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| Brand | Park SYSTEMS |
|---|---|
| Origin | South Korea |
| Model | NX-TSH |
| Instrument Type | Industrial AFM |
| Sample Stage Travel Range | 625 mm × 525 mm |
| Maximum Sample Dimensions | 520 mm × 520 mm × 10 mm (10 kg) |
| Acoustic Noise Attenuation | >20 dB with Integrated Acoustic Enclosure |
| XY Scanning Range (Closed-Loop) | 100 µm × 100 µm |
| Z Scanning Range | 15 µm |
| Z Sensor Noise Floor | Sub-nanometer (low-noise optical lever detection) |
| Probe Exchange | Automated Tip eXchanger (ATX) with vision-based tip recognition and magnetic probe handling |
| Laser Alignment | Motorized, auto-focused beam positioning |
| Electrostatic Control | Integrated bipolar ionizer for charge neutralization |
| Electrical Characterization Option | Conductive AFM (C-AFM) with micro-probe station and 2D encoder stage |
| Brand | Park Accurion |
|---|---|
| Origin | Germany |
| Model | Accurin i4 |
| Isolation Start Frequency | 0.6 Hz |
| Peak Isolation Performance | −40 dB at 10 Hz (99% vibration attenuation) |
| Settling Time | 0.3 s |
| Degrees of Freedom | 6-DOF active compensation |
| Power Supply | Standard AC outlet (no compressed air required) |
| Load Auto-Adaptation | Yes |
| Transport Lock | Integrated and automatic |
| Structural Stiffness | High intrinsic rigidity for positional stability |
| Compliance | Designed for ISO 14644-1 Class 5–8 cleanroom environments and compatible with GLP/GMP-aligned lab infrastructure |
| Brand | Park Accurion |
|---|---|
| Origin | Germany |
| Model | Accurion Nano Series |
| Type | Active 6-DOF Vibration Isolation System |
| Operating Frequency Range | Active isolation from 0.7 Hz, passive isolation up to 200 Hz |
| Setup Time | < 0.3 s |
| Power Supply | Standard AC mains (no compressed air required) |
| Controller | External low-heat, EMI-isolated electronics unit |
| Structural Frame | Optional welded steel support table with high horizontal & vertical stiffness |
| Compliance | Designed for ISO 14644-1 Class 5 cleanroom-compatible environments and GLP/GMP-aligned lab infrastructure |
| Sample Load Capacity | Optimized for light-weight, high-sensitivity instruments (e.g., AFM, optical interferometers, nanoindenter stages) |
| Brand | Park SYSTEMS |
|---|---|
| Origin | South Korea |
| Model | NX-Hybrid WLI |
| Primary Technology | Integrated White Light Interferometry (WLI) and Atomic Force Microscopy (AFM) |
| Optical Modes | WLI & Phase-Shifting Interferometry (PSI) |
| Objective Lenses | 2.5×, 10×, 20×, 50×, 100× (motorized turret) |
| Interferometric Objective Type | Mirau |
| Measurement Principle | Coherence scanning interferometry with sub-nanometer vertical resolution |
| Application Domain | Semiconductor front-end & back-end process control, advanced packaging metrology, wafer-level defect review, CMP characterization, GLP/GMP-compliant R&D and inline QA |
| Brand | Park SYSTEMS |
|---|---|
| Origin | South Korea |
| Model | NX-Mask |
| Application | EUV photomask defect repair and metrology |
| Technology | Non-contact atomic force microscopy (AFM) |
| Key Capabilities | Defect detection, nanoscale mechanical removal, post-repair 3D topography verification |
| Compliance | Designed for cleanroom-integrated semiconductor mask shops |
| Deployment | Dual-pod compatible for inline EUV reticle handling |
| Operational Environment | Ambient air, no vacuum, no beam-induced charging, no chemical reagents |
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