ULTECH
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| Brand | ULTECH |
|---|---|
| Origin | South Korea |
| Model | Micro-110 |
| Product Category | Vacuum Probe Station |
| Operation Type | Manual |
| Wafer Size Compatibility | 1–8 inch |
| Temperature Range Options | (a) –40 °C to 200 °C (Peltier), (b) –40 °C to 170 °C (Peltier), (c) RT to 450 °C (Ceramic Heater), (d) RT to 750 °C (Ceramic Heater), (e) 77 K to 300 K (Liquid Nitrogen Cryostat) |
| Vacuum Chamber | Hermetic Sealed with Optical Viewports |
| Gas Delivery | Mass Flow Controller (MFC)-Equipped Multi-Gas Inlet |
| Electrical Interface | Standard Coaxial & Triaxial Feedthroughs |
| Pricing | USD $150,000–$250,000 |
| Brand | ULTECH |
|---|---|
| Origin | South Korea |
| Model | MPS |
| Category | Vacuum Probe Station |
| Operation | Manual |
| Wafer Size Compatibility | 1″ to 8″ |
| Temperature Range Options | −40 °C to 200 °C (Peltier), −40 °C to 170 °C (Peltier), RT to 450 °C (Ceramic Heater), RT to 750 °C (Ceramic Heater), 77 K to 300 K (Liquid Nitrogen Cooling) |
| Vacuum Chamber | Yes, hermetic sealing |
| Gas Delivery | Mass Flow Controller (MFC)-equipped multi-gas inlet |
| Optical Access | Integrated viewport for microscope coupling |
| Electrical Interface | Standard coaxial and triaxial feedthroughs |
| Brand | ULTECH |
|---|---|
| Origin | South Korea |
| Model | ULTECH REAL RTP-100 |
| Instrument Type | High-Vacuum Rapid Annealing Furnace |
| Sample Chamber Dimensions | 870 mm × 650 mm × 620 mm |
| Temperature Range | 100–1250 °C |
| Maximum Ramp Rate | 10–200 °C/s |
| Annealing Temperature Accuracy | ±1.5 °C |
| Temperature Uniformity | ±1.5 °C |
| Vacuum Base Pressure | 5×10⁻³ Torr (standard), down to 5×10⁻⁶ Torr (with dual-stage molecular pump) |
| Gas Lines | Up to 3 MFC-controlled channels |
| Substrate Compatibility | 4-inch wafers |