LISICO Online 2 Wet-Process In-Line Laser Diffraction Particle Size Monitoring and Control System
| Brand | LISICO |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Authorized Distributor |
| Regional Category | Domestic (China) |
| Model | Online 2 |
| Pricing | Upon Request |
Overview
The LISICO Online 2 is an industrial-grade in-line laser diffraction particle size monitoring and control system engineered for real-time process analytics in wet-milling and slurry-based manufacturing environments. It operates on the Mie scattering theory, utilizing a dual-path Fourier optical architecture—combining forward, side, and backward angular light detection—to deliver high-fidelity granulometric data across a broad dynamic range (0.02–2000 µm). Unlike offline lab analyzers, the Online 2 integrates directly into production infrastructure adjacent to bead mills, agitated reactors, or inline homogenizers, enabling continuous, unattended measurement of slurry particle size distribution (PSD) under actual process conditions. Its design prioritizes robustness, repeatability, and regulatory readiness—supporting continuous process verification (CPV), quality-by-design (QbD), and automated feedback loops essential for GMP-compliant pharmaceutical, battery cathode, and high-performance ink manufacturing.
Key Features
- In-Line Optical Architecture: Dual-path Fourier optical system with 92-element photodetector array ensures full angular scattering capture—including sub-micron signal resolution via tilted sample cell geometry and optimized backscatter sensitivity.
- Automated Sampling & Conditioning: Self-priming, multi-channel peristaltic sampling (1–4 lines configurable); integrated ultrasonic dispersion (50 W standard, up to 700 W optional), centrifugal recirculation pump, dual-level water level sensing, and auto-fill/drain/clean cycles.
- Cross-Contamination Mitigation: Reciprocating pneumatic sampler with reverse-flush capability; waste fluid egress from lower chamber prevents backflow into product stream—validated for ATEX Zone 2/22 compatibility via external air supply only.
- Organic Solvent Compatibility: Integrated filtration and solvent recovery module enables closed-loop circulation of organic media (e.g., NMP, DMF, ethanol), reducing consumables cost and VOC emissions.
- High-Frequency Measurement: Minimum sampling interval of 1 second (user-configurable >1 s); stable D50 repeatability ≤0.5% RSD and accuracy ≤0.5% deviation against NIST-traceable reference standards.
Sample Compatibility & Compliance
The Online 2 accommodates aqueous and non-aqueous slurries with solid concentrations ranging from 0.1% to 40% w/w, including lithium nickel cobalt aluminum oxide (NCA), lithium iron phosphate (LFP), API suspensions, pigment dispersions, and ceramic precursors. All wetted components comply with USP Class VI and FDA CFR 21 Part 11 requirements for material contact safety. The system supports audit-ready electronic records with time-stamped metadata, user-access logging, and change-control tracking—fully aligned with GLP, GMP, and ISO 9001:2015 documentation frameworks. Optional validation packages include IQ/OQ protocols compliant with ASTM E2923-22 and ISO 13320:2020.
Software & Data Management
Embedded firmware enables autonomous operation without host PC dependency. Real-time PSD metrics—including D10, D50, D90, D97, D98, span, and volume-weighted mean D[4,3]—are transmitted via industrial protocols: 4–20 mA analog output, Modbus RTU/TCP, and OPC UA (optional). Predefined SOPs can be loaded and triggered remotely; each SOP defines dispersion energy, dilution ratio, measurement duration, and alarm thresholds. Data is stored locally with 30-day rolling buffer and exportable in CSV/Excel format. Integration with DCS/SCADA systems allows closed-loop control of mill speed, feed rate, or dispersant dosing based on live D50 trends—reducing batch variability and energy consumption by up to 18% in validated cathode production lines.
Applications
- Lithium-ion Battery Cathode Manufacturing: Real-time monitoring of NMC, LFP, and NCA slurry grinding endpoints to prevent over-milling and ensure consistent electrode coating rheology.
- Pharmaceutical Suspension Processing: In-process control of micronized API particle size during wet milling—critical for dissolution profile consistency and bioavailability compliance per USP & Ph. Eur. monographs.
- Industrial Ink & Pigment Production: Maintaining narrow PSD in carbon black or titanium dioxide dispersions to optimize color strength, gloss, and jetting stability in digital printing inks.
- Advanced Ceramics & Catalyst Synthesis: Tracking hydrolysis-condensation kinetics in sol-gel processes and controlling agglomerate breakage during attrition milling.
FAQ
What particle size range does the Online 2 cover, and how is accuracy verified?
The system measures from 0.02 µm to 2000 µm using Mie theory-based inversion algorithms. Accuracy is confirmed through traceable calibration with NIST SRM 1963 and ISO 13320 reference materials, with D50 bias ≤±0.5% under routine operation.
Can the Online 2 interface with existing plant automation systems?
Yes—it provides native 4–20 mA analog outputs and Modbus RTU/TCP communication; optional OPC UA gateway supports seamless integration with Siemens PCS7, Honeywell Experion, Emerson DeltaV, and Yokogawa CENTUM VP DCS platforms.
Is the system suitable for explosive atmospheres?
The sampling probe requires only compressed air (no electrical components at point of installation), making it compatible with ATEX Zone 2/22 and IECEx-certified facilities when paired with appropriate isolation valves and purge systems.
How frequently can measurements be taken, and what parameters are reported?
Measurements occur as fast as once per second. Standard outputs include D10, D50, D90, D97, D98, span, D[4,3], D[3,2], and full volumetric PSD histograms—all timestamped and protocol-tagged for traceability.
Does the system support cleaning-in-place (CIP) validation?
Yes—the automated rinse cycle includes conductivity-based endpoint detection, flow-rate monitoring, and timed detergent/acid/base flush sequences—fully documented in the electronic logbook for FDA 21 CFR Part 11 compliance.


