Coating Machine
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| Brand | 4IR |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | CPT-230 |
| Price Range | USD 14,000 – 42,500 |
| Brand | Abner |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | ABN-500-Y1 |
| Vacuum Base Pressure | ≤4×10⁻⁵ Pa |
| Pump-Down Time | ≤30 min to 5×10⁻⁴ Pa |
| Thickness Uniformity | ±3% (max deviation ±5%) |
| Thickness Control Accuracy | ±5% |
| Deposition Rate | Up to 5 nm/s (material- and source-dependent) |
| Process Duration Range | 0–30 min |
| Cooling | Water-cooled electrodes and chamber flanges |
| Safety Interlocks | Vacuum, overcurrent, and cooling water flow monitoring |
| Brand | Abner |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | ABN-500-Y2 |
| Base Price | USD 67,000 (FOB Jiangsu) |
| Operating Pressure Range | 5×10⁻⁵ Pa – 5×10⁻³ Pa |
| Gas Inlets | 2 independent MFC-controlled channels |
| Substrate Heating | RT to 300 °C |
| Max DC/RF Current | 0.1–100 A |
| RF Power Stability | ≤5% |
| Target Diameter | 6 inch |
| Uniformity | ±3% over Ø100 mm substrate |
| Compatible Power Modes | DC, RF, Pulsed DC |
| Brand | Abner |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | EI Series |
| Pricing | Available Upon Request |
| Brand | AdNaNo |
|---|---|
| Origin | USA |
| Model | Customized-5 |
| Maximum Substrate Size | 8-inch |
| Vacuum System | High-vacuum compatible (customizable base pressure ≤ 5×10⁻⁷ Torr) |
| Evaporation Sources | Dual resistive-heating crucibles (compatible with metals & organics) |
| Control Options | Manual and fully automated PLC-based operation |
| Substrate Heating | Integrated temperature-controlled stage (up to 300 °C, ±1 °C stability) |
| Compliance | Designed for ISO 14644-1 Class 5 cleanroom integration |
| Software Interface | RS-485/Modbus-enabled for SCADA or LabVIEW integration |
| Brand | AdNaNo |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Import Status | Imported |
| Model | Customized-6 |
| Vacuum Chamber Dimensions | Custom |
| Base Pressure | ≤6.0 × 10⁻⁵ Pa |
| Evaporation Sources | 6 × 40 cm³ Crucibles |
| Substrate Heating Capability | Up to 300 °C |
| Intra-Wafer Thickness Uniformity | ≤ ±3% |
| Substrate Holder Configurations | Arch-type and Planetary-type Rotating Fixtures |
| Control System | Fully Automated Process Sequencing |
| Sample Size & Quantity | Fully Customizable |
| Brand | AGUS |
|---|---|
| Origin | Japan |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | SSP-1000 |
| Price Range | USD 110,000 – 138,000 |
| Maximum Substrate Diameter | φ100 mm |
| Thickness Uniformity | ±5% over φ100 mm area |
| RF Power Mode | Pulsed RF (13.56 MHz) |
| Gas Inlets | Standard 1, Optional 2 |
| Sputtering Orientation | Upward, Lateral, Downward (reconfigurable cubic chamber) |
| Target Compatibility | Metallic, Oxide (e.g., Al₂O₃, SiO₂), Nitride, and Magnetic Targets (optional) |
| Substrate Holder | Rotatable or Fixed |
| Viewport | Integrated Quartz Observation Window |
| Cathode Shielding | Removable Cathode Protection Plate with Integrated Sputter Timer for Thickness Estimation |
| Brand | Diener |
|---|---|
| Origin | Germany |
| Model | P6 |
| Coating Types | Parylene N, C, D, F-VT4 |
| Coating Thickness Range | 0.05–20 µm |
| Chamber Dimensions (Ø × H) | 200 × 200 mm |
| Substrate Holder (Ø × H) | 170 × 170 mm |
| Pyrolyzer Power / Max Temp | 1.6 kW / 750 °C |
| Vacuum Pump | Dual-stage oil-sealed rotary vane pump |
| Pumping Speed | 16 m³/h |
| Base Pressure | ≤1 × 10⁻³ mbar |
| Control System | Integrated Windows-based PC |
| Electrical Supply | 230 V / 16 A / 50–60 Hz |
| Overall Dimensions (W × D × H) | 700 × 500 × 700 mm |
| Brand | DRETOP |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Region Category | Domestic (China) |
| Model | VAC-Flux90 |
| Price Range | USD 1,400 – 8,500 |
| Power Supply | AC 220 V, 50 Hz |
| Control System | PLC-based Intelligent Touchscreen Interface |
| Temperature Range | RT +10 °C to 200 °C |
| Temperature Resolution | 0.1 °C |
| Temperature Uniformity | ±0.1 °C |
| Ultimate Vacuum | ≤133 Pa |
| Chamber Dimensions (W×D×H) | 450 × 450 × 450 mm |
| Internal Volume | 90 L |
| Sample Capacity | Up to 4 standard wafer cassettes (e.g., 25–50 × 100 mm or 4 × 150 mm wafers) |
| Shelf Configuration | 2-tier stainless steel adjustable trays |
| Construction | 304 stainless steel interior and exterior |
| Viewing Window | Tempered glass with silicone gasket seal |
| HMDS Delivery | Closed-loop, nitrogen-carrier vaporized dosing system |
| Exhaust Handling | Integrated vacuum-pump–coupled exhaust line for HMDS-laden vapor to dedicated abatement or scrubber system |
| Brand | DRETOP |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | ZDM-125V |
| Vacuum Level | ≤133 Pa |
| Chamber Dimensions | 500 × 500 × 500 mm |
| Internal Volume | 125 L |
| Temperature Range | RT+10°C to 200°C |
| Temperature Resolution | 0.1°C |
| Temperature Uniformity | ±0.1°C |
| Control System | PLC-based HMI with Color Touchscreen |
| Sample Capacity | Up to 4 wafer cassettes (standard 4-inch or 6-inch compatibility) |
| Chamber Material | Stainless Steel (304/316L grade) |
| Viewing Window | Tempered Glass with O-ring Sealed Access Door |
| Sealing | Integrated Silicone Rubber Gasket |
| Structural Design | Cuboidal Rigid Frame with Right-Angle Reinforcement |
| Compliance | RoHS, REACH, ISO 14644-1 Class 8 Cleanroom-Compatible Construction |
| Brand | DRETOP |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | ZDM-215V |
| Price Range | USD 5,600 – 16,800 |
| Power Supply | AC 220 V, 50 Hz |
| Control System | PLC-based intelligent touchscreen interface |
| Temperature Range | RT +10 °C to 200 °C |
| Temperature Resolution | 0.1 °C |
| Temperature Uniformity | ±0.1 °C |
| Ultimate Vacuum | ≤133 Pa |
| Chamber Dimensions (W×D×H) | 550 × 550 × 650 mm |
| Internal Volume | 210 L |
| Sample Capacity | Up to 4 standard wafer cassettes (e.g., 4 × 25-wafer FOUPs or equivalent) |
| Chamber Material | 304 stainless steel interior |
| Viewing Window | Tempered glass with O-ring sealed viewport |
| Sealing | Integrated silicone rubber gasket |
| Process Compatibility | Thermal evaporation, magnetron sputtering, pulsed laser deposition (PLD), molecular beam epitaxy (MBE), and plasma-enhanced chemical vapor deposition (PECVD) modules (modular integration supported) |
| Exhaust Treatment | Integrated HMDS/organic solvent recovery system compliant with RoHS & REACH |
| Brand | KJ GROUP |
|---|---|
| Origin | Liaoning, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | VTC-100PAX |
| Quotation | Upon Request |
| Motor Power | 100 W |
| Input Power | 220 V, 50 Hz |
| Max Speed | 10,000 rpm |
| Min Speed | 500 rpm |
| Acceleration Range | 100–2,000 rpm/s |
| Program Steps per Recipe | 9 |
| Time per Step | 0–999 s |
| Stored Recipes | 6 |
| Vacuum Requirement | 0.06–0.09 MPa |
| Vacuum Port OD | 6 mm |
| Dimensions (W×D×H) | 270 × 430 × 400 mm |
| Weight | 12 kg |
| Brand | KYKY |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | SBC-2 |
| Vacuum System | Mechanical Pump + Turbo Molecular Pump |
| Ultimate Vacuum | ≤2 × 10⁻³ Pa |
| Sputtering Voltage | 3 kV |
| Sample Stage Motion | Planar Rotation + Tilt Rotation |
| Carbon Evaporation Target Diameter | Φ38 mm |
| Sample Holder Diameter | Φ40 mm |
| Bell Jar Dimensions | Φ250 mm × H340 mm |
| Evaporation Glass Dome | Φ88 mm × H140 mm |
| Sputtering Glass Dome | Φ88 mm × H57 mm |
| Brand | Nano-Master |
|---|---|
| Origin | USA |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Imported Equipment |
| Model | NTE-3500 (M) |
| Price Range | USD 110,000 – 140,000 |
| Brand | Oxford Instruments |
|---|---|
| Origin | United Kingdom |
| Model | PlasmaPro 100 Cobra |
| Wafer Capacity | Single-wafer and batch processing up to 200 mm |
| Temperature Range | −150 °C to +400 °C |
| Electrode Cooling/Heating | Liquid nitrogen, recirculating chiller, or resistive heating |
| RF Power Delivery | Top-mounted electrode with dual-frequency (LF/RF) capability |
| ICP Source Options | 65 mm, 180 mm, 300 mm |
| Process Pressure Range | Wide operational window enabled by high-pumping-speed vacuum system |
| Substrate Thickness Compatibility | Up to 10 mm |
| Backside He–cooling | Integrated electrostatic chuck with helium backside cooling |
| Endpoint Detection | Real-time optical emission spectroscopy (OES) monitoring |
| Chamber Architecture | Symmetric, low-inductance plasma chamber with uniform gas distribution and high-conductance pumping path |
| Brand | TQC Sheen |
|---|---|
| Origin | Netherlands |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Automatic Film Applicator |
| Pricing | Upon Request |
| Traverse Speed | 0.1–500 mm/s |
| Stroke Length | 50–430 mm (1.97–16.34 in) |
| Vacuum Zones | DIN A5, DIN A4, DIN A3 |
| Control Interface | 5-key navigation switch, optional mouse & keyboard |
| Memory Capacity | Expanded user profile storage |
| Optional Heating Module | Integrated temperature-controlled base for thermal coating studies |
| Brand | ULVAC |
|---|---|
| Model | EI-5Z |
| Evaporation Sources | Dual-mode (Electron Beam + Resistive Thermal) |
| Substrate Compatibility | 2–8 inch wafers (Si, GaAs, glass, ceramics) |
| Base Pressure | ≤3.0 × 10⁻⁵ Pa |
| Pumping Speed | Achieves 3.0 × 10⁻⁴ Pa in ≤20 min |
| Thickness Uniformity | ±5% across substrate |
| Control System | Fully Automated PLC-Based Interface |
| Chamber Configuration | Vertical-Incidence Deposition |
| Optional Integration | Wall-Through (Penetrating) Design |
| Material Compatibility | Au, Ag, Al, Cr, Ni, Ti, ITO, SiO₂, Al₂O₃, and other conductive/insulating evaporants |
| Brand | VPI |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | SD-650MHG |
| Target Diameter | 2 inches |
| Vacuum System | High-vacuum compatible (≤5×10⁻⁶ Torr base pressure) |
| Integration Interface | Front-mounted flush-mount viewport with CF-40 or KF-40 vacuum flange |
| Sealing Standard | Metal-gasketed static seal compliant with ISO-KF and ISO-FM specifications |
| Power Supply | DC/RF configurable (optional upgrade) |
| Substrate Holder | Manual tilt-adjustable stage (max. Φ100 mm) |
| Brand | Zehntner |
|---|---|
| Origin | Switzerland |
| Model | ZUA 2000 |
| Wet Film Thickness Range | 0–3000 µm |
| Adjustable Increment | 5 µm |
| Available Wet Film Widths | 60 mm, 80 mm, 100 mm, 150 mm |
| Body Material | Anodized Aluminum Alloy (Acid- and Alkali-Resistant) |
| Disassembly | Fully Serviceable for Solvent Cleaning |
| Compliance | Designed to Support ASTM D823, ISO 2808, and ISO 15184 Test Protocols |
| Brand | ZKCY |
|---|---|
| Origin | Beijing, China |
| Model | SC600T |
| Vacuum Chamber Dimensions | 170(L)×150(H)×163.5(D) mm |
| External Dimensions | 278(L)×494(H)×467(D) mm |
| Ultimate Vacuum | ≤5×10⁻³ Pa |
| Main Pump | 90 L/s Turbo-Molecular Pump + Rotary Vane Pump (dry pump optional) |
| Sputtering Target | Φ50 mm, thickness 0.1–2 mm |
| Sputtering Current | 1–200 mA (1 mA step) |
| Coating Time | 1–9999 s (1 s step) |
| Evaporation Source | High-Purity Carbon Fiber |
| Evaporation Modes | Continuous & Pulsed |
| Sample Stage | Φ80 mm, motorized tilt, lift, and rotation |
| Pre-Sputtering | Fully Automated |
| Real-Time Monitoring | Vacuum Pressure & Current Curve Display |
| Power Supply | AC 220 V / 50 Hz, <1000 W |