Electron Probe Microanalyzer
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| Brand | JEOL |
|---|---|
| Origin | Japan |
| Model | JXA-8230 |
| Accelerating Voltage | 0.2–30 kV (0.1 kV step) |
| Beam Current Range | 1×10⁻¹² – 1×10⁻⁵ A |
| Beam Current Stability | ±5% / h, ±0.3% / 12 h |
| Secondary Electron Resolution | 6 nm (W filament, WD = 11 mm, 30 kV) |
| Magnification | ×40 – ×300,000 |
| Max. Sample Size | 100 mm × 100 mm × 50 mm (H) |
| WDS Elemental Range | Be*¹–U (Be requires optional crystal) |
| EDS Elemental Range | B–U |
| WDS Wavelength Range | 0.087–9.3 nm |
| EDS Energy Range | 0–20 keV |
| WDS Spectrometers | 1–5 channels (configurable) |
| EDS Detector | 1 SDD (optional fanless digital pulse processor) |
| Display | Dual LCDs (1280×1024), dedicated for EPMA analysis and SEM/EDS operation |
| Brand | Shimadzu |
|---|---|
| Origin | Japan |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Import Status | Imported |
| Model | EPMA-1720 Series |
| Pricing | Available upon Request |
| Brand | Shimadzu |
|---|---|
| Origin | Japan |
| Model | EPMA-1720 |
| Analytical Range | Be (4) to U (92) |
| Electron Source | Tungsten (W) filament and Cerium Hexaboride (CeB₆) filament |
| Secondary Electron Image Resolution | 6 nm (W), 5 nm (CeB₆) |
| X-ray Take-off Angle | 52.5° |
| Spectrometer Type | Full-focusing Wavelength Dispersive Spectrometer (WDS) |
| Detector Configuration | High-sensitivity, high-resolution WDS system |
| Compliance | Designed for ISO/IEC 17025-compliant laboratories |
| Brand | Shimadzu |
|---|---|
| Origin | Japan |
| Manufacturer | Shimadzu Corporation |
| Type | Imported Instrument |
| Model | EPMA-8050G |
| Pricing | Available Upon Request |
| Brand | Shimadzu |
|---|---|
| Origin | Japan |
| Model | EPMA-8050G |
| Beam Current Range | Up to 1 µA |
| Secondary Electron Resolution | 3 nm at 30 kV |
| X-ray Take-off Angle | 52.5° |
| X-ray Spectrometer | Five-channel, high-sensitivity, high-resolution WDS with full-focus crystals |
| X-ray Element Coverage | Be (4) to U (92) |
| Emission Source | High-brightness Schottky field-emission gun |
| Vacuum Architecture | Dual-stage orifice differential pumping system with ultra-high vacuum (UHV) electron gun chamber |