MiXran Meg1007 UV-Fused Silica Plano-Convex Cylindrical Lens

Overview

The MiXran Meg1007 is a precision-engineered plano-convex cylindrical lens fabricated from high-purity UV-grade fused silica (SiO₂), optimized for demanding optical applications in the deep ultraviolet (UV) spectral range. Unlike standard optical glass, UV fused silica exhibits exceptional transmission (>90% per surface) from 185 nm to 2.1 µm, minimal thermal expansion (0.55 × 10⁻⁶ /°C), and outstanding resistance to solarization under prolonged UV exposure. The cylindrical geometry provides focusing power along a single axis only—enabling line generation, anamorphic beam shaping, laser cavity astigmatism correction, and slit illumination in spectroscopic and lithographic systems. Each Meg1007 lens is manufactured to ISO 10110-3 surface form tolerances (λ/4 @ 633 nm) and features polished surfaces with 40–20 scratch-dig quality, ensuring minimal scatter and high wavefront fidelity in critical alignment and imaging tasks.

Key Features

• UV-optimized fused silica substrate with <1 ppm metallic impurities and OH content <10 ppm—guaranteeing low absorption at 193 nm (ArF excimer) and 248 nm (KrF excimer) wavelengths
• Two coating options: uncoated for maximum UV durability in high-fluence environments, or broadband anti-reflection (AR) coating optimized for 250–400 nm (average R < 0.5% per surface)
• Multiple dimensional configurations: rectangular apertures (10.0 × 10.0 mm, 20.0 × 10.0 mm, 30.0 × 20.0 mm) and circular diameters (Ø12.5 mm, Ø25 mm, Ø30 mm) to accommodate diverse mounting and integration requirements
• Comprehensive EFL portfolio spanning 12.7 mm to 300 mm, enabling precise control over line focus geometry and working distance in UV collimation, scanning, and beam homogenization setups
• Consistent edge thickness (Te = 2.00 mm) across all variants—ensuring mechanical stability during kinematic mounting and minimizing stress-induced birefringence
• Traceable metrology: each lens includes a certificate of conformance verifying radius of curvature (R₁), center thickness (Tc), focal length (EFL), and surface flatness per ISO 10110-5

Sample Compatibility & Compliance

The Meg1007 lens is compatible with standard kinematic lens mounts (e.g., Thorlabs SM1-threaded cells, Newport V-Series holders) and vacuum-compatible optical tables (UHV-rated upon request). Its fused silica composition meets ASTM F795-22 specifications for optical quartz and complies with MIL-O-13830A surface quality standards. For regulated laboratory environments—including ISO/IEC 17025-accredited calibration labs and FDA-regulated photolithography tooling—the lens supports full traceability via serialized product numbering (e.g., GL25-10×10-050-UV) and optional NIST-traceable interferometric verification reports. No RoHS exemptions apply; the material contains zero lead, cadmium, or hexavalent chromium.

Software & Data Management

While the Meg1007 is a passive optical component, its performance parameters are fully integrated into industry-standard optical design software libraries—including Zemax OpticStudio (ZOS), Synopsys CODE V, and Lambda Research TracePro—via provided .ZMX and .SEQ files. Each product variant includes a machine-readable datasheet (PDF + CSV) containing measured EFL, BFL, R₁, Tc, and spectral transmittance curves (200–1100 nm). For GMP/GLP-compliant workflows, batch-level test reports can be delivered with audit-ready metadata (operator ID, environmental conditions, interferometer serial number, calibration date), satisfying 21 CFR Part 11 electronic record requirements when stored on validated document management systems.

Applications

• UV laser line generation in fluorescence microscopy illumination paths (e.g., 355 nm DPSS lasers)
• Anamorphic beam expansion for excimer laser delivery in semiconductor mask inspection tools
• Slit collimation in UV-VIS spectrophotometers (e.g., Shimadzu UV-3600+, Agilent Cary 7000)
• Astigmatism compensation in ultrafast Ti:sapphire oscillator cavities operating below 800 nm
• Photoresist exposure optics in maskless lithography platforms using DMD-based UV patterning
• Beam shaping for UV Raman probe heads requiring high spatial coherence and minimal chromatic aberration

FAQ

Is the UV AR coating durable under high-power 266 nm pulsed laser irradiation?
Yes—the coating uses ion-assisted e-beam deposition with SiO₂/Ta₂O₅ multilayer architecture, qualified to ISO 21254-1 for 10⁹ pulse endurance at 266 nm, 10 ns, 10 Hz, ≤500 mJ/cm².
Can I specify custom focal lengths outside the published range?
Yes—custom EFLs between 8 mm and 500 mm are available with lead times of 6–8 weeks; minimum order quantity applies.
Do you provide wavefront error maps for individual lenses?
Yes—interferometric wavefront data (Zernike coefficients + PV/RMS values) is available as an add-on service with calibrated Zygo GPI interferometer certification.
Are these lenses suitable for vacuum ultraviolet (VUV) applications below 200 nm?
No—while transmission extends to 185 nm in bulk material, surface absorption and contamination effects dominate below 200 nm; VUV-grade MgF₂ alternatives are recommended for <200 nm use.
What is the maximum permissible surface power density for continuous-wave UV operation?
At 355 nm, the damage threshold is ≥10 MW/cm² for uncoated lenses and ≥5 MW/cm² for UV-AR coated variants (tested per ISO 21254-2, 10.6 µm reference wavelength scaling applied).