Lithography Overlay Measurement Equipment
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| Brand | Other brands |
|---|---|
| Origin | Hong Kong |
| Manufacturer Type | General distributor |
| Domestic/Imported | Domestic |
| Model | FP NanoPrinter |
| Price Range | USD 140,000 – 700,000 |
| Key Features | DMD-based dynamic holographic patterning |
| Laser Safety Class | Class 4 |
| XY/Z Feature Size | 142 nm / 175 nm |
| Resolution (Diffraction-Limited) | 285 nm / 500 nm |
| Layer Spacing | ≥ 0.05 µm |
| Throughput | 100 mm³/hr |
| Parallel Foci | ≥ 100 |
| Surface Roughness | ≤ 20 nm |
| Operating Temp | 23 ± 1 ℃ |
| RH | < 50% (recommended < 35%) |
| Vibration Requirement | Active isolation required |
| Power Supply | 220 V, > 35 A |
| Brand | M&R |
|---|---|
| Origin | Taiwan |
| Model | AA-8N-LED |
| Light Source | UV LED |
| Maximum Substrate Size | ≤4-inch wafers (including irregular shapes) |
| Overlay Alignment Accuracy | ±1 µm |
| Optical Resolution | ≤1 µm |
| Configuration | Standalone benchtop system for contact-mode lithography and manual/semi-automated bond alignment |
| Brand | Vistron |
|---|---|
| Manufacturer | Laser oFab GmbH |
| Origin | Germany |
| Model | Laser oFab EUV Tube |
| EUV Peak Wavelength | 13.5 nm |
| Spectral Bandwidth (FWHM) | ~1 nm |
| Power Output (2π, 2% BW @ 13.5 nm) | ≤20 µW |
| Long-Term Intensity Stability (72 h) | <1% RMS |
| Source Size (FWHM) | Adjustable from <10 µm to ≥100 µm |
| Vacuum Interface | DN 16 CF flange |
| Emission Cone | 30° full angle, centered on flange axis |
| Target Material | Solid-state (L2,3-transition optimized) |
| Operating Voltage/Current | Software-controlled |
| Compliance | Designed for UHV-compatible metrology environments |