KYKY FF-160/700 Lip-Lubricated Molecular Pump

Overview

The KYKY FF-160/700 is a high-performance, lip-lubricated molecular pump engineered for ultra-high vacuum (UHV) and high-throughput industrial vacuum applications. Unlike traditional oil-lubricated or magnetic-bearing molecular pumps, this model employs a precision-engineered lip-seal lubrication system that eliminates hydrocarbon backstreaming while maintaining mechanical robustness under demanding thermal and dynamic loads. Its operation relies on the principle of momentum transfer: high-speed rotating blades (36,000 rpm) impart directional kinetic energy to gas molecules, preferentially driving them toward the exhaust side against the pressure gradient. This enables stable pumping performance even at elevated foreline pressures—up to 550 Pa transiently and 300 Pa continuously—making it uniquely suited for processes involving intermittent gas bursts or variable outgassing rates.

Key Features

• True oil-free operation with proprietary lip-lubricated bearing system, ensuring zero hydrocarbon contamination and compliance with stringent UHV cleanliness requirements.
• Compact coaxial design (Ø193 × 374.5 mm) supports multi-orientation mounting—horizontal, vertical, or inverted—facilitating flexible integration into space-constrained vacuum systems such as sputtering chambers or ion implantation lines.
• High-compression-ratio architecture delivers N₂ compression >1×10⁹ and Ar compression >1×10⁹, enabling effective isolation of process chambers from forepump back-diffusion and reducing reliance on cryogenic or sorption trapping.
• Integrated water-cooling circuit (≥1 L/min flow, ≤25 °C inlet temperature) maintains rotor thermal stability during sustained high-load operation, supporting reproducible performance across extended duty cycles.
• Low-power drive electronics (≤500 W) and optimized aerodynamic blade geometry achieve high pumping efficiency per watt—critical for energy-sensitive cleanroom environments and large-scale cluster tools.
• Standardized flange interfaces: DN160 CF or ISO-K inlet options; DN40 ISO-KF outlet ensures seamless compatibility with KYKY FD-II, FD-IIB, TCDP-II, and TD-II series controllers featuring analog/digital I/O, real-time speed monitoring, and fault diagnostics.

Sample Compatibility & Compliance

The FF-160/700 is designed for continuous-duty vacuum environments where chemical inertness, particulate control, and long-term reliability are mandatory. It is routinely deployed in processes involving reactive gases (e.g., H₂, NH₃, O₂), corrosive precursors (e.g., SiH₄, BF₃), and high-vapor-pressure materials (e.g., indium tin oxide, silicon carbide precursors). Its all-metal construction (stainless steel housing, titanium or nickel-alloy rotor blades) resists corrosion and minimizes outgassing. The pump meets ISO 28580:2018 for vacuum pump performance testing and complies with CE safety directives (2014/35/EU Low Voltage Directive and 2014/30/EU EMC Directive). When integrated into GMP-regulated thin-film deposition lines—for example, in Low-E glass coating or photovoltaic CIGS manufacturing—it supports audit-ready documentation packages aligned with FDA 21 CFR Part 11 data integrity requirements via compatible controller firmware.

Software & Data Management

When paired with KYKY’s FD-II or TCDP-II controllers, the FF-160/700 provides full digital telemetry—including real-time rotational speed, bearing temperature, motor current, and status flags—via RS-485 or Ethernet Modbus TCP. Controller firmware supports configurable alarm thresholds (e.g., coolant flow interruption, overtemperature, overspeed), automatic soft-start sequencing, and event-logged shutdowns. All operational parameters are timestamped and exportable in CSV format for traceability in GLP/GMP validation protocols. Optional OPC UA gateway modules enable native integration into SCADA and MES platforms used in semiconductor fab automation and R&D facility infrastructure management.

Applications

• Physical vapor deposition (PVD) and sputtering systems for flat-panel display (FPD) and touch sensor manufacturing.
• In-line vacuum coating of architectural Low-E glass and solar-control glazing.
• Thin-film battery electrode fabrication (LiCoO₂, NMC, solid-state electrolytes) requiring UHV-grade inert atmospheres.
• Ion beam etching and accelerator beamline vacuum systems demanding low photon-stimulated desorption and minimal electron-induced gas evolution.
• High-temperature vacuum furnaces (up to 1200 °C) for crystal growth (quartz, sapphire, SiC) and piezoelectric resonator annealing.
• R&D-scale atomic layer deposition (ALD) reactors where precise gas dosing and rapid pump-down cycles are essential.

FAQ

What forepump is recommended for optimal performance?
A rotary vane or dry scroll forepump with pumping speed between 4 L/s and 8 L/s is recommended to maintain the FF-160/700 within its specified continuous inlet pressure range (≤300 Pa).
Can the pump operate continuously at maximum gas load?
Yes—under nominal cooling conditions (≥1 L/min, ≤25 °C), the pump sustains rated speed and ultimate pressure at full N₂ gas load (1400 sccm) without thermal derating.
Is the lip-lubrication system serviceable in the field?
The lip-seal assembly is factory pre-set and sealed; no routine maintenance or relubrication is required throughout the specified service life (≥15,000 operating hours under typical duty cycles).
Does the pump meet ISO 10101-2 for residual gas analysis compatibility?
Yes—the absence of oil vapor and low intrinsic outgassing (<1×10⁻¹¹ Pa·m³/s per cm² at 23 °C) ensures compatibility with quadrupole mass spectrometers used for RGA-based process diagnostics.
What is the expected mean time between failures (MTBF)?
Based on accelerated life testing and field data from >2,000 installed units, MTBF exceeds 25,000 hours under controlled ambient and cooling conditions.