Energy Spectrometry Instruments
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| Brand | AERO |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | NSpec |
| Energy Resolution | ≤ 1.85 keV @ 1.33 MeV |
| Relative Efficiency | 20% @ 1.33 MeV (vs. 3"×3" NaI, Co-60, 25 cm) |
| Resolution @ 122 keV | ≤ 875 eV |
| Peak-to-Compton Ratio | ~51:1 |
| FWTM/FWHM | 1.9 |
| FWFM/FWHM | 2.65 |
| Energy Range | 40–3000 keV |
| Cooling Method | Liquid Nitrogen Cryogenic |
| Form Factor | Integrated Miniaturized Unit (Detector + Dewar + MCA + Display) |
| Brand | Angstrom |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported Instrument |
| Model | ELS5000 |
| Pricing | Upon Request |
| Brand | Angstrom |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | ELS5000 |
| Pricing | Upon Request |
| Brand | Angstrom (USA) |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported Instrument |
| Model | LUMO |
| Pricing | Upon Request |
| Brand | Angstrom (USA) |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported Instrument |
| Model | LUMO |
| Pricing | Upon Request |
| Brand | Csi-lab |
|---|---|
| Model | HR-ARPES200 |
| Energy Resolution | ≤1.8 meV |
| Base Temperature | ≤6.0 K |
| Photon Flux | ≥6×10¹¹ ph/s |
| Origin | Jiangsu, China |
| Distribution Type | Authorized Distributor |
| Brand | IONTOF |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Qtac |
| Quotation | Upon Request |
| Ion Species | 3He⁺, 4He⁺, 20Ne⁺, 40Ar⁺, 84Kr⁺ |
| Ion Gun Energy Range | 1,000–8,000 eV |
| Ion Beam Current | 1 pA–100 nA |
| Maximum Ion Beam Scan Area | 4 × 4 mm² |
| Minimum Beam Spot Size (Standard Source) | < 15 µm (< 20 µm for He⁺) |
| Minimum Beam Spot Size (High-Brightness Source) | < 5 µm |
| Sensitivity | > 75,000 counts/nC (measured using 5 keV 20Ne⁺ scattering from pure Cu) |
| Mass Resolution (m/Δm) | > 35 (FWHM) on Cu |
| Detection Limit (for Au) | < 100 ppm |
| Brand | Angstrom |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | LEED 800 |
| Pricing | Upon Request |
| Brand | Angstrom |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | LEED 800 |
| Pricing | Available Upon Request |
| Brand | Angstrom (USA) |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | RVL2000 |
| Pricing | Upon Request |
| Brand | Angstrom (USA) |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | RVL2000 |
| Pricing | Upon Request |
| Brand | Makeway |
|---|---|
| Origin | Shanghai, China |
| Model | MKW-5250 |
| Energy Resolution | 40 meV |
| X-ray Source | Al Kα (1486.6 eV) |
| Spatial Resolution | ≤ 5 µm (focused monochromated beam) |
| Analysis Area | Up to 300 µm × 300 µm |
| Detection Sensitivity | 11,800 kcps (for C 1s at pass energy 20 eV) |
| Sample Stage | Motorized XYZ + tilt/rotation |
| Compatible Techniques | XPS, UPS, LEIPS, REELS, AES, HAXPES (with optional Cr/Mg anode), GCIB depth profiling, angle-resolved XPS (AR-XPS) |
| Brand | NanoMagnetics |
|---|---|
| Origin | United Kingdom |
| Model | LT-AFM/MFM |
| Cooling System | Cryogen-Free Closed-Cycle Cryostat |
| Temperature Range | 1.5 K – 400 K (base temperature ≤1.5 K) |
| Maximum Magnetic Field | 20 T |
| Vibration Isolation | Active + Passive Vibration-Free Design |
| Operation Mode | Fully Dry, Helium-Free |
| Sample Stage Travel (Z) | 10 mm |
| Sample Stage Travel (XY) | Ø3 mm |
| Sample Positioning Resolution | 2 µm (capacitive encoder) |
| Sample Dimensions (max) | 15 × 15 × 5 mm |
| Electrical Interface | 5-pin sample holder (1 bias + 4 auxiliary channels) |
| Environmental Compatibility | UHV-compatible, exchange-gas capable, PPMS®-integrated, Evercool®-compatible, dilution refrigerator & He-3 system adaptable |
| Brand | NanoMagnetics |
|---|---|
| Origin | United Kingdom |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | LT-SHPM/STM |
| Pricing | Available Upon Request |
| Temperature Range | 10 mK – 400 K |
| Magnetic Field Range | Up to 20 T |
| Spatial Resolution (Z) | 50–800 nm (stick-slip approach) |
| Scan Range (XY) | Ø3 mm |
| Z-Travel | 10 mm |
| Sample Dimensions | Max. 15 × 15 × 5 mm |
| Magnetic Noise Floor | 10 µT/√Hz @ 300 K, 100 nT/√Hz @ 77 K, 10 nT/√Hz @ 4 K |
| Compatibility | PPMS®, dry magnet systems, dilution refrigerators (DRs), He-3 cryostats |
| Optional Module | 3D-SHPM for vectorial magnetic field mapping |
| Brand | NanoMagnetics |
|---|---|
| Origin | United Kingdom |
| Model | mK-CFM/RAMAN |
| Temperature Range | 10 mK – 300 K |
| Magnetic Field | Up to 31 T |
| Objective | 0.82 NA, 0.95 mm Working Distance APO Cryo-Objective |
| Scan Range (300 K) | 50 × 50 × 25 µm |
| Scan Range (4 K) | 30 × 30 × 15 µm |
| Coarse Approach Range | 6 × 6 × 12 mm (XYZ), Step Size: 50–700 nm |
| Closed-Loop Encoder Resolution | 200 nm |
| Fine Scan Range (300 K) | 7.5 µm |
| Fine Scan Range (4.2 K) | 1 µm |
| Max Sample Dimensions | 10 × 10 × 5 mm |
| Sample Holder | 8-pin electrical feedthrough |
| Environmental Compatibility | Ultra-high vacuum (UHV) or purged gas atmosphere |
| Cryostat Compatibility | Compatible with standard 50 mm cold-finger dilution refrigerators and most commercial cryogenic platforms |
| Brand | NanoMagnetics |
|---|---|
| Origin | United Kingdom |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | NV |
| Pricing | Upon Request |
| Objective NA | 0.82 (Achromatic Apochromatic, 0.95 mm clear aperture) |
| Excitation Laser | 532 nm single longitudinal mode, 10 mW |
| Operating Temperature Range | 10 mK – 300 K |
| Scan Range (at 4 K) | 30 × 30 × 15 µm |
| Detector | Avalanche Photodiode (APD) for optical readout |
| Sample Stage | 6 × 6 × 12 mm XYZ piezo nanopositioner |
| NV/QTF Sensor Stage | 4 × 4 × 6 mm XYZ nanopositioner |
| Position Sensing | Resistive sensor, 200 nm resolution |
| Controller | FPGA-based AFM/SPM controller with USB 3.0 interface |
| Real-time Processor | 32-bit, 128 MB DDR SDRAM |
| ADC | Dual-channel 16-bit @ 100 MHz |
| DAC | Dual-channel 16-bit @ 100 MHz |
| On-FPGA PID Loops | 7 independent channels |
| Piezo Driver Channels | 19-channel high-voltage piezo controller |
| Auxiliary ADC | 16-channel 24-bit @ 175 kHz |
| Scan DAC | 24-bit for XYZ raster scanning |
| High-Voltage Amplifier | Low-noise, wide-bandwidth |
| Brand | PHI |
|---|---|
| Origin | Japan |
| Model | PHI 700 |
| Type | Scanning Auger Electron Spectrometer |
| Detection Principle | Auger Electron Spectroscopy (AES) |
| Spatial Resolution | <10 nm (beam diameter) |
| Energy Resolution | ≤0.3% at E₀ = 1 keV |
| Ion Sputtering Energy Range | 0.1–5 keV |
| Maximum Magnification | >500,000× |
| Depth Profiling Capability | Sub-nanometer to several micrometers |
| Sample Stage | High-precision motorized XYZ + tilt/rotation |
| Vacuum System | Ultra-high vacuum (UHV), base pressure ≤2×10⁻¹⁰ Torr |
| Brand | PHI |
|---|---|
| Origin | Japan |
| Model | PHI 700 |
| Type | Scanning Auger Electron Spectrometer |
| Detection Principle | Auger Electron Spectroscopy (AES) |
| Spatial Resolution | <10 nm (typical) |
| Beam Energy Range | 1–20 keV (electron gun) |
| Depth Profiling Capability | Sub-nanometer to several micrometers |
| Energy Resolution | ≤0.3% (ΔE/E at E = 1 keV) |
| Imaging Magnification | Up to 500,000× |
| Vacuum System | Ultra-High Vacuum (UHV), ≤5×10⁻¹⁰ Torr base pressure |
| Sample Stage | High-precision motorized XYZ + tilt/rotation |
| Compliance | ASTM E1508, ISO 18115-2, USP <1057>, GLP/GMP-ready data audit trail |
| Brand | ULVAC-PHI |
|---|---|
| Origin | Japan |
| Model | PHI GENESIS 500 |
| Category | Imported Instrument |
| Distribution Status | Authorized Distributor |
| Pricing | Upon Request |
| Brand | PHI |
|---|---|
| Origin | Japan |
| Model | Genesis 500 |
| Type | Fully Automated Scanning Focused XPS System |
| Sample Stage | Motorized 3-Position Carousel (80 mm × 80 mm trays) |
| Microprobe Spot Size | ≤ 5 µm |
| Depth Profiling | Integrated High-Performance Ar⁺ Ion Gun + Dual-Beam Charge Neutralization |
| Optional Techniques | UPS, LEIPS, REELS, AES, HAXPES, GCIB Sputtering |
| Software Platform | PHI SmartSoft Suite with GLP/GMP-Compliant Audit Trail & 21 CFR Part 11 Support |
| Compliance | ASTM E1521, ISO 18118, ISO 21365, USP <1057>, IEC 62304 |
| Origin | Japan |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | VersaProbe III |
| Price | USD 950,000 (FOB Yokohama) |
| Brand | PREVAC |
|---|---|
| Origin | Poland |
| Model | HPPES |
| Pressure Range | 2×10⁻⁹ mbar – 50 mbar |
| Base Pressure (UHV mode) | ≤1×10⁻⁹ mbar (configuration-dependent) |
| Sample Temperature Range | 20 K (LHe/LN₂-cooled) to 1400 °C |
| Analyzer Type | High-Pressure Hemispherical Energy Analyzer (EA15-HP5 / EA15-HP50) |
| X-ray Sources | Dual-anode monochromated AlKα / AgLα and non-monochromated AlKα / MgKα |
| UV Source | Powered He(I)/He(II) discharge lamp |
| Ion Source | Broad-beam Ar⁺ for sputter depth profiling or surface cleaning |
| Neutralizer | Electron flood gun |
| Manipulator | Motorized or manual 4–6 axis, with precise angular and translational control |
| Load-Lock Chamber | Integrated, with linear transfer to analysis chamber |
| Vacuum System | Composite pumping stack including roughing pump, turbomolecular pump (TMP), titanium sublimation pump (TSP), and cryo-shielded ion pump |
| Software Platform | Spectrium (Tango-compatible, PLC-integrated) |
| Compliance | UHV/HPXPS/APXPS/UPS/ARPES/AES/EELS/ISS/IPES/LEIPS standards |
| Brand | PREVAC |
|---|---|
| Origin | Poland |
| Model | PES |
| Base Pressure | ≤1×10⁻¹¹ mbar |
| Analysis Chamber Diameter | Ø310 mm |
| Sample Temperature Range | 20 K (LHe) to 1400 °C |
| Sample Manipulator | 4–6-axis motorized |
| Energy Analyzer | Hemispherical EA15 UHV |
| X-ray Sources | Monochromated dual-anode (AlKα/AgLα) and non-monochromated dual-anode (AlKα/MgKα) |
| UV Source | Powered He-I (21.2 eV) and He-II (40.8 eV) lamps |
| Flood Gun | Electron flood source for charge neutralization |
| Ion Sources | Ar⁺ sputter gun and gas cluster ion beam (GCIB) for depth profiling/cleaning |
| Optional Add-ons | LEED, RGA, IPES/LEIPS, AES, EELS, ISS modules |
| Control Software | Spectrium (Tango-compliant, PLC-integrated) |
| Vacuum System | Composite pumping stack including roughing pump, turbomolecular pump (TMP), ion pump, and titanium sublimation pump (TSP) with LN₂ shroud |
| Brand | Shimadzu/KRATOS |
|---|---|
| Origin | United Kingdom |
| Manufacturer | KRATOS Analytical (a Shimadzu company) |
| Type | AMICUS |
| X-ray Source | Mg/Al Kα dual anode, non-monochromated |
| Maximum Power | 300 W (top-illumination geometry) |
| Anode Design | Conical bulk target |
| Energy Resolution | < 0.8 eV (Mo 3d₅/₂) |
| Typical Resolution & Sensitivity | 1.15 eV @ 700 kcps (Ag 3d₅/₂) |
| Software | Vision™ (Windows XP/Vista/7 compatible) |
| Vacuum Monitoring & Control | Real-time chamber pressure display, automated valve sequencing, full experimental parameter scripting, unattended operation capability |
| Optional Accessories | High-temperature catalytic reaction cell |
| Brand | Shimadzu |
|---|---|
| Origin | United Kingdom |
| Manufacturer | Kratos Analytical (a Shimadzu company) |
| Type | AXIS Nova |
| Category | Import Instrument |
| Pricing | Upon Request |
| Brand | Shimadzu/Kratos |
|---|---|
| Origin | United Kingdom |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Origin Category | Imported Instrument |
| Model | AXIS SUPRA+ |
| Price Range | USD 650,000 – 1,050,000 |
| Brand | SPECS |
|---|---|
| Origin | Germany |
| Model | Phoibos 190 ARPES System |
| Energy Analyzer | ASTRAIOS 190 hemispherical analyzer with 2D-CMOS detector |
| Angular Resolution | <0.1° |
| Energy Resolution | <1.5 meV (with 2D-CMOS) |
| Acceptance Angle | ±30° |
| Vacuum Base Pressure | <1×10⁻¹⁰ mbar |
| Sample Stage | Closed-cycle 6-axis cryogenic manipulator (base temperature <7 K) |
| UV Source | UVS300 plasma discharge He lamp + TMM304 monochromator (HeI α/β, HeII lines |
| Soft X-ray Source | u-FOCUS 600 micro-focused monochromated Al/Ag/Cr anode (Rolan circle radius 600 mm |
| Detector | 1920×1200 pixel CMOS sensor, 160 fps frame rate, dynamic range >1×10⁶ cps, single-channel noise <0.002 cps |
| Software | SPECS Prodigy Suite (acquisition, real-time k-space mapping, Fermi surface reconstruction, GLP-compliant audit trail) |
| Brand | Thermo Fisher Scientific |
|---|---|
| Origin | United Kingdom |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Imported Instrument |
| Model | ESCALAB Xi+ |
| Pricing | Available Upon Request |
| Brand | ULVAC-PHI |
|---|---|
| Origin | Japan |
| Model | PHI 710 |
| Type | Scanning Auger Electron Spectrometer (AES) |
| SEM Resolution | ≤3 nm |
| AES Spatial Resolution | ≤8 nm (@20 kV, 1 nA) |
| Analyzer Geometry | Coaxial Cylindrical Mirror Analyzer (CMA) |
| Energy Resolution | 0.1% (high-resolution mode) |
| Beam Diameter | 20 nm (adjustable) |
| Ion Gun Sputtering Energy | 0.5 kV (standard configuration) |
| Software Suite | PHI SmartSoft-AES & MultiPak |
| Brand | ULVAC-PHI |
|---|---|
| Origin | Japan |
| Model | PHI 710 |
| Category | Imported Instrument |
| Vendor Type | Authorized Distributor |
| Pricing | Upon Request |