| Sample Repositioning Accuracy | <10 µm |
| Uptime | ≥90% |
| EFEM Integration | Optional |