Electron Microscope Sample Preparation Equipment
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| Brand | Abbe / Ionbeam |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | OEM Manufacturer |
| Region Category | Domestic (China) |
| Model | AL-2000 |
| Pricing | Upon Request |
| Sample Diameter Capacity | Ø0–25 mm |
| Ultimate Vacuum | 5 × 10⁻³ Pa (without Ar gas) |
| Acceleration Voltage Range | 200–10,000 V |
| Brand | Abel/Ionbeam |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Region Classification | Domestic (China) |
| Model | AL-1000 |
| Pricing | Upon Request |
| Maximum Sample Diameter | Ø25 mm and Ø50 mm |
| Minimum Particle Size | ~3 nm |
| Ion Beam Energy Range | 200–6000 V |
| Base Vacuum | ≤5×10⁻³ Pa (without Ar flow) |
| Sample Stage | Motorized Rotation |
| Cooling Option | Peltier-based Semiconductor Cooling (optional) |
| Integrated Functions | Plasma Cleaning + Ion Beam Sputtering + Reactive Ion Beam Etching (with reactive gas inlet) |
| Control System | Digital Automated Controller with Real-time Parameter Logging |
| Brand | Abel/Ionbeam |
|---|---|
| Origin | Beijing, China |
| Manufacturer | Yes |
| Country of Origin | China |
| Model | AL-1600 |
| Vacuum Base Pressure | ≤5×10⁻³ Pa (without Ar flow) |
| Acceleration Voltage Range | 200–6000 V |
| Sample Stage | Rotatable |
| Ion Source | Single Ion Gun |
| Cooling Option | Thermoelectric (optional) |
| Glovebox Integration | Yes |
| Primary Functions | Plasma Cleaning, Ion Beam Sputter Deposition, Reactive Ion Beam Etching (with reactive gas introduction) |
| Beam Uniformity | Optimized for Ø25 mm and Ø50 mm substrates |
| Typical Deposited Grain Size | ~3 nm |
| Low-Energy Ion Impact | Minimized substrate damage, suitable for thermally sensitive samples |
| In-situ Cleaning & Deposition | Integrated within single vacuum chamber |
| Control System | Digital, Programmable, Automated |
| Brand | Abel / Ionbeam |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Product Category | Domestic |
| Model | AL-2600 |
| Pricing | Upon Request |
| Brand | Agar Scientific / Oxford Instruments |
|---|---|
| Origin | UK |
| Model | AGB7341 |
| Chamber Dimensions | 120 mm Ø × 120 mm H (optional 150 mm × 165 mm) |
| Sample Stage Capacity | 12 standard pin-type stubs |
| Stage Height Adjustment Range | 0–60 mm |
| Sputter Head | Low-voltage planar magnetron |
| Target Diameter/Thickness | 57 mm Ø × 0.1 mm |
| Standard Target Material | Au |
| Optional Targets | Pt, Au/Pd, Pt/Pd, Ag |
| Max Current | 40 mA |
| Current Control Range | 0–50 mA |
| Vacuum Range | Atmosphere to 1 × 10⁻³ mbar |
| Process Gas | Argon (≥99.9% purity) |
| Pumping Speed | 2 L/s mechanical pump |
| Power Supply | 220 V, 50/60 Hz |
| Digital Timer | 0–300 s with pause function |
| Safety Features | Vacuum interlock, over-current protection |
| Optional Quartz Crystal Thickness Monitor | In-situ nanoscale monitoring (resolution: 0.1 nm) |
| Brand | Agar Scientific / Oxford Instruments |
|---|---|
| Origin | United Kingdom |
| Model | AGB7367A |
| Chamber Dimensions | 120 mm Ø × 120 mm H (glass) |
| Sample Stage | Stainless steel, accommodates up to 12 pin-type stubs, height adjustable over 30 mm range |
| Evaporation Source | High-purity graphite rod, 6.15 mm diameter |
| Power Control | Microprocessor-based, remote voltage/current sensing |
| Max Current | 180 A |
| Voltage Range | 0.1–5.5 V (digital setpoint) |
| Current Range | 0–200 A |
| Vacuum Gauge | Analog, 1 atm to 0.001 mbar |
| Pumping Speed | 2 L/s mechanical pump, reaches ≤0.1 mbar in 25–30 s |
| Operating Voltage | 220 V, 50/60 Hz |
| Optional QCM Thickness Monitor | 6 MHz quartz crystal, in-situ nanometric resolution (±0.1 nm for carbon) |
| Safety | Vacuum interlock, overcurrent protection |
| Operation Modes | Automatic (programmable timer: 1–30 s) and manual |
| Auto-vent Function | Yes |
| Compatibility | Zeiss, JEOL, Hitachi, Thermo Fisher (FEI), Tescan, Phenom SEM platforms |
| Brand | Aibo |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | AL-900 |
| Pricing | Available Upon Request |
| Brand | Beam Convergence |
|---|---|
| Model | GVC2000 |
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Pricing | Upon Request |
| Brand | Beam Convergence |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Model | GVC5000T |
| Dimensions | 480(L)×390(D)×460(H) mm |
| Power Supply | 220 VAC / 1200 W |
| Sputtering Target Diameter | φ57 mm |
| Sputtering Current Range | 5–200 mA |
| Sputtering Time Range | 0–999 s |
| Evaporation Source | φ0.8 mm Carbon Fiber |
| Evaporation Sources | 1–4 units |
| Evaporation Modes | Continuous & Pulsed |
| Vacuum Chamber | Borosilicate Glass, φ200×130 mm |
| Base Pressure | <5×10⁻³ Pa |
| Pumping Speed | 90 L/s (Turbo) + 1.1 L/s (Rotary) |
| Pump-Down Time | ≤5 min to 5×10⁻³ Pa |
| Human-Machine Interface | 7-inch TFT Color Touchscreen |
| Maximum Sample Stage Diameter | φ125 mm |
| Pre-Sputtering | Integrated Automatic Baffle |
| Protection Features | Overcurrent, Vacuum Interlock, Turbo Pump Thermal Protection |
| Anti-Contamination Design | Dual-Isolation Architecture for Sputtering & Evaporation Modules |
| Optional Quartz Crystal Thickness Monitor | Real-time Thickness Display, Setpoint Control, Resolution: 0.1 nm, Range: 1–999 nm per cycle, Max. Measurable Thickness: 10 μm |
| Brand | Fischione |
|---|---|
| Origin | USA |
| Model | 1040 |
| Ion Beam Energy Range | 50–8,000 eV |
| Minimum Beam Energy | 50 eV |
| Focused Beam Spot Size | ≤1 µm |
| Imaging Mode | Argon Ion-Induced Secondary Electron Imaging |
| Cooling Stage | Liquid Nitrogen Cooled (−196 °C) |
| Beam Steering Accuracy | <100 nm positional repeatability |
| Vacuum Requirement | ≤5×10⁻⁶ Torr |
| Brand | Fischione |
|---|---|
| Origin | USA |
| Manufacturer Status | Authorized Distributor |
| Origin Category | Imported |
| Model | 170 |
| Price | Upon Request |
| Brand | Leica |
|---|---|
| Origin | Germany |
| Model | EM ACE200 |
| Configuration Options | Sputter Coating / Carbon Evaporation / Dual-Source Interchangeable Setup |
| Optional Modules | Quartz Crystal Thickness Monitor, Planetary Rotating Stage, Glow Discharge Unit |