Park SYSTEMS NX-TSH Atomic Force Microscope
| Brand | Park SYSTEMS |
|---|---|
| Origin | South Korea |
| Model | NX-TSH |
| Instrument Type | Industrial AFM |
| Sample Stage Travel Range | 625 mm × 525 mm |
| Maximum Sample Dimensions | 520 mm × 520 mm × 10 mm (10 kg) |
| Acoustic Noise Attenuation | >20 dB with Integrated Acoustic Enclosure |
| XY Scanning Range (Closed-Loop) | 100 µm × 100 µm |
| Z Scanning Range | 15 µm |
| Z Sensor Noise Floor | Sub-nanometer (low-noise optical lever detection) |
| Probe Exchange | Automated Tip eXchanger (ATX) with vision-based tip recognition and magnetic probe handling |
| Laser Alignment | Motorized, auto-focused beam positioning |
| Electrostatic Control | Integrated bipolar ionizer for charge neutralization |
| Electrical Characterization Option | Conductive AFM (C-AFM) with micro-probe station and 2D encoder stage |
Overview
The Park SYSTEMS NX-TSH is an industrial-grade atomic force microscope engineered specifically for high-precision, large-area nanometrology in advanced display manufacturing environments. Unlike conventional cantilever-scanning AFMs, the NX-TSH implements a unique probe-scanner architecture—where the entire probe head (including laser, photodetector, and Z actuator) moves over a stationary sample mounted on a massive, vibration-isolated granite base. This design decouples scanning performance from sample mass and dimension, enabling stable, sub-nanometer topographic imaging across substrates up to 520 mm × 520 mm × 10 mm (10 kg), with future compatibility extending to Gen 8+ flat panel displays (up to 2200 mm diagonal). The system operates on a precision龙门-style (gantry-type) air-bearing stage, delivering ultra-smooth, low-drift motion across its full 625 mm × 525 mm travel envelope. Core measurement modalities include contact mode, tapping mode, phase imaging, and quantitative surface roughness (Sa, Sq, Sz per ISO 25178), step height, critical dimension (CD), and lateral force analysis—all traceable to NIST-traceable reference standards.
Key Features
- Gantry-Mounted Probe Scanner Architecture: Eliminates mechanical coupling between scanner dynamics and sample inertia; enables consistent resolution independent of sample weight or size.
- Closed-Loop XY Flexure Scanner: Symmetric, monolithic flexure-guided piezoelectric stage with 100 µm × 100 µm range, minimal out-of-plane motion (<0.1 nm cross-talk), and <10 ms step response for high-fidelity raster scanning.
- Ultra-Low-Noise Z Detection: Optical lever system with integrated position-sensitive photodiode and real-time feedback control replaces voltage-based Z signal—reducing nonlinearity and thermal drift while achieving <0.05 nm RMS noise floor (bandwidth: 1 kHz).
- Automated Tip eXchanger (ATX): Vision-guided robotic module performs fully autonomous tip loading/unloading using magnetic gripper technology; eliminates manual probe handling and reduces downtime during multi-site metrology campaigns.
- Integrated Acoustic Enclosure & Ionization System: Passive acoustic isolation (>20 dB attenuation at 100–1000 Hz) combined with bipolar air ionizer ensures electrostatically stable environment—critical for insulating OLED/LCD substrates and preventing charge-induced artifacts.
- Motorized Laser Alignment: Precision stepper-driven optics automatically center laser spot on cantilever backside, ensuring optimal signal-to-noise ratio without user intervention.
Sample Compatibility & Compliance
The NX-TSH accommodates rigid, flat, or slightly warped substrates typical of TFT-LCD, OLED, and microLED fabrication lines—including glass panels (up to 10 mm thickness), silicon wafers (200–300 mm), metal-coated mirrors, and polymer films. Its vacuum-compatible chuck supports both mechanical clamping and optional electrostatic fixation. All motion systems comply with ISO 14644-1 Class 5 cleanroom specifications when operated within controlled environments. Data acquisition and reporting modules are designed to support GLP/GMP workflows, including audit trail logging, electronic signatures (per FDA 21 CFR Part 11), and metadata embedding compliant with ASTM E2500 and ISO/IEC 17025 documentation requirements.
Software & Data Management
XEI Software v5.x provides a unified interface for method development, automated batch execution, and post-processing analytics. Users define measurement protocols—including site selection grids, scan parameters (rate, setpoint, gain), tip tuning sequences, and pass/fail criteria—via intuitive drag-and-drop workflow editor. A single protocol can be deployed across hundreds of locations on a single substrate, with real-time progress monitoring, live image preview, and automatic report generation (PDF/CSV/XLSX). Raw data is stored in open HDF5 format with embedded calibration metadata, enabling third-party analysis via Python/Matlab APIs. Optional XEI-Connect module enables remote diagnostics, centralized fleet management, and integration with factory MES systems via OPC UA or RESTful API.
Applications
- Nanoscale surface roughness mapping of OLED encapsulation layers and TFT gate dielectrics (ISO 25178-2 compliance)
- Step height quantification of pixel bank structures and RGB patterning layers (±0.15 nm repeatability)
- Critical dimension (CD) metrology of fine-line metal traces on flexible substrates
- Conductive AFM (C-AFM) defect localization on active-matrix backplanes using integrated micro-probe station
- Electrostatic discharge (ESD) susceptibility screening via surface potential mapping (KPFM mode, optional)
- Process validation and SPC tracking across multiple fabrication lots using statistical overlay analysis
FAQ
What distinguishes the NX-TSH from conventional AFMs in large-sample metrology?
The NX-TSH uses a probe-scanner—not sample-scanner—design, eliminating sensitivity to sample mass and dimensional instability. Its gantry-mounted air-bearing stage ensures micron-level positional accuracy over meter-scale ranges without sacrificing nanoscale resolution.
Can the NX-TSH perform electrical characterization on display substrates?
Yes—when equipped with the optional Conductive AFM (C-AFM) package, it integrates a micro-probe station and 2D-encoded stage to deliver localized current-voltage spectroscopy, leakage path identification, and thin-film transistor parameter extraction.
Is the system compatible with cleanroom deployment?
The NX-TSH meets ISO 14644-1 Class 5 particulate limits when installed with appropriate HVAC integration and includes HEPA-filtered internal airflow paths to prevent contamination of sensitive optical components.
How does the ATX system ensure tip alignment reproducibility?
ATX employs high-resolution machine vision to identify tip geometry and orientation prior to magnetic pickup; subsequent placement is verified by real-time cantilever resonance tuning and optical lever signal optimization.
Does the software support automated SPC reporting for production line use?
XEI Software includes configurable SPC dashboards with Cp/Cpk calculation, trend charting, and alarm-triggered re-measurement—fully exportable to JMP, Minitab, or enterprise QMS platforms.
