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| Brand | Amsterdam Scientific Instruments (ASI) |
|---|---|
| Origin | Netherlands |
| Model | Felis T3 |
| Acceleration Voltage Range | 0.5–30 kV |
| Sample Stage | 5-position 3 mm TEM grid holder |
| Detector Type | Hybrid pixel detector with nanosecond timestamping capability |
| Brand | Auniontech |
|---|---|
| Model | W |
| Actuator Type | 4-Quadrant (2-axis, bi-directional) |
| Mechanical Tilt Angle (DC) | ±25° (X & Y axes) |
| Mirror Diameter | 15 mm |
| Center of Rotation to Mirror Surface | 1.3 mm |
| External Diameter | 30 mm |
| Zero Drift | ≤25 µrad/°C |
| Closed-Loop Resolution | <5 µrad |
| Repeatability (RMS, typical) | 30–100 µrad |
| Full-Scale Bandwidth (Sine, ±25°) | 20 Hz |
| Small-Signal Bandwidth | 350 Hz |
| Large-Angle Step Response (20° step) | 7.5 ms |
| Small-Angle Step Response (0.1° step) | 1.4 ms |
| Instrument Form Factor | Benchtop |
| Brand | BM |
|---|---|
| Origin | Shanghai, China |
| Model | TM3030 |
| Instrument Type | Desktop SEM |
| Electron Source | Pre-aligned Tungsten Filament |
| Accelerating Voltages | 5 kV, 15 kV |
| Magnification Range | 15× to 30,000× (with digital zoom: 2×, 4×) |
| Maximum Sample Diameter | 70 mm |
| Sample Stage Travel | X: ±17.5 mm, Y: ±17.5 mm |
| Detector System | High-sensitivity 4-segment semiconductor backscattered electron (BSE) detector |
| Vacuum System | Turbo-molecular pump (30 L/s), diaphragm pump (1 m³/h), ultimate vacuum ≤1.5×10⁻⁵ Pa, variable pressure mode (6–270 Pa, 22 steps) |
| Control Interface | Two USB 2.0 ports, Ethernet port |
| Operating System | Microsoft Windows® 7 or later |
| Display | 15.4-inch LCD (1280×800 resolution) |
| Auto-functions | Auto filament saturation, auto beam alignment, auto stigmation, auto focus, auto brightness/contrast, overcurrent protection, leakage circuit breaker |
| Brand | BM |
|---|---|
| Origin | Shanghai, China |
| Model | U1510 |
| Instrument Type | Floor-standing SEM |
| Electron Source | Tungsten Filament |
| Vacuum Modes | High Vacuum & Variable Pressure (6–270 Pa) |
| Secondary Electron Resolution | 3.0 nm @ 30 kV (High Vacuum) |
| Backscattered Electron Resolution | 4.0 nm @ 30 kV (6 Pa, Low Vacuum) |
| Magnification Range | 5× to 300,000× |
| Accelerating Voltage | 0.3–30 kV |
| Max Sample Diameter | 153 mm |
| Stage Travel | X 0–80 mm, Y 0–40 mm, Z 5–50 mm, T –20° to +90°, R 360° |
| Standard Detectors | Everhart-Thornley-type Secondary Electron Detector (SED), High-Sensitivity Semiconductor Backscattered Electron Detector (BSE) |
| Vacuum System | Single Turbo-Molecular Pump + Rotary Mechanical Pump |
| Safety Features | Power Failure Protection, Leakage Current Interlock, Automatic Shutdown |
| Brand | CIQTEK |
|---|---|
| Origin | Anhui, China |
| Manufacturer Type | Direct Manufacturer |
| Origin Category | Domestic (China) |
| Model | SEM3300 |
| Instrument Type | Floor-Standing Conventional SEM |
| Electron Source | Tungsten Filament |
| SEM Class | Entry-Level Tungsten-Filament SEM |
| Secondary Electron Resolution | 2.5 nm @ 20 kV |
| Magnification Range | 1× to 300,000× |
| Accelerating Voltage | 0.1 kV to 30 kV |
| Stage Travel | X: 120 mm |
| Y | 115 mm |
| Z | 50 mm |
| Brand | Accurion |
|---|---|
| Origin | Germany |
| Model | Halcyonics Explorer |
| Sensor Technology | Piezoelectric Ceramic |
| Axes | X, Y, Z (Triaxial) |
| Detection Principle | Non-contact Capacitive / Laser Doppler (Configurable) |
| Power Supply | Independent AC Input |
| Dual-Sensor Capability | Yes |
| Compliance | CE, RoHS, ISO 10816-1 (Vibration Evaluation of Machines) |
| Brand | Accurion |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Halcyonics Nano Series Micro Active Vibration Isolation Platform |
| Price | Upon Request |
| Load Capacity | Nano_20: 0–8 kg |
| Nano_30 | 5–25 kg |
| Dimensions | Nano_20: 204 mm × 204 mm × 69 mm |
| Nano_30 | 400 mm × 300 mm × 75 mm |
| Vibration Attenuation Range | 1–200 Hz |
| Resonant Frequency | < 5 Hz |
| Actuation Principle | Piezoelectric Force Feedback |
| Operating Voltage | Low-Voltage DC (Non-Interfering) |
| Brand | Accurion |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | Halcyonics Vario Series |
| Price | Upon Request |
| Load Capacity | 0–600 kg |
| Operating Frequency Range | <5 Hz (effective isolation down to DC) |
| Power Supply | Standard DC Input |
| System Architecture | Separated Actuator Units + Dedicated Controller Unit |
| Key Technology | Piezoelectric Sensor Feedback + Real-Time Active Force Cancellation |
| Compliance | Designed for ISO 20483-compliant lab environments |
| Brand | Accurion |
|---|---|
| Origin | Germany |
| Model | Halcyonics Workstations Active Vibration Isolation Tables |
| Load Capacity Range | 80–320 kg |
| Isolation Performance | >98.22% at 10 Hz |
| Effective Low-Frequency Cutoff | <5 Hz |
| Interface | USB 1.1 |
| Software | Windows-based Evaluation Suite |
| Dimensions (L×W×H) | 770×770×700 mm to 1070×1170×700 mm |
| Series | Workstation_Vario, Workstation_Micro |
| Brand | KYKY |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Instrument Class | Floor-Standing Conventional SEM |
| Electron Source | Tungsten Filament |
| SEM Category | Entry-Level Tungsten-Filament SEM |
| Secondary Electron (SE) Resolution | 3 nm @ 30 kV, 8 nm @ 3 kV |
| Accelerating Voltage Range | 0.2–30 kV |
| Backscattered Electron (BSE) Resolution | 4 nm @ 30 kV |
| Sample Chamber | Optional Large-Capacity Chamber |
| Vacuum Mode | Compatible with Low-Vacuum Module |
| Load Lock System | Max. Sample Diameter ≤75 mm, Height ≤15 mm |
| Navigation Camera | Integrated Wide-Field CCD Navigation Camera |
| Imaging Modes | Simultaneous SE/BSE Dual-Channel Imaging |
| Image Stitching | Automated Full-Field Matrix Acquisition & Real-Time High-Throughput Mosaic Reconstruction |
| Particle Analysis | AI-Driven Morphometric Quantification (size, aspect ratio, circularity, convexity, Feret diameter, etc.) with Auto-Scale Calibration |
| Metrology Tools | Distance, Angle, Line (horizontal/vertical), Circle Diameter, and Profile Analysis |
| Electron Beam Lithography (EBL) Capability | Integrated Vector-Scan EBL Subsystem Supporting Pattern Definition, Dose Control, and Concurrent SEM Observation |
| Brand | KYKY |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Instrument Type | Floor-standing SEM |
| Electron Gun Type | Schottky Thermal Field Emission |
| SEM Class | Entry-level Field Emission SEM |
| Secondary Electron Resolution | 1.5 nm @ 15 kV |
| Accelerating Voltage Range | 0.2–30 kV |
| Backscattered Electron Resolution | 3 nm @ 30 kV |
| Brand | KYKY |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Instrument Type | Floor-Model SEM |
| Electron Gun | Thermal Field-Emission (TFE) |
| SEM Class | High-Resolution Field-Emission SEM |
| Secondary Electron (SE) Resolution | 0.9 nm @ 30 kV |
| Magnification Range | 1×–3,000,000× (optical: 1×–100×) |
| Accelerating Voltage | 0.2–30 kV |
| Brand | KYKY |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Instrument Type | Floor-Standing SEM |
| Electron Gun | Thermal Field Emission |
| SEM Class | Ultra-High-Resolution Field Emission |
| Secondary Electron Resolution | 0.8 nm @ 15 kV, 1.5 nm @ 1 kV |
| Magnification Range | 1×–3,000,000× (electronic), 1×–100× (optical) |
| Accelerating Voltage | 0.2–30 kV |
| Brand | NCS |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Product Category | Domestic |
| Model | FE-1050 Series |
| Instrument Form Factor | Floor-Standing |
| Electron Gun Type | Thermal Field Emission |
| Secondary Electron (SE) Resolution | 1.5 nm @ 1 kV, 0.9 nm @ 15 kV |
| Magnification Range | 10× to 1,000,000× |
| Accelerating Voltage | 0.02–30 kV |
| Backscattered Electron (BSE) Resolution | 2.5 nm @ 1 kV, 1.5 nm @ 15 kV |
| Sample Chamber Port Count | 27 |
| Stage Motion | 5-Axis Motorized (X = 140 mm, Y = 140 mm, Z = 60 mm, Rotation = 360°, Tilt = −10° to +80°) |
| Standard Detectors | In-Column SE Detector, Everhart-Thornley SE Detector, Optional Insertable BSE Detector, Optional STEM Detector, Triple-Channel IR CCD Chamber Monitoring System |
| Brand | Oxford Instruments |
|---|---|
| Origin | United Kingdom |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | AZtecFeature |
| Instrument Type | Benchtop SEM-EDS System |
| Electron Source | Tungsten Filament |
| Secondary Electron Resolution | 1.0 nm @ 15 kV, WD = 4 mm |
| Magnification Range | 20–2,000× (low mag) |
| Accelerating Voltage | 1–30 kV |
| Backscattered Electron Resolution | 4 nm @ 30 kV (low-vacuum mode) |
| Detector Configuration | Up to four Ultim Max SDDs supported |
| Real-time Particle Counting Capacity | Up to 200,000 particles per sample |
| Data Acquisition & Quantification Engine | Tru-Q® automated elemental identification and quantification |
| Peak Deconvolution | Advanced sum-peak correction for high-count-rate accuracy |
| Software Architecture | Native 64-bit multithreaded processing |
| Compliance | ASTM E1588–10e1 (GSR), ISO 16232 (cleanliness), VDA 19.1, USP <788>, GLP/GMP-aligned audit trail support |
| Brand | TESCAN |
|---|---|
| Origin | Czech Republic |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Instrument Type | Floor-Standing SEM |
| Electron Source | Schottky Field-Emission Gun (FEG) |
| Secondary Electron Resolution | 0.6 nm @ 15 kV |
| Magnification Range | 2× to 2,000,000× |
| Accelerating Voltage | 0.2–30 kV (deceleration mode down to <50 V) |
| Backscattered Electron Resolution | 1.6 nm @ 15 kV |
| Brand | ZEISS |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | EVO |
| Pricing | Upon Request |
| Brand | ZEISS |
|---|---|
| Origin | Germany |
| Model | MultiSEM |
| Electron Beam Configuration | Hexagonal array of 91 beams |
| Landing Energy Range | 1.0–3.0 kV |
| Average Resolution (all beams) | ≤ 3.5 nm @ 1.0 / 1.5 / 3.0 kV |
| Resolution Uniformity | ≤ ±1 nm @ 1.0 / 1.5 / 3.0 kV and 12 µm pitch |
| Beam Pitch Options | 12 µm (standard), 15 µm (optional) |
| Pitch Uniformity | ≤ ±1% |
| Field of View (hexagonal long axis) | 132 µm (12 µm pitch) or 165 µm (15 µm pitch) |
| Per-Beam Current | ≥ 570 pA |
| Total Probe Current | ≥ 52 nA |
| Current Uniformity | ≤ +10% |
| Electron Source | Schottky field-emission gun |
| Filament Current Stability | ≤ 1% per hour |
| Beam Blanking | Electrostatic |
| Working Distance | 1.4 mm |
| Detector System | High-efficiency multi-channel secondary electron detection with projection optics |
| Maximum Scan Rate per Beam | 20 MHz |
| Pixel Size Range | 2–20 nm (12 µm pitch) |
| Image Stitching | Fully automated, 91-subimage hexagonal tiling with adjustable overlap |
| Stage Type | Precision stepper stage |
| Stage Travel (X/Y/Z) | 100 / 100 / 30 mm |
| Stage Repeatability (XY) | ≤ ±3 µm |
| Sample Exchange Time (with exchange chamber) | ≤ 5 min |
| Sample Dimensions (max) | 100 × 100 mm² (XY), ≤ 30 mm height, ≤ 0.2 kg mass, surface flatness ≤ 500 nm P–P over 100 µm |
| Vacuum System | Turbo-molecular pump (>260 L/s) + oil-free scroll pump |
| Control Hardware | ≥4-core 64-bit CPU, ≥32 GB DDR RAM, ≥1 TB HDD, dual 1 Gbit Ethernet |
| OS | Windows 10 (64-bit) |
| Image Acquisition Nodes | 12 rack-mounted computers (≥4-core 64-bit CPU, ≥32 GB DDR3, 1 Gbit + 10 Gbit Ethernet) |
| Software Platform | ZEN core interface with Shuttle & Find, API for custom workflow integration, distributed acquisition database, automated focus/astigmatism/detector balancing, ROI-driven auto-sectioning, continuous serial sectioning workflows, real-time system health monitoring (vacuum, alignment, beam stability) |
| Brand | ZEPTOOLS |
|---|---|
| Origin | Anhui, China |
| Manufacturer Type | Direct Manufacturer |
| Product Origin | Domestic (China) |
| Model | Custom-Integrated SEM-EDS Platform |
| Price Range | USD 17,000 – 25,500 |
| Magnification Range | 10× – 360,000× (continuously adjustable, user-definable setpoints) |
| Best Imaging Resolution | 3 nm (at 30 kV, SE mode) |
| EDS Detector | Silicon Drift Detector (SDD), ≥10 eV energy resolution (Mn-Kα) |
| Stage Dimensions | 540 mm × 760 mm |
| Motion Axes | 4-axis (X, Y, U, V) motorized precision stage |
| Minimum Positioning Increment | 0.001 mm |
| EDS Quantification Accuracy | ±2–5 wt% (matrix-dependent, per ISO 16529:2014 and ASTM E1508) |
| Brand | ZEPTOOLS |
|---|---|
| Origin | Anhui, China |
| Manufacturer Type | Direct Manufacturer |
| Instrument Type | Desktop SEM |
| Electron Gun | Single-Crystal LaB₆ Filament |
| SEM Class | Entry-Level Tungsten- or LaB₆-Based SEM (Non-FEG) |
| Secondary Electron Resolution | 3 nm @ 20 kV |
| Maximum Magnification | 360,000× |
| Accelerating Voltage Range | 3–20 kV |
| Backscattered Electron Resolution | 3 nm @ 20 kV |
| Sample Chamber Dimensions (max) | 165 × 122 × 51.5 mm (W × D × H) |
| Stage Movement (standard) | X = 60 mm, Y = 55 mm (2-axis) |
| Optional Deceleration Mode | 0–10 kV landing energy via sample bias |
| Imaging Modes | Video mode (512 × 512), Fast Scan (512 × 512), Slow Scan (2048 × 2048) |
| Image Formats | BMP, TIFF, JPEG, PNG |
| Navigation | Integrated optical camera + chamber-viewing CCD |
| Automation | Auto Contrast/Brightness, Auto Focus, Large-Area Image Stitching |
| Dimensions (main unit) | 650 × 370 × 642 mm (W × D × H) |
| In-situ Compatibility | TEC cooling stage, heating stage, tensile stage (ZEPTOOLS proprietary) |
| Brand | ZEPTOOLS |
|---|---|
| Origin | Anhui, China |
| Manufacturer Type | Direct Manufacturer |
| Instrument Type | Desktop SEM |
| Electron Source | Schottky Field Emission Gun |
| Resolution (SE & BSE) | <2.5 nm |
| Max Magnification | 1,000,000× |
| Accelerating Voltage Range | 1–15 kV (continuously adjustable) |
| Stage | Motorized XY (optional XYZ/XYT/5-axis) |
| Detector Options | Secondary Electron (SE), Backscattered Electron (BSE), Energy-Dispersive X-ray Spectroscopy (EDS), Electron Backscatter Diffraction (EBSD) |
| Vacuum System | Triple-stage independent vacuum architecture |
| Imaging Modes | Standard SE/BSE, deceleration mode (0–10 kV sample bias, optional) |
| Image Acquisition | 512×512 (real-time video), 2048×2048 (high-res still capture) |
| Compliance | Designed for ISO/IEC 17025-aligned lab environments |
| Brand | ZEPTOOLS |
|---|---|
| Origin | Anhui, China |
| Manufacturer Type | Direct Manufacturer |
| Instrument Type | Desktop SEM |
| Electron Source | Pre-aligned Tungsten Filament |
| Acceleration Voltages | 5 kV / 10 kV / 15 kV |
| Secondary Electron (SE) Resolution | <10 nm |
| Backscattered Electron (BSE) Resolution | <10 nm |
| Maximum Magnification | 150,000× |
| Stage Type | Motorized 2-Axis Sample Stage (X/Y: 25 mm × 25 mm) |
| Vacuum Pumping Time to High Vacuum | ≤2 min |
| Max Sample Dimensions | Ø50 mm × H35 mm |
| Integrated Optics | Monolithic Condenser Lens System |
| Operating Environment | Standard Lab/Office Floor with Vibration Damping Base |
| Brand | ZEPTOOLS |
|---|---|
| Origin | Anhui, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Domestic |
| Model | ZEM18 |
| Instrument Type | Desktop SEM |
| Electron Source | Pre-aligned Tungsten Filament |
| SEM Class | Entry-level Tungsten-Filament SEM |
| Secondary Electron (SE) Resolution | <6 nm |
| Backscattered Electron (BSE) Resolution | <6 nm |
| Maximum Magnification | 200,000× |
| Accelerating Voltage Range | 3–18 kV |
| Maximum Sample Dimensions | Ø50 mm × 35 mm (H) |
| Stage | Motorized 2-Axis Automated Stage |
| Signal Acquisition Bandwidth | 10 MHz |
| Vacuum Mode Options | High Vacuum (<5×10⁻³ Pa), Low Vacuum (optional) |
| Pump-down Time (High Vacuum) | <90 s |
| Imaging Modes | Video Mode, Fast Scan Mode, Slow Scan Mode |
| Auto Functions | Auto Focus, Auto Brightness/Contrast |
| Detector Configurations | SE Detector, BSE Detector, Optional EDS Detector |
| Brand | ZEPTOOLS |
|---|---|
| Origin | Anhui, China |
| Manufacturer Type | Direct Manufacturer |
| Product Origin | Domestic (China) |
| Model | ZEM20 In-situ Tensile Integrated SEM |
| Instrument Type | Desktop SEM |
| Electron Source | Tungsten Filament |
| SEM Class | Entry-level Tungsten-Filament SEM |
| Secondary Electron (SE) Resolution | 4 nm @ 20 kV |
| Maximum Magnification | 360,000× |
| Accelerating Voltage Range | 3–20 kV (1 kV step adjustment) |
| Backscattered Electron (BSE) Resolution | 4 nm @ 20 kV |
| In-situ Stage Load Capacity | 0–1000 N |
| Displacement Resolution | 20 nm |
| Optional Heating Module | Yes |
| Mechanical Testing Modes | Tensile, Compression, Three-point Bending |
| Vacuum Architecture | Dual-chamber (separated electron gun & specimen chamber) |
| Sample Chamber Camera | Integrated HD in-chamber camera |
| Chamber Volume | Extra-large for multi-modal in-situ platform integration |
| Brand | ZEPTOOLS |
|---|---|
| Origin | Anhui, China |
| Manufacturer Type | Direct Manufacturer |
| Instrument Type | Desktop SEM |
| Electron Source | Pre-aligned Tungsten Filament |
| SEM Class | Entry-level Tungsten-Filament SEM |
| Secondary Electron (SE) Resolution | 4 nm |
| Maximum Magnification | 360,000× |
| Accelerating Voltage Range | 3–20 kV (1 kV step adjustment) |
| Backscattered Electron (BSE) Resolution | 4 nm |
| Stage Option | 5-Axis Motorized Stage (Optional) |
| Chamber Dimensions | 185 mm × 176 mm × 125 mm |
| Vacuum Modes | High Vacuum & Low Vacuum |
| Environmental Suitability | Vibration-isolated design for standard labs/offices/factories |
| Detector Configuration | SE + BSE detectors |
| Optional Upgrades | EDS, Deceleration Mode, In-situ Platforms |
| Filament Upgrade Option | LaB₆ |
| Brand | ZEPTOOLS |
|---|---|
| Origin | Anhui, China |
| Manufacturer Type | Direct Manufacturer |
| Product Category | Domestic |
| Model | ZEM20 EDS-integrated Desktop SEM |
| Instrument Type | Desktop / Benchtop SEM |
| Electron Source | Tungsten Filament |
| SEM Class | Entry-level Tungsten-Filament SEM |
| Secondary Electron Image Resolution | 4 nm |
| Maximum Magnification | 360,000× |
| Accelerating Voltage Range | 3–20 kV (1 kV step adjustment) |
| Backscattered Electron Image Resolution | 4 nm |
| Integrated EDS System | Oxford Instruments Xplore Compact 30 |
| EDS Detector Active Area | 30 mm² (SuperATW window) |
| Energy Resolution | ≤129 eV (Mn Kα) |
| Cooling | Peltier-cooled (LN₂-free) |
| Elemental Detection Range | Boron (B, Z=5) to Californium (Cf, Z=98) |
| Analysis Modes | Point, Line, and Area Mapping |
| Software Interface | Fully Localized Chinese UI with Optional English Toggle |
| Vacuum Architecture | Dual-chamber Separated Vacuum System (Gun Chamber & Sample Chamber) |
| Sample Chamber Camera | Integrated HD In-Chamber Camera |
| Sample Stage Mode | Deceleration Mode for Low-Conductivity Specimens |
| Typical Sample Exchange Time | <60 s |
| Brand | ZEPTOOLS |
|---|---|
| Origin | Anhui, China |
| Model | ZEM20Pro |
| Instrument Type | Desktop SEM |
| Electron Source | LaB₆ (Lanthanum Hexaboride) |
| Secondary Electron Resolution | 3 nm |
| Magnification Range | up to 360,000× |
| Accelerating Voltage | 3–30 kV |
| Backscattered Electron Resolution | 3 nm |
| Brand | ZEPTOOLS |
|---|---|
| Origin | Anhui, China |
| Model | ZEM20Pro |
| Instrument Type | Desktop SEM |
| Electron Source | LaB₆ (Lanthanum Hexaboride) |
| Secondary Electron Resolution | 3 nm @ 30 kV |
| Backscattered Electron Resolution | 3 nm @ 30 kV |
| Magnification Range | 10× – 360,000× |
| Accelerating Voltage | 3–30 kV |