Leica EM ACE200 Vacuum Coating System
| Brand | Leica |
|---|---|
| Origin | Germany |
| Model | EM ACE200 |
| Vacuum Level | ≤7 × 10⁻³ mbar |
| Chamber Dimensions (W×D×H) | 140 mm × 145 mm × 150 mm |
| Sample Stage Diameter | 80 mm |
| Working Distance | 30–100 mm |
| Sputtering Current | ≤150 mA |
| Film Thickness Resolution (with QCM option) | 0.1 nm |
| Coating Modes | Ion Sputtering, Carbon Wire Evaporation, Dual-Mode, Optional Glow Discharge |
| Optional Features | Quartz Crystal Microbalance (QCM), Planetary Rotation, Interchangeable Shields, Directional Sputtering, Pulsed Carbon Evaporation |
Overview
The Leica EM ACE200 is a modular, high-precision vacuum coating system engineered for electron microscopy sample preparation. It operates on two complementary physical vapor deposition (PVD) principles: magnetron-based ion sputtering for conductive metal films (e.g., Au, Pt, Cr, Ir), and resistive carbon wire evaporation for ultra-thin, amorphous carbon support films. Designed for reproducible, low-vacuum (<7 × 10⁻³ mbar) operation, the system delivers uniform, pinhole-free coatings essential for high-resolution SEM imaging, TEM grid preparation, and energy-dispersive X-ray spectroscopy (EDS/EDX) compatibility. Its compact, benchtop architecture integrates vacuum generation, process control, and real-time monitoring into a single platform—eliminating external pump controllers or standalone thickness monitors while maintaining full compliance with laboratory safety and electromagnetic compatibility (EMC) standards per IEC 61326-1.
Key Features
- Modular head design enables rapid interchange between sputtering and carbon evaporation configurations—no tooling or recalibration required.
- Directional sputtering mode enhances lateral uniformity on planar samples by optimizing plasma confinement and target-to-substrate geometry.
- Pulsed carbon evaporation delivers precise thermal control over filament temperature, enabling stable, low-rate deposition (0.01–1.0 nm/s) critical for ultrathin TEM support films.
- Patented rectangular chamber (140 × 145 × 150 mm) maximizes usable volume while minimizing shadowing effects; accommodates standard SEM stubs, TEM grids, and multi-well sample carriers.
- Integrated touchscreen interface supports fully programmable protocols—including ramped current profiles, timed glow discharge pretreatment, and automated end-point termination based on QCM feedback.
- Standard metal shutter ensures contamination-free start/stop transitions and prevents unintended deposition during chamber venting or stage repositioning.
Sample Compatibility & Compliance
The EM ACE200 accommodates a broad range of electron microscopy substrates: silicon wafers, glass coverslips, aluminum SEM stubs, copper/rhodium TEM grids (200–400 mesh), and brittle biological sections mounted on conductive tape. Its vacuum architecture complies with ISO 8573-1 Class 4 for compressed air purity (when used with optional air purge kits) and meets CE marking requirements under the EU Machinery Directive 2006/42/EC and Low Voltage Directive 2014/35/EU. For regulated environments, the system supports audit-ready operation when paired with Leica’s optional GLP-compliant software package—enabling electronic signatures, user access levels, and 21 CFR Part 11–compliant data logging for traceability in pharmaceutical or clinical research labs.
Software & Data Management
The embedded firmware provides local protocol storage (up to 99 methods), real-time vacuum curve logging, and QCM-driven closed-loop thickness control. Exportable CSV files contain timestamped pressure, current, voltage, and mass change data—compatible with LIMS integration via USB or Ethernet. Optional Leica EM UC7 software extends functionality with remote monitoring, batch reporting, and calibration certificate management. All firmware updates are delivered via signed .bin packages to ensure integrity and version control across multi-instrument facilities.
Applications
- High-fidelity gold/palladium sputtering for non-conductive biological specimens prior to SEM analysis.
- Ultra-flat iridium coatings for EBSD pattern quality enhancement on metallurgical cross-sections.
- Sub-nanometer carbon films on holey carbon grids for cryo-TEM specimen support.
- Glow discharge surface activation of hydrophobic TEM grids to improve ice layer uniformity in vitrification workflows.
- Multi-layer metal/carbon bilayer deposition for FIB-SEM lift-out site protection and charge dissipation.
FAQ
What vacuum pump is required for the EM ACE200?
A two-stage rotary vane pump (minimum 4 m³/h pumping speed) is recommended; Leica offers certified compatible pumps (e.g., EM VP100) with oil mist filtration and vibration damping mounts.
Can the system be upgraded from sputtering-only to dual-mode post-purchase?
Yes—field-installable carbon evaporation kits include filament holder, power supply module, and revised chamber shielding; firmware update included.
Is planetary rotation available as a retrofit?
Planetary sample rotation is offered as a factory-installed option only; it requires mechanical reinforcement of the stage drive assembly and cannot be retrofitted onsite.
How often does the quartz crystal monitor require replacement?
QCM sensors typically last 50–100 coating cycles depending on material type and deposition rate; Leica supplies NIST-traceable calibration crystals with documented sensitivity factors.
Does the EM ACE200 support inert gas sputtering (e.g., Ar/Ne mixtures)?
The system is configured for argon-only sputtering; gas mixing capability is not supported due to fixed flow path design and absence of MFC hardware.
