Four Point Probe Sheet Resistance Tester
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| Brand | 4D TECHNOLOGY |
|---|---|
| Origin | USA |
| Model | 280SI |
| Automation Level | Fully Automatic |
| Sheet Resistance Range | 0.001 Ω/□ to 8×10⁵ Ω/□ (Standard) |
| Sheet Resistance Accuracy | <0.1% |
| Resistivity Range | 0.001 Ω·cm to 8×10⁵ Ω·cm (derived from sheet resistance and user-input film thickness) |
| Resistivity Accuracy | <0.1% |
| Substrate Size Support | 2–8 inch wafers (333-series supports up to 12 inch |
| Test Current Accuracy | <0.1% |
| Probe Force Adjustment Range | 90–200 g |
| Probe Tip Material | Tungsten carbide with sapphire bushings |
| Edge Correction Capability | Yes, within 3 mm from wafer edge |
| Measurement Speed | >45 points/min |
| Repeatability | <0.2% (per substrate) |
| Data Output | 2D/3D contour maps, statistical summaries, Excel-compatible reports |
| Brand | Filmetrics |
|---|---|
| Origin | USA |
| Model | R50 |
| Measurement Principle | Contact Four-Point Probe (4PP) & Non-Contact Eddy Current (EC) |
| Max Sample Diameter | 300 mm |
| Max Mapping Area | 200 mm × 200 mm |
| XY Stage Travel Options | 100 mm × 100 mm or 200 mm × 200 mm (R50-200) |
| Z-Travel | 100 mm |
| Tilt Stage Range | ±5° |
| Mapping Speed | Up to 1 point/sec |
| Software | RsMapper™ with Pattern Generator, GLP-Compliant Data Logging |
| Brand | KLA |
|---|---|
| Origin | USA |
| Manufacturer | KLA Corporation |
| Product Type | Imported Semiconductor Process Metrology Instrument |
| Automation Level | Fully Automated |
| Probe Configurations | Four-Point Probe (4PP) and Eddy Current (EC) |
| Maximum Sample Diameter | 200 mm (R54-200) or 300 mm (R54-300) |
| Maximum Sample Height | 15 mm |
| Sheet Resistance Range | 10⁻² to 10⁸ Ω/sq |
| Measurement Coordinate Modes | Rectangular, Linear, Polar, Custom Grid |
| XY Stage Precision | High-resolution motorized stage with ±100 mm travel (200 mm total range) |
| Enclosed Chamber | Yes, for light- and environment-sensitive samples |
| Software Platform | RSMapper™ v5.x with GLP-compliant audit trail, 21 CFR Part 11 optional modules |
| Compliance | ASTM F84, ISO 10777, SEMI MF67, USP <1054>, supports GMP/GLP documentation workflows |
| Brand | Jandel |
|---|---|
| Origin | United Kingdom |
| Model | Cartridge |
| Probe Spacing Options | 0.500 mm, 0.635 mm, 1.00 mm, 1.27 mm, 1.591 mm (±10 µm tolerance) |
| Tip Material | Tungsten Carbide (standard) |
| Tip Diameter | 0.4 mm (standard), 0.3 mm (for high-density spacing) |
| Tip Radius of Curvature | 12.5, 25, 40, 100, 150, 200, 300, or 500 µm |
| Flatness | ≥ ±0.025 mm |
| Tip Load Range | 10 g to 250 g |
| Insulation Resistance | ≥10¹³ Ω at 500 V (between adjacent probes) |
| Probe Arrangement | Linear or rectangular |
| Buffer Zone | 0.5 mm |
| Automation Level | Manual |
| Brand | KLA |
|---|---|
| Origin | USA |
| Model | R54 |
| Automation Level | Semi-Automatic |
| Resistivity Measurement Range | 1 mΩ/□ to 200 Ω/□ |
| Resistivity Measurement Accuracy | < 0.02% |
| Z-Travel Range | 15 mm |
| XY Stage Type | Motorized |
| Max Sample Height | 15 mm |
| Max Sample Weight | 2.5 kg |
| 4PP Measurement Repeatability | < 0.02% |
| EC Measurement Repeatability | < 0.2% |
| Compatible Sample Sizes | Up to 300 mm Ø or A4 (210 × 297 mm) |
| Probe Configurations | Customizable rectangular, linear, polar, and user-defined mapping patterns |
| Dual-Mode Operation | Four-Point Probe (4PP) and Non-Contact Eddy Current (EC) |
| Brand | Rayscience |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Product Category | Imported Semiconductor Instrument |
| Model | CDE ResMap |
| Automation Level | Fully Automated |
| Probe Tip Material | Tungsten Carbide |
| Typical Probe Load Force | 100–200 g |
| Compatible Wafer Sizes | 50 mm (2″) to 150 mm (6″) |
| Measurement Mode | Four-Point Collinear Probe (Van der Pauw geometry compatible) |
| Data Acquisition Rate | Up to 4,000 data points per measurement site |
| Interface | Windows-based GUI with recipe-driven operation |
| Calibration Interval | Extended (≥12 months under GLP-compliant usage) |
| Configurable Probe Heads | Dual–quadruple probe head options for 300 mm platform (not included in base model) |
| Brand | ROOKO |
|---|---|
| Model | FT-361 |
| Origin | Zhejiang, China |
| Automation Level | Manual |
| Compliance | GB/T 1551–2018 (Silicon Single Crystal Resistivity Test Method), ASTM F84–20 |
| Sheet Resistance Range | 10⁻⁶–2×10² Ω/□ |
| Resistivity Range | 10⁻⁷–2×10³ Ω·cm |
| Test Current | 0.1 μA, 1 μA, 10 μA, 100 μA |
| Current Accuracy | ±0.1% of reading |
| Resistance Measurement Accuracy | ≤0.3% |
| Overall System Uncertainty | ≤4% (verified against NIST-traceable standard wafers) |
| Probe Spacing Options | 1 mm, 2 mm, 3 mm |
| Probe Tip Materials | Tungsten Carbide, Stainless Steel, Gold-Plated Phosphor Bronze Hemispherical Tips |
| Display | 4.3-inch TFT LCD showing R, ρ, Rₛ, T, σ, d, αₜ, V, I, probe geometry, spacing, thickness, unit conversion |
| Power Input | AC 220 V ±10%, 50 Hz |
| Max Power Consumption | <30 W |
| Optional Accessories | PC control software (with audit trail & CSV/PDF export), square probe head, linear probe head, motorized XYZ test stage, thermal chamber interface kit |
| Brand | ROOKO |
|---|---|
| Origin | Zhejiang, China |
| Model | FT-371 |
| Measurement Range | 10¹–2×10¹⁰ Ω/□ |
| Resistivity Range | 10²–2×10¹¹ Ω·cm |
| Test Current | 1 mA – 1 pA |
| Current Accuracy | ±0.1% of reading |
| Resistance Accuracy | ≤5% (≤10⁸ Ω), ≤20% (>10⁸ Ω) |
| Display | 4.3" LCD showing R, ρ, Rₛ, T, σ, probe geometry, spacing, thickness, temp. coeff., I/V |
| Measurement Method | Dual-electrode four-point probe (linear or square configuration) |
| Power Supply | AC 220 V ±10%, 50 Hz, <30 W |
| Overall Uncertainty | ≤4% (certified standard sample) |
| Optional Accessories | PC control software, square probe head, linear probe head, temperature-controlled test platform, probe spacing (1/2/3 mm), probe tip materials (tungsten carbide, stainless steel, gold-plated phosphor bronze hemispherical) |