Supmile KQ-50 Benchtop Ultrasonic Cleaner

Overview

The Supmile KQ-50 is a compact, benchtop ultrasonic cleaner engineered for routine laboratory cleaning tasks requiring consistent cavitation energy and operational reliability. It operates on the principle of piezoelectric transduction: high-frequency electrical signals (40 kHz) drive ceramic transducers bonded to the stainless steel tank base, generating controlled acoustic pressure waves in the cleaning medium. These waves produce transient microbubbles that undergo rapid collapse—cavitation—which delivers localized mechanical shear forces capable of dislodging particulate contaminants, organic residues, and loosely adhered biofilms from immersed surfaces. Designed for general-purpose use, the KQ-50 is not intended for critical sterilization or validated decontamination processes per ISO 13485 or FDA 21 CFR Part 820; rather, it serves as a primary pre-cleaning tool prior to autoclaving, rinsing, or analytical sample preparation. Its 1.5 L capacity accommodates standard labware including beakers, flasks, pipette tips, glass slides, and small metal components—making it suitable for QC labs, academic teaching facilities, and R&D environments where reproducibility, ease of operation, and corrosion resistance are prioritized.

Key Features

• 304 stainless steel tank and housing ensure long-term resistance to corrosion from aqueous and mild solvent-based cleaning solutions.
• Integrated auto-sweep frequency circuit maintains stable cavitation output across varying load conditions and solution temperatures, minimizing standing wave formation and hot-spot erosion.
• Analog mechanical control interface provides intuitive, tactile adjustment of ultrasonic power from 40% to 100% of nominal 50 W output—enabling optimization for delicate substrates or heavily soiled items without digital complexity.
• Compact cylindrical footprint (Φ145 × 235 mm) allows seamless integration into crowded fume hoods, laminar flow cabinets, or shared benchtop workspaces.
• Fixed 40 kHz operating frequency balances penetration depth and cavitation intensity—optimal for removal of micron-scale particles from smooth, non-porous surfaces such as optical lenses, watch parts, and semiconductor wafers.

Sample Compatibility & Compliance

The KQ-50 is compatible with water-based detergents, ethanol, isopropanol, and low-concentration alkaline or acidic solutions commonly used in laboratory pre-cleaning protocols. It is not rated for flammable solvent operation above flashpoint thresholds nor for use with chlorinated hydrocarbons. While not certified to IEC 61000-6-3 (EMC) or UL 61010-1 for North American markets, its construction and electrical design conform to GB 4793.1–2007 (Chinese safety standard for laboratory equipment). Users performing cleaning validation under GLP or GMP frameworks must establish in-house SOPs defining dwell time, solution composition, temperature monitoring, and post-cleaning residue testing—particularly when processing components destined for cell culture or analytical instrumentation.

Software & Data Management

The KQ-50 operates via standalone analog controls and does not incorporate embedded software, network connectivity, or data logging capabilities. Time-based operation is managed manually using an integrated mechanical timer (0–30 min range, typical configuration), with no audit trail or electronic record generation. Consequently, it meets basic functionality requirements for non-regulated environments but does not support 21 CFR Part 11 compliance or automated process documentation. For laboratories requiring traceable cleaning cycles, external timers with calibration certificates or integration into PLC-controlled workflows are recommended.

Applications

• Pretreatment of glassware and metal fixtures prior to autoclaving or passivation.
• Removal of polishing compounds and machining oils from precision optics and metrology tools.
• Cleaning of reusable pipette tips, crucibles, and filter holders in chemistry and environmental testing labs.
• Debris removal from printed circuit board (PCB) assemblies during prototyping and failure analysis.
• Supporting sample preparation workflows in materials science labs—including powder dispersion homogenization and electrode surface conditioning prior to electrochemical characterization.

FAQ

Is the KQ-50 suitable for cleaning delicate MEMS devices or silicon wafers?
Yes—when operated at reduced power (40–60%) and with deionized water or low-surface-tension solvents, it effectively removes submicron particles without mechanical abrasion. However, users should validate cleaning efficacy via SEM or particle counting for mission-critical applications.
Can I use acetone or other flammable solvents in this unit?
No. The KQ-50 lacks explosion-proof construction and temperature monitoring; only non-flammable, water-miscible cleaning agents are recommended.
Does the unit include a heater or temperature control?
No. The KQ-50 is a room-temperature ultrasonic cleaner only. Heating functionality requires separate immersion heaters or thermostatically controlled water baths.
What maintenance is required for long-term reliability?
Regular tank draining and wiping, periodic inspection of transducer bonding integrity, and replacement of degraded cleaning solutions every 8–10 hours of cumulative operation are advised to maintain cavitation efficiency and prevent mineral buildup.