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budatec® VS 160 Vacuum Bonding System

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Brand budatec®
Origin Germany
Model VS 160
Chamber Size 160 × 160 mm²
Max. Chamber Height 50 mm
Max. Process Temperature 450 °C
Heating/Cooling Rate up to 3 K/s
Atmosphere Control Programmable N₂, N₂/H₂ (95/5), or Formic Acid (HCOOH) via Proportional Flow Valves
Temperature Monitoring Independent Thermocouple Feedback Loop
Max. Load Capacity 2.5 kg
Power Supply 400 V / 16 A
Cooling Water Requirement 10 slm
Process Visualization Real-time Graphical Component Overview

Overview

The budatec® VS 160 Vacuum Bonding System is an industrial-grade, programmable vacuum reflow and thermocompression bonding platform engineered for high-precision die attach, substrate lamination, and advanced packaging processes in semiconductor manufacturing and power electronics assembly. Operating under controlled vacuum or inert/forming gas atmospheres, the system leverages a dual-zone resistive heating architecture with independent thermal feedback—enabled by a dedicated thermocouple embedded in the process plate—to ensure spatial temperature uniformity ±1.5 °C across the full 160 × 160 mm² work area. Its core principle relies on simultaneous vacuum-assisted void suppression and precisely ramped thermal profiles (up to 3 K/s), minimizing interfacial defects such as delamination, Kirkendall voids, and flux residue entrapment. Designed for integration into cleanroom-compatible production lines, the VS 160 meets mechanical and electrical safety requirements per IEC 61000-6-2/6-4 and conforms to CE marking directives for machinery (2006/42/EC) and electromagnetic compatibility.

Key Features

  • Vacuum chamber with 160 × 160 mm² usable plate area and 50 mm vertical clearance—optimized for standard QFN, D2PAK, and ceramic substrate carriers.
  • Multi-gas atmosphere management via calibrated proportional flow valves supporting N₂, N₂/H₂ (95/5), and HCOOH vapor—enabling oxide reduction during Au-Sn, Ag-sinter, or Cu-Cu hybrid bonding.
  • Real-time thermal profiling with closed-loop control: heating and cooling rates independently adjustable from 0.1 to 3 K/s, with ramp-hold-soak sequences programmable in up to 20 steps.
  • Digital process supervision suite including graphical component status monitoring, automated maintenance scheduling, and lifetime tracking of critical consumables (e.g., heating elements, O-rings, gas filters).
  • Integrated digital manual accessible directly from the HMI interface—containing calibration procedures, error code diagnostics, and preventive maintenance checklists aligned with ISO 9001 documentation practices.
  • Robust mechanical architecture with water-cooled chamber walls (10 slm flow rate) ensuring thermal stability during extended high-temperature cycles (≥400 °C for >30 min).

Sample Compatibility & Compliance

The VS 160 accommodates substrates ranging from silicon wafers (up to 6-inch equivalent carriers) to thick-copper IMS boards, AlN ceramics, and LTCC modules. It supports both bare-die placement and pre-taped carrier handling under vacuum conditions down to 10⁻² mbar. All process recipes—including gas composition, pressure ramping, and thermal soak parameters—are logged with timestamped audit trails compliant with FDA 21 CFR Part 11 requirements when paired with optional electronic signature modules. The system’s operational envelope satisfies ASTM F2192 (Standard Guide for Vacuum Processing of Semiconductor Devices) and supports GLP/GMP-aligned validation protocols including IQ/OQ/PQ documentation templates.

Software & Data Management

Controlled via a Windows-based HMI with touch-enabled operator interface, the VS 160 runs proprietary budatec ProcessSuite™ v4.x firmware. Software features include recipe versioning with SHA-256 hash verification, exportable CSV/XLSX logs with metadata (operator ID, lot number, chamber pressure history, thermocouple deviation), and OPC UA server support for MES/SCADA integration. Data integrity safeguards include automatic backup to external NAS drives, cyclic redundancy checks on all stored profiles, and configurable retention policies aligned with ISO/IEC 27001 information security frameworks.

Applications

  • High-reliability die attach for SiC MOSFETs and GaN HEMTs using transient liquid phase (TLP) sintering.
  • Vacuum-assisted reflow of AuSn preforms in RF front-end module assembly.
  • Thermocompression bonding of copper pillar bumps in 2.5D/3D IC stacking.
  • Low-void lamination of chip-scale packages onto metal-core PCBs under formic acid atmosphere.
  • Research-scale development of nano-silver sintering processes for automotive power modules.

FAQ

What vacuum level can the VS 160 achieve, and how is it measured?
The system reaches base pressures of ≤1 × 10⁻² mbar using a dry scroll pump; ultimate vacuum is monitored via a capacitance manometer with NIST-traceable calibration.
Is the heating plate interchangeable for different substrate thicknesses?
Yes—the top and bottom platens are modular and configurable with custom thermal shims to accommodate substrates from 0.2 mm to 5 mm in thickness.
Does the system support remote diagnostics and firmware updates?
Remote SSH access and secure OTA updates are available via optional budatec Connect™ license, compliant with IEC 62443-3-3 cybersecurity standards.
How often must the gas delivery system be recalibrated?
Proportional flow valves require annual verification against certified mass flow standards; calibration certificates are auto-generated and archived within the software.
Can the VS 160 be integrated into a Class 100 cleanroom environment?
Yes—its sealed chamber design, non-shedding internal materials (316L stainless steel, alumina insulation), and HEPA-filtered purge ports meet ISO 14644-1 Class 5 requirements.

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