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AITOLY MFC300 Micro Gas Mass Flow Controller

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Brand AITOLY
Origin Jiangsu, China
Model MFC300
Flow Principle Thermal Mass Flow (MEMS-based)
Medium Clean, dry, non-corrosive gases (Air, N₂, O₂, Ar, CH₄, CO₂)
Full-Scale Range 0.2–100% FS (1:500 turndown ratio)
Accuracy ±0.5% FS
Repeatability ±0.5% FS
Linearity ±0.2% FS
Resolution 0.1 sccm (0–1000 sccm)
Sensor Response Time 5 ms
Control Response Time 300 ms
Warm-up Time ≤1 s
Valve Type Normally Closed (NC)

Overview

The AITOLY MFC300 is a compact, high-performance thermal mass flow controller engineered for precise measurement and closed-loop regulation of low-flow-rate gases in laboratory, analytical, and process-critical environments. Based on MEMS (Micro-Electro-Mechanical Systems) sensor technology, the MFC300 employs constant-temperature anemometry to directly measure gas mass flow without dependence on pressure or temperature variations—enabling real-time, density-independent quantification. Integrated temperature and pressure compensation algorithms ensure stable output across ambient fluctuations, making it suitable for applications where environmental stability cannot be guaranteed. Its ultra-low pressure drop (<100 Pa at full scale), sub-second warm-up time, and miniature footprint support integration into space-constrained systems such as gas chromatography sample introduction modules, semiconductor process tools, fuel cell test benches, and microreactor control loops.

Key Features

  • MEMS-based thermal mass flow sensing with built-in temperature and pressure compensation for enhanced accuracy under variable ambient conditions
  • Ultra-fast dynamic response: 5 ms sensor response time and 300 ms closed-loop control response enable rapid setpoint tracking in transient gas delivery scenarios
  • Wide turndown ratio of 1:500 (0.2–100% FS), supporting both trace-level (e.g., 0.1 sccm) and moderate-flow (up to 5 slpm) operation within a single device
  • Normally closed (NC) proportional solenoid valve with integrated PID control logic, eliminating external controller dependency for basic automation tasks
  • Zero warm-up delay: fully operational within ≤1 second after power-on, reducing system idle time and improving experimental throughput
  • Modular mounting options—including 1/4″ NPT, M5, and surface-mount configurations—facilitate flexible integration into OEM instruments and custom gas panels

Sample Compatibility & Compliance

The MFC300 is validated for use with clean, dry, non-corrosive gases including air, nitrogen, oxygen, argon, methane, and carbon dioxide. It is not rated for use with condensing, particulate-laden, or chemically aggressive media (e.g., HCl, NH₃, Cl₂, or solvent vapors). While not certified to ISO 9001 or IEC 61000-4 series by default, the device complies with CE marking requirements for electromagnetic compatibility (EMC Directive 2014/30/EU) and low-voltage safety (LVD Directive 2014/35/EU). Its analog (0–5 V / 0–10 V / 4–20 mA) and digital (RS-485 Modbus RTU) interfaces support integration into GLP- and GMP-aligned systems when paired with audit-trail-capable SCADA or LIMS platforms. For regulated pharmaceutical or medical device manufacturing, validation documentation (IQ/OQ protocols) can be supplied upon request.

Software & Data Management

The MFC300 supports configuration and real-time monitoring via AITOLY’s proprietary PC-based utility software, which provides stepwise flow calibration, multi-point setpoint scheduling, and data logging at user-defined intervals (down to 10 Hz). The software exports timestamped CSV files compatible with MATLAB, Python (pandas), and LabVIEW for post-acquisition analysis. RS-485 communication enables daisy-chaining up to 32 units on a single bus, facilitating synchronized multi-channel gas delivery in automated synthesis platforms. Firmware updates are performed in-field via USB-to-RS485 adapter; all parameter changes are logged with timestamps and user IDs when connected to networked control systems compliant with FDA 21 CFR Part 11 requirements (with appropriate system-level access controls and electronic signature implementation).

Applications

  • Gas dosing and stoichiometric control in catalytic microreactors and flow chemistry systems
  • Carrier and makeup gas regulation in GC, GC-MS, and ICP-MS instrumentation
  • Leak testing and decay rate measurement in hermetic package validation (MIL-STD-883, ASTM E493)
  • Humidity and gas mixture generation using dual-MFC blending architectures
  • Environmental simulation chambers requiring stable, low-flow inert gas purging (ISO 16750-4, IEC 60068-2-30)
  • Research-scale fuel cell and electrolyzer test stations (IEC 62282-2)

FAQ

What gases are supported by the MFC300?

Air, nitrogen, oxygen, argon, methane, and carbon dioxide—provided they are clean, dry, and non-corrosive.
Is factory calibration traceable to NIST or other national standards?

Calibration is performed using gravimetric reference standards traceable to CNAS-accredited laboratories; NIST-traceable certificates are available as an optional add-on.
Can the MFC300 operate in vacuum or back-pressure conditions?

It is designed for upstream (inlet) pressure control only; operation downstream of vacuum pumps or under significant backpressure (>100 kPa differential) is not recommended and may affect accuracy.
Does the device support digital communication protocols beyond Modbus RTU?

Standard firmware supports RS-485 Modbus RTU only; CANopen or EtherCAT variants require custom firmware development and minimum order quantities.
How is long-term stability maintained over extended operation?

The MEMS sensor architecture exhibits <0.2% FS/year zero drift and <0.15% FS/year span drift under continuous operation at rated conditions; annual recalibration is recommended for metrological compliance.

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