KUDOS SK2200H Benchtop High-Frequency Ultrasonic Cleaner

Overview

The KUDOS SK2200H is a benchtop high-frequency ultrasonic cleaner engineered for precision cleaning, degassing, emulsification, and sample preparation in academic, pharmaceutical, and industrial laboratory environments. Operating at a fixed frequency of 53 kHz, the unit leverages piezoelectric transducer technology to generate cavitation bubbles within the cleaning medium—typically aqueous or solvent-based solutions. At this frequency, the device delivers an optimal balance between cleaning intensity and surface sensitivity: higher than standard 40 kHz units, yet lower than high-frequency (>100 kHz) systems used for microelectronics or delicate optical components. This makes the SK2200H particularly suitable for routine cleaning of glassware (vials, pipettes, cuvettes), metal parts, printed circuit boards, and small-volume analytical samples where moderate energy input is required to avoid erosion or pitting while ensuring effective particle removal and bubble collapse.

Key Features

• Benchtop form factor with compact footprint (270 × 160 × 240 mm), designed for integration into fume hoods, laminar flow cabinets, or shared lab workstations.
• Digital timer with extended range (1–199 minutes), enabling reproducible exposure durations for standardized cleaning protocols across batches.
• Stainless steel 304 tank (240 × 140 × 100 mm internal dimensions; 3 L capacity) offering corrosion resistance, thermal stability, and compatibility with common cleaning solvents including isopropanol, acetone, and alkaline detergents.
• 100 W nominal ultrasonic power output delivered via bottom-mounted transducers, ensuring uniform energy distribution across the tank volume without hotspots or dead zones.
• Backlit LCD display for clear visibility under varied ambient lighting conditions, showing elapsed time and active status during operation.
• Included stainless steel support rack for elevated sample placement, promoting acoustic coupling and preventing direct contact between delicate items and tank bottom.

Sample Compatibility & Compliance

The SK2200H accommodates a broad range of sample types—including borosilicate glass, stainless steel, aluminum, ceramic substrates, and certain polymer components—provided they are not acoustically fragile (e.g., thin-film coatings or MEMS devices). Its 53 kHz frequency minimizes risk of micro-pitting on softer metals compared to lower-frequency cleaners, while still generating sufficient cavitation pressure (~100–300 bar peak) for contaminant detachment. The unit complies with IEC 61000-6-3 (EMC emission standards) and meets basic electrical safety requirements per GB 4793.1 (Chinese equivalent of IEC 61010-1). While not certified for GMP or ISO 13485 environments out-of-the-box, its consistent timer control, stable frequency output, and traceable operational parameters support documentation for GLP-aligned workflows when integrated into validated cleaning SOPs.

Software & Data Management

The SK2200H operates as a standalone hardware platform without embedded software or network connectivity. All controls are local and manual: power toggle, start/stop, and timer setting via front-panel membrane buttons. No data logging, USB export, or remote monitoring capabilities are included. However, its deterministic timer function (±1% accuracy over full range) enables manual recording of process parameters in lab notebooks or electronic batch records. For regulated environments requiring audit trails, users may integrate external timers or connect the unit to programmable logic controllers (PLCs) via dry-contact relay outputs (optional accessory, not supplied).

Applications

• Routine decontamination of HPLC vials, syringe filters, and chromatography columns prior to reuse.
• Removal of organic residues, particulates, and biofilm from surgical instruments, dental tools, and endoscope components during pre-sterilization processing.
• Assisted dissolution and homogenization of powders in buffer solutions for assay preparation.
• Degassing of solvents prior to GC or LC mobile phase preparation to prevent pump cavitation and baseline drift.
• Extraction of metabolites or nucleic acids from tissue homogenates using sonication-assisted lysis protocols.
• Pre-cleaning of SEM/TEM sample stubs and TEM grids to reduce artifact introduction during imaging.

FAQ

Is the SK2200H suitable for cleaning delicate optics or semiconductor wafers?
No. Its 53 kHz operating frequency and 100 W power level are optimized for general labware and robust components—not sub-micron surface finishes. For such applications, consider high-frequency (>170 kHz) or megasonic systems with power modulation and temperature-controlled baths.
Can the unit be operated continuously beyond 199 minutes?
No. The maximum timer setting is 199 minutes. For extended cycles, manual restart is required. Continuous unattended operation is not recommended due to heat accumulation and potential solvent evaporation.
Does the SK2200H include heating functionality?
No. It is a non-heated ultrasonic cleaner. Temperature-sensitive cleaning protocols require external water baths or heated tanks.
What maintenance is required for long-term reliability?
Routine cleaning of the tank interior with mild detergent and periodic inspection of transducer mounting integrity are advised. Avoid abrasive cleaners or chlorinated solvents that may degrade sealants or accelerate stainless steel stress corrosion.
Is the stainless steel rack adjustable or configurable?
The supplied rack is fixed-height and non-modular, designed for standard 15 mL and 50 mL conical tubes, petri dishes, and small glassware. Custom racks can be fabricated to user specifications using 304 SS wire mesh.