Dry Cleaning Equipment
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| Brand | EWIN-TECH |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Regional Classification | Domestic (China) |
| Model | PCS-8LA |
| Pricing | Upon Request |
| Brand | Guarder |
|---|---|
| Origin | Shandong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | GDR-30PR |
| Dimensions (W×D×H) | 630 × 650 × 420 mm |
| Chamber Volume | ~30 L (290 × 290 × 360 mm) |
| Electrode Size | 180 × 210 mm (capacitively coupled, internal) |
| RF Generator | 13.56 MHz, 0–300 W continuous adjustable output with auto-impedance matching |
| Optional | 40 kHz medium-frequency plasma source |
| Control System | 7-inch HMI touchscreen + PLC (Omron/Siemens components), manual/auto modes |
| Vacuum System | Leybold vacuum pump, SMC isolation & vent valves, Inficon pressure sensor |
| Pressure Control | PID closed-loop regulation, ±1 Pa accuracy |
| Gas Delivery | Dual-channel, FITOK gas lines, mass flow controllers + needle valves |
| Operating Modes | RIE (Reactive Ion Etching) and PE (Plasma Enhanced) selectable |
| Compliance | Designed for ISO Class 5–7 cleanroom environments, compatible with GLP laboratory workflows |
| Brand | LEBO Science |
|---|---|
| Origin | Jiangyin, Jiangsu, China |
| Model | UC100-SE |
| Rated Voltage | AC 220 V, 50 Hz |
| Lamp Power | 275–300 W |
| Lamp Lifetime | ≥8,000 h |
| Emission Wavelengths | 184/185 nm + 254 nm |
| Maximum Substrate Size | ≤8-inch (200 mm) |
| Dimensions (W×D×H) | 330 × 400–420 × 315 mm |
| Weight | 15–16 kg |
| Brand | Nano-Master |
|---|---|
| Origin | Germany |
| Model | SWC-3000 |
| Maximum Substrate Size | 300 mm (12") round or 230 mm × 230 mm (9" × 9") square |
| Control System | Microprocessor-based automation |
| Optional Modules | PVA brush station, Chemical Dispense Unit (CDU), N₂ ionizer, IR drying lamp, custom photomask/wafer chucks |
| Brand | PVA TePla |
|---|---|
| Origin | USA |
| Model | 80 Plus |
| Plasma Source Options | RF (13.56 MHz) or Microwave (2.45 GHz) |
| Chamber Configuration | Electrode-equipped (RF) or Electrode-less (Microwave) |
| Operation Modes | Manual and Automated Integration Capable |
| Compliance | Designed for Semiconductor Cleanroom Environments (Class 100 / ISO Class 5 compatible) |
| Integration | Standalone or Inline Production Line Compatible |
| Software Interface | Intuitive GUI with Parameter Logging and Recipe Management |
| Brand | UniTemp |
|---|---|
| Model | PTP-300 |
| Origin | Germany |
| Chamber Dimensions (Process Zone) | 305 mm × 305 mm × 25 mm |
| Chamber Height | 35 mm |
| Chamber Material | Anodized Aluminum or Optional Quartz Glass |
| External Dimensions | 600 mm × 1850 mm × 880 mm (W × D × H) |
| Gas Inlets | 2 × MFC-controlled lines |
| Vacuum Interface | DN25 KF flange |
| Microwave Generator | 2.45 GHz, 100–600 W (water-cooled, optional chiller) |
| Heating System | 24 IR lamps, total 18 kW |
| Control System | B&R SPS controller PP420 with LCD interface |
| Power Supply | 3/N/PE, AC 50/60 Hz, 230/400 V |
| Brand | VC Plasma |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | AP-C350 |
| Pricing | Available Upon Request |
| Brand | VC Plasma |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | 441 |
| Quotation | Upon Request |
| Frame Material | Full Aluminum Extrusion |
| Enclosure | 441-Series Steel Sheet Housing |
| Motor-Controlled Axes | 3-axis (X/Y/Z) |
| Drive System | Stepper Motors + Synchronous Belt Transmission |
| Working Envelope | X: 400 mm |
| Y | 400 mm |
| Z | 100 mm |
| Compatible Processes | Low-temperature Plasma Cleaning, Dry Ice Jet Cleaning, Precision Dispensing |
| Brand | VC Plasma |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | MicroClean Series |
| Pricing | Available Upon Request |
| Brand | VC Plasma |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | VC-004 |
| Pricing | Available Upon Request |
| Brand | VC Plasma |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | VC-011 |
| Pricing | Available Upon Request |
| Brand | VC Plasma |
|---|---|
| Model | VC-C500 |
| Origin | Guangdong, China |
| Equipment Type | Dry Cleaning System for Semiconductor Wafer & Precision Component Handling |
| Automation Level | Fully Automated (PLC + HMI Controlled) |
| Positioning Accuracy | ±0.1 mm |
| Repeatability | ±0.05 mm |
| Z-Axis Adjustment Range | 100 mm (Manual) |
| Conveyor Speed | Adjustable from 2–5 m/min |
| Electrostatic Neutralization | Integrated Pulsed DC Ionizer |
| Dust Collection Principle | High-Efficiency Negative-Pressure Vacuum Capture |
| Modular Expandability | Optional Plasma Activation Module |
| Compliance Framework | Designed for ISO Class 5–7 cleanroom integration |
| Control Interface | Industrial Touchscreen HMI with Real-Time Status Monitoring and Mode Switching (Manual/Automatic) |