Plassys SSDR150 Microwave Plasma Chemical Vapor Deposition System

Overview

The Plassys SSDR150 is a high-performance, research-grade Microwave Plasma Chemical Vapor Deposition (MPCVD) system engineered for controlled synthesis of high-purity, single-crystal and polycrystalline diamond films. Based on rigorous electromagnetic, plasma kinetics, and gas-dynamic modeling, the SSDR150 integrates a 6 kW, 2.45 GHz microwave source with a hot-wall reactor architecture to generate stable, high-power-density plasma under precisely regulated vacuum and pressure conditions (base vacuum ≤1×10⁻⁶ mbar; operating range 20–400 mbar). Its Ø152 mm cylindrical chamber accommodates substrates up to Ø60 mm, with integrated Z-axis motion for optimized plasma uniformity and thermal gradient management during extended deposition runs—up to 2–3 weeks continuously. Designed and refined over a decade by Plassys (France), the SSDR150 meets stringent requirements in quantum sensing, radiation-hardened detector fabrication, high-thermal-conductivity heat spreaders, optical-grade windows, and wide-bandgap electronic devices.

Key Features

• Hot-wall reactor configuration enabling uniform radial temperature distribution and minimized wall contamination
• 6 kW, 2.45 GHz solid-state microwave generator with real-time forward/reflected power monitoring and automatic impedance matching
• High-stability temperature control (±2 °C) across substrate stage (operable up to 1200 °C), calibrated via dual-wavelength pyrometry
• Integrated Z-axis translation (±10 mm range, 1 µm resolution) for dynamic plasma coupling optimization during growth
• Stainless-steel vacuum chamber with all-metal seals, ISO-KF and CF flanges, and bake-out capability (≤200 °C)
• Modular gas delivery system supporting up to 4 mass flow controllers (MFCs), compatible with H₂, CH₄, N₂, O₂, Ar, and dopant precursors (e.g., PH₃, B₂H₆)
• Full interlock architecture compliant with IEC 61508 SIL2 for operational safety and process continuity

Sample Compatibility & Compliance

The SSDR150 supports a broad spectrum of substrate materials—including silicon, silicon carbide, iridium-coated molybdenum, quartz, and single-crystal diamond—enabling heteroepitaxial and homoepitaxial diamond growth. Its design conforms to ISO 27401 (cleanroom-compatible construction), EN 61000-6-3 (EMC emissions), and EN 61000-6-4 (industrial immunity). For regulated environments, optional audit trails, user access levels, and electronic signature modules align with FDA 21 CFR Part 11 and EU Annex 11 requirements when paired with validated control software. All vacuum components meet ASTM F2782 standards for ultra-high-vacuum integrity.

Software & Data Management

Operation is managed via Plassys’ proprietary MPCVD Control Suite—a Windows-based application offering synchronized logging of >50 real-time parameters (microwave power, chamber pressure, stage temperature, gas flows, reflected power, cooling water temperature/flow). The software supports recipe-driven automation, alarm-triggered event capture, and export in CSV or HDF5 format for traceability. Optional integration with LabVIEW™ or Python APIs enables custom data acquisition and closed-loop process optimization. Raw sensor data is timestamped with NTP-synchronized precision, and system logs retain full history for GLP/GMP-compliant reporting.

Applications

• Growth of low-defect, nitrogen-vacancy (NV⁻) center-rich diamond for quantum magnetometers and spin-photon interfaces
• Deposition of boron-doped diamond (BDD) electrodes for electrochemical biosensors and wastewater treatment systems
• Fabrication of radiation-tolerant diamond Schottky diodes and particle detectors for CERN and ITER-related diagnostics
• Production of optical-quality diamond windows (transmission >70% from UV to THz) for high-energy laser systems
• Thermal interface materials and heat spreaders for GaN-on-diamond RF power amplifiers and high-brightness LED packaging
• Development of nanocrystalline diamond coatings for MEMS/NEMS wear resistance and biocompatible implants

FAQ

What vacuum level can the SSDR150 achieve, and how is it maintained?
The system achieves a base pressure of ≤1×10⁻⁶ mbar using a turbomolecular pump backed by a dry scroll pump; vacuum integrity is verified via helium leak testing per ASTM E499.
Is remote operation supported, and what cybersecurity protocols are implemented?
Yes—via secure RDP or VNC over VLAN-isolated networks; firmware includes TLS 1.2 encryption for remote commands and role-based authentication per NIST SP 800-53 Rev. 4.
Can the SSDR150 be upgraded for in situ diagnostics such as OES or laser interferometry?
Yes—the chamber features six optical viewports (Ø50 mm, MgF₂ or fused silica) with UHV-compatible flanges, enabling integration of optical emission spectroscopy (OES), reflectance interferometry, or Raman thermography.
What maintenance intervals are recommended for the microwave coupling system?
Waveguide window inspection and tuner lubrication are scheduled every 500 operational hours; full impedance matching calibration is advised quarterly or after major hardware changes.
Does the system support multi-step recipes with dynamic gas switching and pressure ramping?
Yes—up to 99 sequential steps per recipe, each configurable for gas composition, pressure setpoint, microwave power ramp rate, and dwell time, with sub-second actuation latency.