Energy Spectrometry Instruments
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| Brand | ULVAC-PHI |
|---|---|
| Origin | Japan |
| Model | PHI GENESIS 900 |
| Excitation Source | Cr Kα (5414.7 eV) |
| Probe Depth | ~30 nm |
| Spatial Resolution | <10 µm (focused beam mode) |
| Energy Resolution | <0.3 eV (at Fermi edge, pass energy 20 eV) |
| Analyzer Type | Hemispherical Deflector Analyzer (HDA) with 180° double-pass optics |
| Vacuum System | UHV base pressure <5×10⁻¹⁰ Torr |
| Automation | Fully motorized sample stage, multi-axis tilt/rotation, in-situ transfer capability |
| Brand | ZEISS |
|---|---|
| Origin | Germany |
| Model | Axiolab 5 Widefield Microscope |
| Dimensions (L×W×H) | ~304 mm × 210 mm × 357.5 mm (base unit without tube, part no. 430037-9011-000) |
| Operating Temperature | +10 °C to +40 °C |
| Relative Humidity | ≤75% at 35 °C (non-condensing) |
| Max. Altitude | 2,000 m |
| Ambient Pressure | 800–1,060 hPa |
| Pollution Degree | 2 |
| Protection Class | IP20 |
| Electrical Safety | Compliant with DIN EN 61010-1 / IEC 61010-1, CSA, UL |
| RF Emission | EN 55011 Class B |
| Immunity | DIN EN 61326/A1 |
| Power Supply | 100–240 V AC, 50–60 Hz |
| Power Consumption | ≤100 VA |