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SUPEC 2050 Semiconductor AMC Integrated Monitoring System

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Brand EXPEC (PUYU TECHNOLOGY)
Origin Zhejiang, China
Manufacturer Type Authorized Distributor
Country of Origin China
Model SUPEC 2050
Pricing Upon Request

Overview

The SUPEC 2050 Semiconductor AMC Integrated Monitoring System is an engineered solution for real-time, multi-point monitoring of Airborne Molecular Contaminants (AMCs) in critical semiconductor fabrication environments. Based on standardized gas sampling and modular analytical architecture, the system employs a combination of pressure-controlled, temperature-stabilized sample transport; automated multi-channel switching; and configurable high-sensitivity detection modules—including FTIR, GC-MS, PID, and chemiluminescence analyzers—to quantify trace-level contaminants such as amines, acids, condensables, and dopants (e.g., NH₃, HCl, HF, H₂S, silanes, and organic vapors) at sub-pptv (parts-per-trillion by volume) detection limits. Designed for integration into cleanroom HVAC ducts, FOUP load ports, and tool exhaust manifolds, the SUPEC 2050 operates under ISO 14644-8 Class 1–5 environmental conditions and supports continuous 24/7 operation with minimal operator intervention.

Key Features

  • Multi-point grid monitoring capability: Supports up to 200 spatially distributed sampling locations via scalable pneumatic manifold architecture—enabling comprehensive contamination mapping across fab floor zones, wafer handling areas, and lithography bays.
  • Optimized cycle time: Integrated pre-evacuation function reduces dead volume purging delay; typical channel switch-and-stabilize time is ≤ 90 seconds per point, ensuring rapid rotational analysis without compromising measurement integrity.
  • Modular channel scalability: System architecture permits incremental expansion of sampling channels (from 8 to 128+), with hot-swappable flow controllers, pressure regulators, and filter cartridges compliant with SEMI F71 and F72 specifications.
  • Low cross-contamination design: Each sampling line incorporates programmable reverse-purge cycles using ultra-high-purity nitrogen (≥99.9995%), minimizing carryover between sequential measurements; residual contamination remains below 0.5% of previous peak signal (validated per ASTM D7359).
  • Automated超标 event response: On detection of concentration exceeding user-defined thresholds, the system triggers synchronized苏玛罐 (SUMMA canister) actuation—capturing representative 1–5 L air samples at precise flow rates (50–500 mL/min) for offline GC/MS verification and root-cause analysis.

Sample Compatibility & Compliance

The SUPEC 2050 accommodates gaseous matrices with particulate loading < 0.1 mg/m³ and dew point ≤ −40°C. Sample lines are constructed from electropolished 316L stainless steel or PFA-lined tubing (ID: 1/4″), certified for inertness toward reactive species (per ASTM E2859). All wetted components comply with SEMI S2/S8 safety standards. The system meets ISO/IEC 17025 requirements for calibration traceability and supports GLP-compliant audit trails. Calibration protocols align with ISO 6141 and ISO 6145-5 for gravimetric standard preparation and dynamic dilution validation.

Software & Data Management

The embedded EXPEC AMS Control Suite (v3.2+) provides centralized configuration, real-time visualization, alarm management, and automated report generation. Data logging occurs at 1 Hz resolution with timestamped metadata (including ambient T/P, flow rate, valve position, and analyzer status). Export formats include CSV, XML, and OPC UA (UA Server v1.04) for seamless integration with MES, SCADA, and enterprise DCS platforms (e.g., Siemens Desigo, Rockwell FactoryTalk). Audit trail functionality complies with FDA 21 CFR Part 11 requirements, including electronic signatures, role-based access control, and immutable log archiving for ≥12 months.

Applications

  • Real-time AMC surveillance in photolithography cleanrooms (KrF, ArF, EUV tool environments)
  • Exhaust stack monitoring for acid/amine abatement system performance verification
  • FOUP and SMIF pod purge gas purity qualification
  • Tool-to-tool contamination correlation studies during process ramp-up
  • Root-cause investigation of yield loss linked to base contamination (e.g., resist poisoning, gate oxide defects)

FAQ

What types of AMC species can the SUPEC 2050 detect?

The system supports customizable detector configurations for amines (NH₃, MEA, DEA), acids (HCl, HF, HNO₃), condensables (DOP, PAHs), dopants (PH₃, AsH₃, B₂H₆), and organics (IPA, acetone, HMDS) — subject to selected analyzer modules.
Is the system compatible with existing fab infrastructure?

Yes. It interfaces with standard 4–20 mA analog I/O, Modbus TCP, and Ethernet/IP protocols; rack-mount chassis (19″, 4U) fits standard equipment cabinets; sample line routing follows SEMI F21 guidelines.
How often does the system require calibration?

Primary calibration is recommended every 72 hours using certified gas standards; optional auto-calibration mode performs zero/span checks every 24 hours with NIST-traceable reference gases.
Can historical data be retrieved for trend analysis?

Yes. The AMS Control Suite includes built-in statistical process control (SPC) tools, allowing users to generate Shewhart charts, Cpk indices, and autocorrelation plots directly from archived datasets.
Does the system support remote diagnostics and firmware updates?

Yes. Secure TLS 1.2 encrypted remote access enables OEM-level diagnostics, log download, and over-the-air firmware upgrades — all logged within the Part 11-compliant audit trail.

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