HPC HPC-K9-1000-NX High-Flow Gas Purifier
| Brand | HPC |
|---|---|
| Origin | Liaoning, China |
| Manufacturer Type | OEM/ODM Producer |
| Product Origin | Domestic (China) |
| Model | HPC-K9-1000-NX |
| Applicable Gases | N₂, Ar, He, Kr, Ne, CH₄ |
| Removed Impurities | H₂O, O₂, CO₂, CO, H₂, Organic Compounds |
| Purification Depth | < 1 ppb |
| Flow Rate Range | 200–20,000 Nm³/h |
| Operating Temperature | Ambient (15–35 °C) |
| Construction Material | Electropolished 316L Stainless Steel |
| Inlet/Outlet Filtration | 3 µm (0.003 mm) 316L Sintered Metal Filter |
| Adsorption Mechanism | Dual-mode (Chemical + Physical Adsorption) |
Overview
The HPC HPC-K9-1000-NX High-Flow Gas Purifier is an engineered solution for continuous, large-scale purification of inert and non-reactive specialty gases in analytical, semiconductor, optical fiber, and high-purity industrial applications. Designed around a dual-mode adsorption architecture—integrating selective chemisorption catalysts with high-surface-area physical adsorbents—the system achieves sub-part-per-trillion (sub-ppt) impurity removal for critical contaminants including moisture (H₂O), oxygen (O₂), carbon dioxide (CO₂), carbon monoxide (CO), hydrogen (H₂), and volatile organic compounds (VOCs). With a rated volumetric flow capacity spanning 200 to 20,000 normal cubic meters per hour (Nm³/h), the unit operates at ambient temperature without external heating or cooling requirements, making it suitable for integration into central gas supply systems, bulk gas manifolds, and on-site purifier skids. All wetted surfaces are constructed from electropolished (EP-grade) 316L stainless steel to minimize particle shedding and surface reactivity, while the integrated 3 µm sintered 316L metal filter ensures particulate retention upstream and downstream of the adsorption beds.
Key Features
- Dual-stage adsorption design combining proprietary chemisorbent formulations (developed and manufactured in-house by HPC) with high-efficiency physisorbents for broad-spectrum impurity capture
- Electropolished 316L stainless steel adsorption vessels and piping—certified to ASTM A967 and ASME BPE standards for surface finish and passivation
- Integrated 3 µm sintered 316L metal particulate filter installed both upstream and downstream of adsorption media to prevent bed fouling and ensure outlet gas cleanliness
- Modular, field-replaceable adsorbent cartridges with traceable batch certification and pre-conditioning verification data
- Zero-leakage pneumatic manifold with VCR®-compatible connections and helium leak-tested assembly (≤1×10⁻⁹ mbar·L/s)
- Factory performance validation conducted using calibrated cavity ring-down spectroscopy (CRDS) and gas chromatography–mass spectrometry (GC-MS) for H₂O, O₂, CO, CO₂, and hydrocarbons
Sample Compatibility & Compliance
The HPC-K9-1000-NX is validated for use with nitrogen (N₂), argon (Ar), helium (He), krypton (Kr), neon (Ne), and methane (CH₄). It complies with key industry purity specifications including SEMI F57-0318 (for electronic grade gases), ISO 8573-1:2010 Class 1 for particles and water, and ASTM D7622-20 for trace moisture analysis in compressed gases. While not certified to FDA 21 CFR Part 11 or EU Annex 11 out-of-the-box, the system’s mechanical design supports integration into GMP-compliant facilities via documented installation qualification (IQ), operational qualification (OQ), and performance qualification (PQ) protocols. All materials of construction meet USP Class VI biocompatibility requirements where applicable.
Software & Data Management
This is a hardware-only purifier with no embedded controller or digital interface. Process monitoring and maintenance scheduling are performed externally via facility SCADA systems or standalone pressure differential transducers (ΔP), dew point analyzers, and oxygen analyzers (e.g., electrochemical or zirconia-based). HPC provides comprehensive commissioning documentation—including as-built P&IDs, material traceability records, weld logs (with PMI verification), and full factory test reports—for audit readiness under ISO 9001:2015 and IATF 16949 frameworks. Optional third-party integration kits support Modbus RTU/ASCII communication for remote status monitoring.
Applications
- Front-end purification for ultra-high-purity gas lines feeding semiconductor photolithography tools, CVD/PVD chambers, and ion implanters
- Pre-purification stage for carrier gases used in GC, GC-MS, ICP-MS, and FTIR analytical instrumentation
- Gas conditioning for excimer laser systems requiring sub-ppb O₂ and H₂O levels
- On-site purification of bulk liquid vaporized gases (e.g., LN₂ boil-off streams) prior to distribution networks
- Support of ISO Class 1–3 cleanroom environments where background contamination must be minimized across multiple toolsets
FAQ
What impurity detection methods are used during factory testing?
Factory validation employs calibrated CRDS for H₂O and CO, pulsed fluorescence for SO₂ (where relevant), paramagnetic O₂ analyzers, and GC-MS for VOC profiling—all traceable to NIST standards.
Can the unit be configured for dual-bed parallel operation with automatic switching?
Yes—custom configurations supporting redundant adsorption trains with programmable valve sequencing and pressure-balanced bypass are available upon request.
Is regeneration of the adsorbent cartridges supported onsite?
No. Cartridges are single-use, pre-packed, and designed for replacement only. Regeneration is not recommended due to irreversible chemical saturation and risk of media degradation.
Does HPC provide installation and commissioning support internationally?
Yes—HPC offers remote technical supervision, FAT/SAT documentation packages, and optional on-site commissioning by certified field engineers (travel and logistics arranged separately).
Are spare cartridges stocked globally?
Standard cartridges for HPC-K9-1000-NX are held in regional distribution hubs in Singapore and Hamburg; lead time for non-stock variants is 6–8 weeks.
