UniTemp
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| Brand | UniTemp |
|---|---|
| Origin | USA |
| Model | 2Z-HVS-200 |
| Vacuum Level | ≤1×10⁻⁶ hPa |
| Max Temperature | 450 °C |
| Programmable Steps | 100 per Recipe, 20 Recipes Stored |
| Optical Process Monitoring | 360° Quartz Viewing Cylinder |
| Cooling | Active Water-Cooled Lower Platen + External Closed-Loop Chiller Recommended (Optional Accessory WC-I) |
| Controller | Siemens SIMATIC® S7-1200 PLC with HMI Interface |
| Data Logging | Real-Time Temperature, Pressure, Gas Flow, and Time Stamping |
| Brand | UniTemp |
|---|---|
| Model | PTP-300 |
| Origin | Germany |
| Chamber Dimensions (Process Zone) | 305 mm × 305 mm × 25 mm |
| Chamber Height | 35 mm |
| Chamber Material | Anodized Aluminum or Optional Quartz Glass |
| External Dimensions | 600 mm × 1850 mm × 880 mm (W × D × H) |
| Gas Inlets | 2 × MFC-controlled lines |
| Vacuum Interface | DN25 KF flange |
| Microwave Generator | 2.45 GHz, 100–600 W (water-cooled, optional chiller) |
| Heating System | 24 IR lamps, total 18 kW |
| Control System | B&R SPS controller PP420 with LCD interface |
| Power Supply | 3/N/PE, AC 50/60 Hz, 230/400 V |
| Brand | UniTemp |
|---|---|
| Origin | Germany |
| Model | RTP-200-HV |
| Instrument Type | High-Vacuum Rapid Thermal Annealing Furnace |
| Sample Size | 200 mm (8-inch wafer) |
| Temperature Range | 0–1200 °C |
| Max. Ramp Rate | 150 °C/s |
| Max. Cool-down Rate | 200 °C/min (from 1000 °C to 400 °C) |
| Temperature Accuracy | < ±1% of setpoint |
| Temperature Uniformity | < ±1% across wafer surface |
| Vacuum Level | ≤1×10⁻⁶ hPa (high-vacuum configuration) |
| Heating Source | Dual-zone halogen lamp array (top & bottom) |
| Cooling Method | Water-cooled chamber + N₂ purge for substrate |
| Gas Control | Up to 4 MFC-controlled lines (N₂, Ar, O₂, H₂/N₂ mix) |
| Control System | SIMATIC S7-based PLC with 7″ HMI touchscreen |
| Program Storage | 50 multi-segment recipes (up to 50 steps each) |
| Dimensions (W×D×H) | 505 × 504 × 420 mm |
| Weight | ~55 kg |
| Brand | UniTemp |
|---|---|
| Model | VSS-300 |
| Origin | Germany |
| Chamber Dimensions | 350 × 350 × 75 mm (expandable to 300 mm height) |
| Max Ramp-Up Rate | 150 K/min |
| Max Ramp-Down Rate | 120 K/min |
| Bottom Heating Power | 2 × 12-lamp arrays, 18 kW total |
| Cooling | Water-cooled graphite plate (310 × 310 mm) |
| Control System | SIMATIC PLC with 7" touchscreen HMI |
| Programmable Steps | 50 programs × 50 steps each |
| Process Gas Flow | Standard 1.5 sL/min MFC (up to 4 gas lines optional) |
| Vacuum Options | MPC (10 hPa) or RVP (10⁻³ hPa) |
| Power Supply | 3-phase + N + PE, 230 V, CEE 3×32 A |
| Weight | ~140 kg |
| Compliance | Designed for ISO 9001-compliant SMT manufacturing environments |
| Enclosure Material | Polished aluminum chamber walls (stainless steel optional) |