Kelvin Probe System
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| Brand | Instytut Fotonowy |
|---|---|
| Origin | Poland |
| Model | Electrochemical Kelvin Probe |
| Weight | 15 kg |
| Dimensions | 40 × 40 × 45 cm |
| Power Supply | 230 V, 50 Hz or 115 V, 60 Hz |
| PC Interface | USB 2.0 |
| Measurement Principle | Dual-channel lock-in amplifier-based vibrating capacitor method |
| Contact Potential Difference (CPD) Range | −5 to +5 V |
| CPD Resolution | 0.15 mV |
| Current Ranges | 300 nA / 30 nA / 3 nA / 300 pA |
| Probe Tip | Au mesh, 2.5 mm diameter |
| Vertical Positioning Resolution | 20 µm |
| Typical CPD Measurement Gap | 0.2–1 mm |
| XY Motorized Stage | 50 × 50 mm travel range |
| Faraday Cage | Standard airtight version with inert gas flow system |
| Electrochemical Cell | PTFE body, Kapton-insulated sample substrate, Ag/AgCl reference electrode option |
| Optical Access | Fused silica window, UV-enhanced mirror, liquid light guide for bottom illumination |
| Environmental Sensors | Integrated temperature and humidity monitoring |
| Laser Guidance System | Visible alignment laser with automatic gap-sensing barrier |
| Brand | KP (UK) |
|---|---|
| Origin | United Kingdom |
| Model | HVKP |
| Vacuum Compatibility | UHV (≤1×10⁻¹⁰ mbar) |
| Measurement Principle | Non-contact, vibrating capacitor-based Kelvin probe force microscopy (KPFM) with off-null detection |
| Work Function Resolution | 1–3 meV (2 mm tip), 5–10 meV (50 µm tip) |
| Tip-to-Sample Distance Control | Down to 400 nm with patented Height Regulation (HR) mode |
| Spatial Resolution | Sub-micron (dependent on tip geometry and vacuum conditions) |
| Detection Mode | Off-Null (ON) signal amplification |
| Actuation | Voice-coil (VC) driver |
| Data Output | Digital export to Excel, Origin, or third-party analysis software |
| Compliance | Designed for GLP/GMP-aligned surface science workflows |
| Brand | KP (UK) |
|---|---|
| Origin | United Kingdom |
| Model | KP020 |
| Environment | Ambient & Controlled Atmosphere |
| Probe Options | 2 mm & 50 µm tip diameters |
| Work Function Resolution | 1–3 meV (2 mm tip), 5–10 meV (50 µm tip) |
| Tip-to-Sample Distance Control | Down to ≤400 nm |
| Height Regulation Mode (HR) | Active feedback-controlled vertical positioning |
| Detection Principle | Off-Null (ON) non-zero signal detection |
| Actuation | Voice-coil (VC) driver |
| Digital Control | Full digital parameter management (DC, SM, SA, WA, QT, DE, OC, FC, RS) |
| Software Export | Excel, Origin, third-party formats |
| Compliance | Designed for GLP-aligned surface potential mapping and work function metrology |
| Brand | Makeway |
|---|---|
| Model | MKW-KP002 |
| Origin | Shanghai, China |
| Application Environment | Ambient, Controlled Atmosphere, or Humidity-Regulated Conditions |
| Work Function Resolution | 1–3 meV (2 mm tip), 5–10 meV (50 µm tip) |
| Tip-to-Sample Distance Control | Down to ≤400 nm |
| Digital Control Architecture | Full FPGA-based digital signal processing with ON (Off-Null) detection, Height Regulation (HR), Parallel Plate (PP) oscillation mode, Signal Averaging (SA), Work Function Averaging (WA), Quick-Change Tip (QT), Faraday Cage (FC), TTL Output Channel (OC), Data Export to Excel/Origin (DE) |
| Brand | Makeway |
|---|---|
| Origin | Shanghai, China |
| Model | MKW-KP004 |
| Probe Count | 9 integrated Kelvin probes |
| Maximum Substrate Size | 300 mm (12-inch) wafers |
| Energy Resolution | < 1 meV |
| Probe Tip Diameter | 1.4 mm (metal) |
| Angular Position Sensing Resolution | 1° |
| X-Axis Motorized Travel | > 100 mm, Positioning Accuracy: ±50 µm |
| Rotational Axis | Motorized silicon wafer stage with integrated optical encoder |
| Dead-Zone Minimization | Optimized for small wafers and wafer fragments |
| Work Function Calibration Reference | Integrated HOPG or Au reference |
| Environmental Monitoring | Onboard USB-connected temperature & humidity sensor |
| Faraday Cage | Fully integrated gold-plated steel enclosure |
| Software Control | Scriptable measurement engine supporting user-defined protocols |
| Data Output | Full-wafer, half-wafer, quarter-wafer, line-scan, and point-mode surface potential maps |
| Compliance Framework | Designed for GLP-aligned lab environments |