Optical Thin Film Measurement Equipment
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| Brand | Atometrics |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | OEM Manufacturer |
| Regional Classification | Domestic (China) |
| Model | AM-7000 Series ER-230 |
| Pricing | Upon Request |
| Brand | Atometrics |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | OEM Manufacturer |
| Regional Classification | Domestic (China) |
| Model | T100 |
| Pricing | Upon Request |
| Brand | Chotest |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | NS200 |
| Price | USD 84,000 (FOB Shenzhen) |
| Measurement Principle | Contact-mode stylus profilometry with LVDC capacitive transduction |
| Vertical Resolution | Sub-ångström (≤0.1 Å) |
| Lateral Scan Range | 55 mm |
| X/Y Stage Travel | 150 mm × 150 mm (motorized) |
| R-θ Stage | 360° continuous motorized rotation |
| Max Sample Thickness | 50 mm |
| Wafer Compatibility | 150 mm (6″) and 200 mm (8″) |
| Vertical Measurement Range | Up to 1000 µm |
| Force Control | 1–50 mg adjustable, electromagnetic micro-force actuation |
| Probe Tip Radius | 2 µm diamond |
| Optical Navigation | 5 MP color camera with real-time probe trajectory overlay |
| SPC Module | Integrated statistical process control with trend charts, Cp/Cpk, histogram, and outlier detection |
| Environmental Requirements | 16–25 °C (ΔT < 2 °C/h), 30–40% RH (non-condensing), floor vibration ≤ 6.35 µm/s (1–100 Hz), ambient noise ≤ 80 dB, laminar airflow ≤ 0.508 m/s downward |
| Brand | ZENO |
|---|---|
| Model | E100 |
| Type | Spectroscopic Ellipsometer |
| Form Factor | Benchtop |
| Measurement Principle | Null- and Rotating-Analyzer-Based Spectroscopic Ellipsometry (SE) |
| Wavelength Range | 240–1700 nm (configurable UV-VIS-NIR) |
| Spot Size | Standard 3 mm Ø |
| Substrate Compatibility | 4″ to 12″ wafers, irregular shapes, rigid/flexible substrates |
| Measured Parameters | Film thickness (sub-nm resolution), complex refractive index (n + ik), extinction coefficient (k), interfacial roughness, optical bandgap |
| Precision | ≤0.01 nm RMS repeatability on SiO₂/Si reference samples (t < 30 nm, n=30 measurements) |
| Compliance | ASTM F1599, ISO 15632, SEMI MF1530 |
| Software | ZENO-EllipSuite v4.x with GLP-compliant audit trail, user role management, and 21 CFR Part 11-ready data export |
| Automation Options | Motorized XYZ stage, auto-alignment module, wafer handler integration |
| Origin | Shanghai, China |
| Distribution | Authorized Global Distributor Network |
| Brand | Netzsch |
|---|---|
| Origin | Germany |
| Model | DSC 214 Polyma |
| Temperature Range | −100 °C to 600 °C |
| Heating/Cooling Rate | up to 500 °C/min |
| Sensor Type | Corona® high-reproducibility heat-flux sensor |
| Crucible System | Concavus® concave-bottom crucibles with fixed annular contact geometry |
| Software Platform | Proteus® with Smart Mode, Expert Mode, TM-DSC, Beflat® baseline correction, Auto-Analysis, Identify™ polymer recognition database |
| Compliance | ISO 11357-1, ASTM E794, ASTM E1356, USP <1151>, GLP/GMP-ready audit trail (FDA 21 CFR Part 11 optional) |
| Brand | SENTECH |
|---|---|
| Origin | Germany |
| Model | SENDIRA |
| Spectral Range | 400–6,000 cm⁻¹ (1.7–25 µm) |
| Detector Options | DTGS or MCT |
| Integrated FTIR Platform | Compatible with Thermo Fisher iS50 |
| Software | SpectraRay/4 + Dedicated FTIR Control Suite |
| Optical Configuration | Purged ellipsometer optics, motorized goniometer, horizontal sample stage, auto-collimating telescope |
| Application Domain | Vibrational spectroscopic ellipsometry for thin-film metrology |
| Brand | SENTECH |
|---|---|
| Origin | Germany |
| Model | SpectraRay/4 |
| Software Type | Spectroscopic Ellipsometry Data Acquisition, Modeling & Analysis Platform |
| Material Database | Integrated Comprehensive Library (Oxides, Nitrides, Metals, Polymers, Amorphous Si, Organic Layers, etc.) |
| Dispersion Models | Cauchy, Tauc-Lorentz, Cody-Lorentz, Drude, Sellmeier, B-Spline, User-Defined Custom Models |
| Mapping Capabilities | 2D Color/Contour/Deviation/3D Surface Plots, Statistical Summary (Mean, Std Dev, Min/Max, Histograms) |
| Simulation Engine | Wavelength-, Angle-, Energy-, Temperature-, Time-Dependent Optical Response Modeling |
| Reporting | Export to Microsoft Word (*.doc), Full Experiment Archiving (Raw Data, Model Definitions, Fitting Logs, Annotations) |
| Scripting | Python-based Automation Interface for Hardware Control (Stages, Heaters, Cryostats, Environmental Chambers) |
| Compliance Support | Audit Trail Logging, User Access Levels, Electronic Signature Ready (FDA 21 CFR Part 11–ready architecture) |
| Brand | ZENO |
|---|---|
| Model | QUASAR-S Series |
| Application | In-line optical metrology for semiconductor wafer fabrication |
| Wafer Sizes | 150 mm (6″), 200 mm (8″), 300 mm (12″) |
| Measurement Principle | Spectroscopic Ellipsometry (SE) and Spectral Reflectometry (SR) |
| Spectral Range | UV–Vis–NIR (e.g., 190–1700 nm) |
| Thickness Resolution | ≤ 0.005 nm (3σ) |
| Throughput | Up to 120 wafers/hour |
| Sample Interfaces | Open cassette, SMIF pod, FOUP |
| Measurement Capabilities | Single-layer & multi-layer film thickness, refractive index (n), extinction coefficient (k), patterned & unpatterned wafer alignment, waferless recipe setup |
| Compliance | Designed for integration into ISO Class 1–5 cleanroom environments |
| Software | ZENO MetroSuite™ with audit trail, user access control, and 21 CFR Part 11–compliant electronic records |
| Brand | ZENO |
|---|---|
| Model | R100 |
| Origin | Shanghai, China |
| Type | Benchtop Spectral Reflectometer |
| Measurement Principle | Broadband Spectral Reflectance Analysis (350–1000 nm) |
| Sample Compatibility | 4–8 inch wafers, square substrates, irregular shapes |
| Measurable Parameters | Film Thickness, Refractive Index (n), Extinction Coefficient (k), Reflectance (R) |
| Repeatability | ≤±0.15 nm (for 500 nm SiO₂ on Si, n=30) |
| Optical Spot Size | Standard 2 mm Ø |
| Software | ZENO-Metro v4.x with GLP-compliant audit trail, data export (CSV, XML), and ASTM E2372-22 compliant reporting |
| Compliance | ISO/IEC 17025-ready workflow architecture, supports FDA 21 CFR Part 11 electronic signature configuration |