Plasma Surface Treater
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| Brand | Alpha Plasma |
|---|---|
| Origin | Germany |
| Model | Q150 |
| Instrument Type | Imported Microwave Plasma Surface Treater |
| Category | Plasma-Based Sample Preparation Equipment |
| Distribution Status | Authorized Distributor (Non-Manufacturer) |
| Import Classification | Imported Equipment |
| Pricing | Available Upon Request |
| Brand | Alpha |
|---|---|
| Origin | Germany |
| Model | Q-Series |
| Frequency | 2.45 GHz |
| Power Range | 50–1200 W (model-dependent) |
| Chamber Material | Quartz or Borosilicate Glass |
| Max Wafer Size | 8-inch |
| Working Pressure | ≤100 Pa |
| Vacuum System | Integrated dry pump (oil pump optional) |
| Gas Control | Up to 6 MFC channels (2–3 standard) |
| Vacuum Gauges | Pirani (1–1×10⁵ Pa) and/or Baratron (1–1000 Pa) |
| Control Interface | 7"–10.4" TFT touchscreen |
| Operating System | Windows Embedded Compact 2013 |
| Compliance | CE, RoHS, SEMI S2/S8 compatible |
| Dimensions (W×H×D) | 500×370×550 mm to 760×775×775 mm |
| Weight | 40–95 kg |
| Utilities | 3/N/PE AC 240/400 V, 50/60 Hz, 16 A |
| [Brand | Asida |
|---|---|
| Origin | Guangdong, China |
| Model | LV12 |
| Test Method | Static Extraction |
| Measurement Accuracy | ±5% |
| Conductivity Resolution | 0.001 µS/cm |
| Sample Plate Size Range | 10 cm × 10 cm to 60 cm × 35 cm |
| Extractant Density | 0.85–0.855 g/cm³ |
| Extractant Volume | ~17 L |
| Water Tank Dimensions | 352 mm × 70 mm × 600 mm (L×W×H) |
| Overall Dimensions | 1050 mm × 600 mm × 920 mm (L×W×H) |
| Power Consumption | 1300 W |
| Input Voltage/Frequency | 220 V / 50 Hz |
| Net Weight | ~115 kg |
| Operating Ambient Temperature | 22 ± 3 °C |
| Extractant Temperature Control | 40 ± 2 °C |
| Compliance | GB/T 4677.22a, GB/T 18268, SJ/T 11364, IPC-6012B Clause 3.9, IPC-TM-650 2.3.25B] |
| Brand | ASIDA |
|---|---|
| Model | LZ12 |
| Type | Static Ionic Contamination Tester for Printed Circuit Boards |
| Measurement Principle | Conductivity-based extraction analysis per IPC-TM-650 2.3.25 and J-STD-001 |
| Standard Extractant Volume | 17 L (customizable up to 30 L) |
| Extractant Temperature Control | 40 ± 2 °C |
| Test Area Range | 1200–8712 cm² |
| Conductivity Resolution | 0.0001 µS/cm² |
| Accuracy | ±5% |
| Electrode Sensitivity Range | 0.0001–9999.9999 µS/cm² |
| Power Supply | AC 220 V, 50 Hz |
| Rated Power | 1300 W |
| Dimensions (Std) | 1050 × 600 × 920 mm |
| Weight (Std) | ~115 kg |
| Operating Ambient | 22 ± 3 °C |
| Data Output | Excel (.xlsx), USB/RS232 interface |
| Language Support | English & Simplified Chinese |
| Security | Multi-level password protection |
| Thermal Stability | ±0.3 °C at 40 °C setpoint |
| Resin Filtration System | Mixed-bed anion/cation exchange resin |
| Compliance | IPC, JEDEC, ISO 9001-aligned workflow support |
| Software | Embedded PC-controlled acquisition with real-time conductivity curve plotting and auto-report generation |
| Brand | AXIS-TEC |
|---|---|
| Origin | USA |
| Model | PE-100 |
| RF Frequency | 13.56 MHz |
| RF Power | 0–300 W (automatically adjustable) |
| Chamber Dimensions | 305 × 368 × 305 mm (L×D×H) |
| Chamber Volume | 34 L |
| Chamber Material | T6-aluminum monolithic construction |
| Operating Pressure Range | 1–2000 mTorr |
| Gas Flow Control | 0–50 sccm with precision needle valve |
| Vacuum Gauge | Pirani gauge (0–1 Torr) |
| Gas Inlet | Single or multi-channel configurable |
| Control System | PLC-based HMI automation |
| Configuration Options | Plasma cleaning, isotropic plasma etching, anisotropic RIE, and switchable mode architecture |
| Brand | AXIS-TEC |
|---|---|
| Origin | USA |
| Model | PE-75 |
| RF Frequency | 13.56 MHz |
| Power Output | 0–150 W (automatically regulated) |
| Chamber Dimensions | Cylindrical, ID 273 mm × Depth 254 mm |
| Chamber Volume | 13.8 L |
| Chamber Material | T-6 Aluminum Monolithic Construction |
| Operating Gas | Single- or Multi-Gas Inlet |
| Vacuum Range | 1–2000 mT (via Pirani gauge, 0–1 Torr) |
| Gas Flow Control | 0–25 sccm with Precision Needle Valve |
| Control Mode | Fully Automated |
| Brand | AXIS-TEC |
|---|---|
| Origin | USA |
| Model | PlasmaSTAR100 / PlasmaSTAR200 |
| RF Frequency | 40 kHz (LF) or 13.56 MHz |
| RF Power | 600 W |
| Chamber Volume | 10 L |
| Chamber Material | Anodized Aluminum |
| Maximum Substrate Size | 8-inch wafer |
| Process Gas Pressure | 10 PSI |
| Control Interface | Touchscreen PC with Multi-step Programmable Logic |
| Vacuum System | Rotary Vane Pump (standard), optional Roots-boosted configuration |
| Gas Delivery | Mass Flow Controllers (MFCs) standard, downstream pressure controller optional |
| Brand | Beam Convergence |
|---|---|
| Origin | Shenzhen, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Domestic Plasma Surface Treater |
| Model | TSPL200MA |
| RF Frequency | 13.56 MHz |
| Maximum RF Power | 1000 W |
| Chamber Volume | 200 L |
| External Dimensions (W×D×H) | 1250 × 1250 × 1850 mm (excl. tri-color indicator light) |
| Chamber Tray Material | Stainless Steel |
| Gas Inlets | 2 independent mass flow-controlled channels |
| Control System | Fully Automated PLC-based Interface with Programmable Process Sequencing |
| Brand | CIF |
|---|---|
| Origin | Hebei, China |
| Manufacturer Type | Authorized Distributor |
| Country of Manufacture | China |
| Model | VGB-P |
| Instrument Category | Domestic Plasma Surface Treater |
| RF Frequency | 40 kHz / 13.56 MHz |
| Power Range | 0–500 W |
| Dimensions (L×W×H) | 330 × 490 × 190 mm |
| Chamber Volume | 3.8 L |
| Chamber Material | Stainless Steel (AISI 304) |
| Gas Inlets | 2 Independent Mass Flow-Controlled Channels |
| Control Mode | Manual Knob Adjustment + Programmable Auto-Mode with Preset Sequencing |
| Brand | Diener |
|---|---|
| Origin | Germany |
| Model | Bell Jar 35 |
| Instrument Type | Imported Plasma Surface Treater |
| Chamber Volume | ~35 L |
| Chamber Material | Borosilicate Glass (Bell Jar: Ø315 mm × H500 mm) |
| Power Supply | 230 V / 16 A |
| RF Frequencies | 40 kHz (0–500 W), 13.56 MHz (0–300 W), DC/Unipolar Pulsed (0–300 W, up to 600 V) |
| Vacuum System | Compatible with Standard Rotary Vane or Dry Pumps (User-Specified) |
| Gas Control | Three Mass Flow Controllers (MFCs) |
| Substrate Holder | Ø140 mm (Optional Rotation, Heating, Cooling) |
| Pressure Measurement | Pirani Gauge |
| Control System | PCCE Software on Microsoft Windows XPe |
| Electrode Configuration | Switchable for Plasma Cleaning, Activation, Etching |
| Sputter Source | 2″–3″ with Shutter (Optional Exhaust Duct & Gas Inlet) |
| Additional Options | Faraday Cage, Plasma Polymerization Kit, TEM Flange, Corrosive-Gas-Compatible Design, Heated Chamber, Oxygen Generator, Slow Vent/Suction Modules, Maintenance & On-Site Installation Support |
| Origin | Netherlands |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported Instrument |
| Model | MARCH AP-1000 |
| RF Frequency | 13.56 MHz (RF Generator with Auto-Impedance Matching) |
| Power Output | 2 kW |
| Chamber Material | Anodized Aluminum Alloy |
| Chamber Volume | Configurable (Standard & HTP Options Available) |
| Process Gases | O₂, Ar, H₂, He (via 4 Mass Flow Controllers) |
| Control System | PLC-Based Closed-Loop Control with Integrated Mechanical Height Sensor |
| Dimensions (Standard Unit) | 567 × 764 × 664 mm (W × D × H) |
| Dimensions (HTP Configuration) | 680 × 1127 × 1536–1890 mm (W × D × H) |
| Net Weight | 485 kg |
| Compliance | Designed for ISO Class 5–7 cleanroom integration |
| Software | Proprietary SPC-Enabled Process Management Suite with Audit Trail Capability |
| Brand | Abner |
|---|---|
| Origin | Jiangsu, China |
| Model | ABN-PCM-001 |
| Instrument Type | Benchtop Low-Temperature RF Plasma Surface Treater |
| Working Gases | Dual-Channel (Ar, O₂, N₂, H₂, CF₄ compatible) |
| Control Method | Dual-Independent Mass Flow Control |
| Chamber Material | Fused Quartz |
| Vacuum System | Integrated Rotary Vane Pump (Ultimate Pressure ≤ 5 × 10⁻² mbar) |
| RF Power Supply | 13.56 MHz, 0–100 W Adjustable |
| Chamber Volume | 8 L |
| Operating Temperature | Ambient to 60 °C (non-thermal plasma regime) |
| Brand | SUNJUNE |
|---|---|
| Model | VP-RS8 |
| Type | Benchtop Radio-Frequency Plasma Surface Treater |
| RF Frequency | 13.56 MHz |
| RF Power | 500 W |
| Chamber Volume | 8 L |
| Chamber Material | 304 Stainless Steel |
| Dimensions (W×D×H) | 56 × 45 × 36 cm |
| Gas Inlets | 2 independent mass-flow-controlled ports |
| Control System | Touchscreen-based automated controller with integrated vacuum monitoring |
| Cooling Performance | ≤45 °C chamber wall temperature after 3 min full-power operation |
| Compliance | CE-marked design principles |
| Vacuum Display | Digital real-time vacuum readout (range: 1×10⁻³ to 1×10² Pa) |
| Safety Features | Interlocked door sensor, auto-pressure release post-treatment, over-temperature cutoff |
| Brand | VC Plasma |
|---|---|
| Origin | Guangdong, China |
| Model | VP-C120 |
| RF Power Supply | 1000 W / 500 W with Auto-Matching Capacitive RF Generator |
| Rated Power | ≤5 kW |
| Chamber Vacuum Level | ≤6 Pa |
| Operating Temperature | <35 °C (process-dependent) |
| Chamber Rack Modularity | >100 configurable cavity fixture configurations |
| Gas Flow Control | Integrated Mass Flow Controllers (MFCs) for multi-gas compatibility (O₂, Ar, N₂, CF₄, air) |
| Control System | Industrial PLC + HMI touchscreen interface with dual-mode operation (manual/automatic), interlocked mode switching, and role-based user access control |
| Dimensions (W×D×H) | 1030 mm × 1281 mm × 1632 mm (powder-coated steel enclosure) |