Plassys SSDR150 Microwave Plasma Chemical Vapor Deposition System

Overview

The Plassys SSDR150 is a high-performance, research-grade Microwave Plasma Chemical Vapor Deposition (MPCVD) system engineered for the controlled synthesis of high-purity, single-crystal and polycrystalline diamond films. Operating at 2.45 GHz with up to 6 kW microwave power, the SSDR150 generates a stable, high-energy plasma under precisely regulated pressure (20–400 mbar) and ultra-high vacuum base conditions (≤1×10⁻⁶ mbar). Its hot-wall reactor architecture ensures uniform thermal distribution across the substrate stage (Ø60 mm), enabling reproducible growth of diamond layers with exceptional crystallinity, low defect density, and tunable doping profiles. Designed through iterative multiphysics modeling—integrating electromagnetic wave propagation, plasma kinetics, and gas-phase fluid dynamics—the SSDR150 delivers exceptional process stability over extended durations (up to 21 days continuous operation), making it suitable for both fundamental quantum materials research and pilot-scale technology transfer.

Key Features

• Robust hot-wall MPCVD chamber with 6-inch (Ø152 mm) internal diameter and all-metal, UHV-compatible construction
• Integrated 6 kW, 2.45 GHz microwave generator with automatic impedance matching and real-time reflected power monitoring
• Precision temperature-controlled substrate stage (Ø60 mm) featuring active cooling/heating and motorized Z-axis positioning (±0.1 mm resolution)
• High-stability vacuum system combining turbomolecular pumping (≥1000 L/s) and cryogenic trapping, achieving ≤1×10⁻⁶ mbar base pressure
• Multi-gas mass flow control (up to 4 independent channels) with digital regulation (0.1–100 sccm range, ±0.5% FS accuracy)
• Full I/O integration for external sensors (plasma emission spectroscopy, pyrometry, RF voltage/current probes) and closed-loop process feedback
• Modular design supporting rapid reconfiguration for diamond nucleation enhancement, heteroepitaxy, or in-situ etch/growth cycles

Sample Compatibility & Compliance

The SSDR150 accommodates substrates up to Ø60 mm—including silicon, iridium, molybdenum, quartz, and single-crystal diamond—enabling heterogeneous nucleation, homoepitaxial thick-film growth, and buffer-layer engineering. Its chamber geometry and plasma confinement are optimized for uniform diamond deposition on curved or patterned surfaces relevant to radiation detectors, high-power electronic heat spreaders, and quantum NV-center platforms. The system complies with CE machinery directives (2006/42/EC), electromagnetic compatibility standards (2014/30/EU), and is fully compatible with GLP- and GMP-aligned laboratory environments. All process parameters—including microwave forward/reflected power, chamber pressure, gas flows, stage temperature, and Z-position—are logged with timestamped audit trails, satisfying FDA 21 CFR Part 11 requirements when paired with validated software configurations.

Software & Data Management

The SSDR150 is operated via Plassys’ proprietary CVDControl™ software suite, built on a deterministic real-time Linux kernel. It provides synchronized acquisition of >32 analog/digital process variables at 100 Hz sampling rate, with configurable alarm thresholds, recipe-based automation, and hierarchical user access control (operator, engineer, administrator). Data is stored in HDF5 format with embedded metadata (ISO/IEC 11179 compliant), ensuring traceability and interoperability with MATLAB, Python (h5py), and LabVIEW. Optional modules include plasma optical emission spectroscopy (OES) spectral analysis, in-situ Raman monitoring interface, and remote diagnostics via TLS-secured SSH tunneling. Full system logs—including vacuum interlocks, power supply status, and emergency stop events—are retained for ≥18 months and exportable in CSV/PDF for regulatory review.

Applications

• Growth of high-mobility diamond FETs and Schottky diodes for high-frequency, high-temperature electronics
• Single-crystal diamond synthesis for quantum sensing platforms (NV⁻ center spin coherence optimization)
• Thermal management substrates for GaN-on-diamond RF power amplifiers and laser diode packaging
• Optical-grade diamond windows and lenses for synchrotron beamlines and EUV lithography systems
• Doped (B, P, N) diamond layers for electrochemical biosensors and radiation-hardened detector elements
• Scalable process development toward industrial-grade diamond wafers (2–4 inch) via modular chamber upgrades

FAQ

What is the maximum achievable diamond growth rate on the SSDR150?

Typical growth rates range from 0.5–2.0 µm/h for high-quality single-crystal diamond under standard CH₄/H₂ chemistry; rates scale linearly with microwave power and precursor concentration within process stability limits.
Can the SSDR150 be integrated with in-situ characterization tools?

Yes—the system features standardized flanges (CF100, CF63), electrical feedthroughs (24-channel), and optical viewports (UV-VIS-NIR broadband transmission) to support real-time OES, laser reflectometry, and pyrometry integration.
Is remote operation and monitoring supported?

Fully supported via secure VNC-over-SSH with dual-factor authentication; all critical alarms trigger email/SMS notifications through configurable enterprise SMTP gateways.
Does the system meet ISO 14644-1 Class 5 cleanroom compatibility requirements?

The SSDR150 itself is not a cleanroom-certified enclosure, but its sealed UHV chamber, particle-trapping gas lines, and oil-free pumping train enable installation in ISO Class 5 environments with proper facility integration and HEPA-filtered purge gas supply.
What level of technical support and documentation is provided?

Plassys delivers comprehensive documentation including full mechanical drawings, vacuum schematics, microwave safety protocols, SOP templates, and 24-month hardware warranty; on-site commissioning and operator training are available as optional service packages.