ULVAC-PHI
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| Brand | ULVAC-PHI |
|---|---|
| Origin | Japan |
| Model | PHI ADEPT-1010 |
| Instrument Type | Quadrupole |
| Primary Beam Energy Range | 0.25–11 keV |
| Mass Range | 1–340 amu |
| Distribution Status | Authorized Distributor (Imported) |
| Brand | ULVAC-PHI |
|---|---|
| Origin | Japan |
| Model | PHI GENESIS 500 |
| Category | Imported Instrument |
| Distribution Status | Authorized Distributor |
| Pricing | Upon Request |
| Brand | ULVAC-PHI |
|---|---|
| Origin | Japan |
| Model | PHI 710 |
| Type | Scanning Auger Electron Spectrometer (AES) |
| SEM Resolution | ≤3 nm |
| AES Spatial Resolution | ≤8 nm (@20 kV, 1 nA) |
| Analyzer Geometry | Coaxial Cylindrical Mirror Analyzer (CMA) |
| Energy Resolution | 0.1% (high-resolution mode) |
| Beam Diameter | 20 nm (adjustable) |
| Ion Gun Sputtering Energy | 0.5 kV (standard configuration) |
| Software Suite | PHI SmartSoft-AES & MultiPak |
| Brand | ULVAC-PHI |
|---|---|
| Origin | Japan |
| Model | PHI 710 |
| Category | Imported Instrument |
| Vendor Type | Authorized Distributor |
| Pricing | Upon Request |
| Brand | ULVAC-PHI |
|---|---|
| Origin | Japan |
| Model | PHI GENESIS 900 |
| Excitation Source | Cr Kα (5414.7 eV) |
| Probe Depth | ~30 nm |
| Spatial Resolution | <10 µm (focused beam mode) |
| Energy Resolution | <0.3 eV (at Fermi edge, pass energy 20 eV) |
| Analyzer Type | Hemispherical Deflector Analyzer (HDA) with 180° double-pass optics |
| Vacuum System | UHV base pressure <5×10⁻¹⁰ Torr |
| Automation | Fully motorized sample stage, multi-axis tilt/rotation, in-situ transfer capability |
| Brand | ULVAC-PHI |
|---|---|
| Origin | Japan |
| Model | PHI oTOF3+ |
| Type | TOF-SIMS Instrument with TRIFT Analyzer |
| Ion Sources | Liquid Metal Ion Gun (Ga⁺), Optional Ar-GCIB, Cs⁺, O₂⁺ |
| Spatial Resolution | <50 nm (high-resolution mode), <500 nm (high-mass-resolving mode) |
| Automation | Fully Automated Sample Transfer & Unattended Multi-Sample Analysis |
| Charge Neutralization | Dual-Beam Electron/Ar⁺ Neutralization System |
| Optional Features | Parallel Imaging MS/MS, FIB Cross-Sectioning, Cryo-Stage, Detachable Glovebox Integration |
| Compliance | Designed for GLP/GMP environments |