KYKY CXF-320/3001 Magnetic Levitation Turbo-Molecular Pump

Overview

The KYKY CXF-320/3001 is a high-performance, oil-free magnetic levitation turbo-molecular pump engineered for ultra-high vacuum (UHV) and extreme high vacuum (XHV) applications in research and industrial environments. Unlike conventional bearing-supported turbomolecular pumps, the CXF-320/3001 employs active magnetic bearings to suspend the rotor assembly without physical contact—eliminating mechanical friction, wear, vibration, and lubrication requirements. This architecture enables stable operation at 21,000 rpm under continuous duty cycles, delivering a nominal nitrogen pumping speed of 3200 L/s and an ultimate pressure of 5×10⁻⁷ Pa when paired with a suitable forepump (≥30 L/s). Its design conforms to the operational envelope required by modern thin-film deposition systems, particle accelerator beamlines, surface science instrumentation (e.g., XPS, AES, LEED), and semiconductor process chambers where hydrocarbon-free vacuum integrity, long-term reliability, and minimal particulate generation are non-negotiable.

Key Features

• Magnetic levitation rotor system with closed-loop position control—ensures zero-contact rotation, eliminating bearing degradation and enabling >20,000 hours MTBF (mean time between failures)
• Integrated water-cooling jacket optimized for thermal stability during extended operation at full speed; compatible with standard laboratory cooling circuits (flow rate ≥2 L/min, ΔT ≤5°C)
• Compact monoblock housing (358×337×417 mm) with symmetrical mass distribution—supports arbitrary mounting orientation (horizontal, vertical, inverted) without performance compromise
• Dual-stage impeller geometry optimized for broad-range compression: achieves >1×10⁸ compression ratio for N₂ and Ar, >1×10⁴ for He, and >1×10³ for H₂—critical for hydrogen-rich or helium-leak-test environments
• Low-power 65 W drive electronics with soft-start sequencing and real-time rotational speed monitoring via integrated Hall-effect sensors
• Standard DN320 ISO-F inlet flange; optional ISO-K and ISO-CF configurations available for integration into UHV-compatible stainless-steel piping networks

Sample Compatibility & Compliance

The CXF-320/3001 is designed for use with inert, non-corrosive, and non-condensable gases typical in UHV systems—including N₂, Ar, He, H₂, O₂, and residual air components. It is incompatible with solvent vapors, reactive halogenated compounds (e.g., ClF₃), or condensable process byproducts (e.g., SiH₄ decomposition residues) unless protected by cryogenic or sorption foreline traps. The pump meets structural and electromagnetic compatibility requirements per IEC 61000-6-2/6-4. Its sealing system utilizes metal-gasketed (Cu or Ni) ISO-F interfaces, supporting bake-out temperatures up to 150°C. All materials comply with ASTM F1372-20 (outgassing specifications for UHV components) and are certified for GLP-compliant vacuum infrastructure used in metrology labs and national research facilities.

Software & Data Management

The pump operates via a standalone digital controller (KYKY PCC-320) featuring RS-485 Modbus RTU and optional Ethernet/IP interface. Firmware supports real-time telemetry logging—including rotational speed, bearing current, coil temperature, coolant flow status, and vacuum ramp profiles—for traceable system diagnostics. Audit trails comply with FDA 21 CFR Part 11 requirements when integrated with validated SCADA platforms. Configuration parameters (e.g., acceleration ramp, over-speed cutoff, thermal shutdown thresholds) are password-protected and stored in non-volatile memory. Remote monitoring and alarm notification (via dry-contact relay or SNMP trap) enable predictive maintenance scheduling aligned with ISO 55001 asset management frameworks.

Applications

• Semiconductor fabrication: Load-lock evacuation, ion implantation chamber backing, and ALD/CVD process chamber roughing
• Advanced materials R&D: In-situ TEM sample stage vacuum systems, molecular beam epitaxy (MBE) source chambers, and pulsed laser deposition (PLD) targets
• Energy research: Fusion plasma diagnostic port pumping, hydrogen isotope separation test benches, and battery material synthesis gloveboxes
• Photonics & quantum engineering: Ultra-stable optical cavity vacuum enclosures, atomic clock beam tubes, and superconducting qubit dilution refrigerator shielding
• Surface analysis: X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and low-energy electron diffraction (LEED) systems requiring <1×10⁻⁷ Pa base pressure

FAQ

What forepump is recommended for optimal performance?
A two-stage rotary vane pump or dry scroll pump with ≥30 L/s pumping speed and ultimate pressure ≤1×10⁻¹ Pa is required to maintain the CXF-320/3001 within its operational pressure window (20 Pa – 10⁻⁷ Pa).
Can the pump be operated horizontally or upside-down?
Yes—the magnetic bearing control system dynamically compensates for gravitational load shifts, permitting installation in any orientation without derating.
Is the pump compatible with UHV bake-out procedures?
The main body and flange are rated for 150°C bake-out when using oxygen-free copper gaskets and verified cooling line integrity; controller electronics must remain external to the bake zone.
Does the pump support automated vacuum sequencing in multi-pump systems?
Yes—via Modbus RTU, the CXF-320/3001 can synchronize startup/shutdown timing, interlock with gate valves, and report status to central vacuum management PLCs.
What maintenance intervals are specified under continuous operation?
No scheduled mechanical maintenance is required; annual verification of coolant conductivity, firmware updates, and bearing position calibration (using KYKY’s PCC-320 service mode) constitute the full preventive protocol.